Patents by Inventor Yoshichi Hagiwara

Yoshichi Hagiwara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5565302
    Abstract: The present invention provides a process of preparing a waterborne photosensitive resin composition, free of organic solvent, that can be developed with aqueous alkali solution. The method of the present invention is a process for preparing a waterborne photosensitive resin composition, that can form a photosensitive article developable with aqueous alkali solution, by adding an unsaturated compound, a surfactant and a photoinitiator to an aqueous emulsion, and agitating under conditions sufficient to absorb the unsaturated compound into the polymeric particles of the emulsion and to form a stable waterborne photosensitive resin composition.
    Type: Grant
    Filed: April 21, 1995
    Date of Patent: October 15, 1996
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Hiroshi Samukawa, Katsue Nishikawa, Yoshichi Hagiwara
  • Patent number: 5426008
    Abstract: A photocurable gel suitable for articles such as printing plates, photoresists and the like is disclosed. The photocurable eel comprises (a) a polymer composition having isotactic polymethyl methacrylate moiety; and syndiotactic polymethyl methacrylate moiety; (b) a photopolymerizable ethylenically unsaturated compound; and (c) a photopolymerization initiator. The gel is solid at ambient temperature and is capable of undergoing reversible gel/sol transition by heating or cooling. Methods of preparing articles, as well as methods of fixing articles, which use the gel are also disclosed. Such methods include sealing or affixing component parts on an electronic circuit board.
    Type: Grant
    Filed: November 15, 1993
    Date of Patent: June 20, 1995
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Yoshichi Hagiwara, Yuichi Mori, Hiroshi Samukawa, Kazuhide Saigo
  • Patent number: 5319060
    Abstract: A method of preparing an unsaturated ester resin having improved storage stability is disclosed. An epoxy compound and polymerizable unsaturated monocarboxylic acid are reacted in the presence of a trivalent organic phosphorous catalyst. The catalyst is subsequently deactivated by oxidation. The resin may then be reacted with an acid anhydride.
    Type: Grant
    Filed: June 22, 1993
    Date of Patent: June 7, 1994
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Katsue Nishikawa, Yoshichi Hagiwara
  • Patent number: 5292618
    Abstract: A photocurable gel suitable for articles such as printing plates, photoresists and the like is disclosed. The photocurable gel comprises (a) a polymer composition having isotactic polymethyl methacrylate moiety; and syndiotactic polymethyl methacrylate moiety; (b) a photopolymerizable ethylenically unsaturated compound; and (c) a photopolymerization initiator. The gel is solid at ambient temperature and is capable of undergoing reversible gel/sol transition by heating or cooling. Methods of preparing articles, as well as methods of fixing articles, which use the gel are also disclosed. Such methods include sealing or affixing component parts on an electronic circuit board.
    Type: Grant
    Filed: April 18, 1991
    Date of Patent: March 8, 1994
    Assignee: W. R. Grace & Co.-Conn.
    Inventors: Yoshichi Hagiwara, Yuichi Mori, Hiroshi Samukuaa, Kazuhide Saigo
  • Patent number: 5281678
    Abstract: A method of preparing an unsaturated ester resin having improved storage stability is disclosed. An epoxy compound and polymerizable unsaturated monocarboxylic acid are reacted in the presence of a trivalent organic phosphorous catalyst. The catalyst is subsequently deactivated by oxidation. The resin may then be reacted with an acid anhydride.
    Type: Grant
    Filed: November 19, 1991
    Date of Patent: January 25, 1994
    Assignee: W. R. Grace & Co.
    Inventors: Katsue Nishikawa, Yoshichi Hagiwara
  • Patent number: 4865954
    Abstract: The present invention provides a method for forming a metal image in which a resist film is provided at an image portion and then etching processing is performed to thereby form the metal image comprising the steps of: (1) forming an image comprised of concave surface portions on a metal surface; (2) forming a resist film on the metal surface; and (3) exposing the resist film to such an extent that at the concave portions of the resist film is not made wholly soluble.
    Type: Grant
    Filed: January 27, 1987
    Date of Patent: September 12, 1989
    Assignee: Minnesota Mining and Manufacturing Company
    Inventors: Yoshichi Hagiwara, Naoya Kimura, Kenji Emori