Abstract: The present invention relates to a composition for forming anti-reflective coating for use in a lithography process in manufacture of a semiconductor device which comprises polymer (A) having a weight average molecular weight of 5,000 or less, and a polymer (B) having a weight average molecular weight of 20,000 or more. The composition provides an anti-reflective coating for use in a lithography which is excellent in step coverage on a substrate with an irregular surface, such as hole or trench, has a high anti-reflection effect, causes no intermixing with a resist layer, provides an excellent resist pattern, and has a higher dry etching rate compared with the resist layer.

Abstract: The present invention relates to a composition for forming anti-reflective coating for use in a lithography process in manufacture of a semiconductor device which comprises polymer (A) having a weight average molecular weight of 5,000 or less, and a polymer (B) having a weight average molecular weight of 20,000 or more. The composition provides an anti-reflective coating for use in a lithography which is excellent in step coverage on a substrate with an irregular surface, such as hole or trench, has a high anti-reflection effect, causes no intermixing with a resist layer, provides an excellent resist pattern, and has a higher dry etching rate compared with the resist layer.

Abstract: The present invention provides a plant disease control agent containing as active ingredient one or more compounds of the formula ?1!A--COOR.sup.1 ?1!whereinR.sup.1 represents a hydrogen atom or a C.sub.1 -C.sub.4 alkyl group, andA represents a group of the formula (A-1) or (A-2) ##STR1## R.sup.2 represents a C.sub.1 -C.sub.4 alkyl group, R.sup.3 represents a C.sub.1 -C.sub.4 alkyl group,R.sup.4 represents a halogen atom or a C.sub.1 -C.sub.4 alkyl group, andR.sup.5 represents a C.sub.1 -C.sub.4 alkyl group.Further, the compound of A-1 in the formula ?1! in which R.sup.3 is a halogen atom is also included in the present invention.