Patents by Inventor Yoshichika Kuroki

Yoshichika Kuroki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20190375636
    Abstract: An object of this invention is to provide a simple method for producing sulfur tetrafluoride. The object is achieved by a method for producing sulfur tetrafluoride, comprising step A of reacting a fluorinated halogen compound with sulfur chloride, the fluorinated halogen compound being represented by formula: XFn, wherein X is chlorine, bromine, or iodine; and n is a natural number of 1 to 5.
    Type: Application
    Filed: November 13, 2017
    Publication date: December 12, 2019
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Yoshichika KUROKI, Atsushi SHIRAI, Moe HOSOKAWA, Yosuke KISHIKAWA
  • Patent number: 9738589
    Abstract: The object of the present invention is to provide a process for producing ?-fluoroacrylic acid ester at a high starting material conversion, high selectivity, and high yield. The present invention provides a process for producing the compound represented by the formula (1) wherein R represents alkyl optionally substituted with one or more fluorine atoms, the process comprising step A of reacting a compound represented by the formula (2) wherein X represents a bromine atom or a chlorine atom with an alcohol represented by the formula (3) wherein the symbol is as defined above, and carbon monoxide in the presence of a transition metal catalyst and a base to thereby obtain the compound represented by the formula (1).
    Type: Grant
    Filed: June 15, 2016
    Date of Patent: August 22, 2017
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Akihiro Gotou, Sumi Ishihara, Yoshihiro Yamamoto, Akinori Yamamoto, Yoshichika Kuroki, Yuzo Komatsu, Yousuke Kishikawa
  • Publication number: 20160297740
    Abstract: The object of the present invention is to provide a process for producing ?-fluoroacrylic acid ester at a high starting material conversion, high selectivity, and high yield. The present invention provides a process for producing the compound represented by the formula (1) wherein R represents alkyl optionally substituted with one or more fluorine atoms, the process comprising step A of reacting a compound represented by the formula (2) wherein X represents a bromine atom or a chlorine atom with an alcohol represented by the formula (3) wherein the symbol is as defined above, and carbon monoxide in the presence of a transition metal catalyst and a base to thereby obtain the compound represented by the formula (1).
    Type: Application
    Filed: June 15, 2016
    Publication date: October 13, 2016
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya OHTSUKA, Akihiro GOTOU, Sumi ISHIHARA, Yoshihiro YAMAMOTO, Akinori YAMAMOTO, Yoshichika KUROKI, Yuzo KOMATSU, Yousuke KISHIKAWA
  • Patent number: 9388117
    Abstract: The object of the present invention is to provide a process for producing ?-fluoroacrylic acid ester at a high starting material conversion, high selectivity, and high yield. The present invention provides a process for producing the compound represented by the formula (1) wherein R represents alkyl optionally substituted with one or more fluorine atoms, the process comprising step A of reacting a compound represented by the formula (2) wherein X represents a bromine atom or a chlorine atom with an alcohol represented by the formula (3) wherein the symbol is as defined above, and carbon monoxide in the presence of a transition metal catalyst and a base to thereby obtain the compound represented by the formula (1).
    Type: Grant
    Filed: August 30, 2013
    Date of Patent: July 12, 2016
    Assignee: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Akihiro Gotou, Sumi Ishihara, Yoshihiro Yamamoto, Akinori Yamamoto, Yoshichika Kuroki, Yuzo Komatsu, Yousuke Kishikawa
  • Publication number: 20150191413
    Abstract: The object of the present invention is to provide a process for producing ?-fluoroacrylic acid ester at a high starting material conversion, high selectivity, and high yield. The present invention provides a process for producing the compound represented by the formula (1) wherein R represents alkyl optionally substituted with one or more fluorine atoms, the process comprising step A of reacting a compound represented by the formula (2) wherein X represents a bromine atom or a chlorine atom with an alcohol represented by the formula (3) wherein the symbol is as defined above, and carbon monoxide in the presence of a transition metal catalyst and a base to thereby obtain the compound represented by the formula (1).
    Type: Application
    Filed: August 30, 2013
    Publication date: July 9, 2015
    Inventors: Tatsuya Ohtsuka, Akihiro Gotou, Sumi Ishihara, Yoshihiro Yamamoto, Akinori Yamamoto, Yoshichika Kuroki, Yuzo Komatsu, Yousuke Kishikawa
  • Patent number: 8022245
    Abstract: The present invention provides a novel ?-fluoromethoxycarboxylic ester represented by Formula (1): (CF3)2C(OCH2F)COOR wherein R is a hydrocarbon group that may have a substituent; a process for producing 1,1,1,3,3,3-hexafluoroisopropyl fluoromethyl ether, the process including hydrolyzing and decarboxylating the ?-fluoromethoxycarboxylic ester; and a process for producing an ?-fluoromethoxycarboxylic ester represented by Formula (1): (CF3)2C (OCH2F)COOR, the process including reacting an ?-hydroxycarboxylic ester represented by Formula (2): (CF3)2C(OH)COOR with a halofluoromethane in the presence of an alkaline compound. According to the present invention, 1,1,1,3,3,3-hexafluoroisopropyl fluoromethyl ether (sevoflurane), which is known as an anesthetic compound, can be efficiently produced at low cost.
    Type: Grant
    Filed: June 27, 2007
    Date of Patent: September 20, 2011
    Assignee: Daikin Industries, Ltd.
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsushi Suzuki
  • Patent number: 7985877
    Abstract: The present invention provides a process for producing 1,1,1,3,3,3-hexafluoro-2-methoxypropane, wherein a novel compound, 2-methoxy-2-trifluoromethyl-3,3,3-trifluoropropionic acid or a salt thereof is decarboxylated, or wherein an olefin compound represented by chemical formula (4): CF2?C(CF3)(OCH3) is reacted with a fluorinating agent; and a process for producing 2-methoxy-2-trifluoromethyl-3,3,3-trifluoropropionic acid or a salt thereof by reacting a hydroxycarboxylic ester with a methylating agent and then hydrolyzing the reaction product, or hydrolyzing the hydroxycarboxylic ester and then reacting the resulting product with a methylating agent. In accordance with the invention, 1,1,1,3,3,3-hexafluoro-2-methoxypropane, which is useful as a raw material for, for example, the anesthetic Sevoflurane, can be produced efficiently and at low cost.
    Type: Grant
    Filed: May 31, 2007
    Date of Patent: July 26, 2011
    Assignee: Daikin Industries, Ltd.
    Inventors: Tatsuya Ohtsuka, Yoshihiro Yamamoto, Yoshichika Kuroki, Atsushi Suzuki, Akinari Sugiyama
  • Publication number: 20100010255
    Abstract: The present invention provides a novel ?-fluoromethoxycarboxylic ester represented by Formula (1): (CF3)2C(OCH2F)COOR wherein R is a hydrocarbon group that may have a substituent; a process for producing 1,1,1,3,3,3-hexafluoroisopropyl fluoromethyl ether, the process including hydrolyzing and decarboxylating the ?-fluoromethoxycarboxylic ester; and a process for producing an ?-fluoromethoxycarboxylic ester represented by Formula (1): (CF3)2C (OCH2F)COOR, the process including reacting an ?-hydroxycarboxylic ester represented by Formula (2): (CF3)2C(OH)COOR with a halofluoromethane in the presence of an alkaline compound. According to the present invention, 1,1,1,3,3,3-hexafluoroisopropyl fluoromethyl ether (sevoflurane), which is known as an anesthetic compound, can be efficiently produced at low cost.
    Type: Application
    Filed: June 27, 2007
    Publication date: January 14, 2010
    Applicant: Daikin Industries LTd
    Inventors: Tatsuya Ohtsuka, Yoshichika Kuroki, Atsukhi Suzuki
  • Patent number: 7598425
    Abstract: The present invention relates to a method for producing a compound represented by formula (2): [CF3(CF2)n][CF3(CF2)m]C(OH)2??(2) wherein n and m independently represent 0 to 10, the method comprising reacting with a halogen or a halogen-containing oxidizing agent a salt of a compound represented by formula (1): [CF3(CF2)n][CF3(CF2)m]C(OH)COOH??(1) wherein n and m independently represent 0 to 10.
    Type: Grant
    Filed: April 8, 2005
    Date of Patent: October 6, 2009
    Assignee: Daikin Industries, Ltd.
    Inventors: Yoshihiro Yamamoto, Yoshichika Kuroki, Daisuke Karube, Tatsuya Ohtsuka
  • Publication number: 20090156861
    Abstract: The present invention provides a process for producing 1,1,1,3,3,3-hexafluoro-2-methoxypropane, wherein a novel compound, 2-methoxy-2-trifluoromethyl-3,3,3-trifluoropropionic acid or a salt thereof is decarboxylated, or wherein an olefin compound represented by chemical formula (4): CF2?C(CF3)(OCH3) is reacted with a fluorinating agent; and a process for producing 2-methoxy-2-trifluoromethyl-3,3,3-trifluoropropionic acid or a salt thereof by reacting a hydroxycarboxylic ester with a methylating agent and then hydrolyzing the reaction product, or hydrolyzing the hydroxycarboxylic ester and then reacting the resulting product with a methylating agent. In accordance with the invention, 1,1,1,3,3,3-hexafluoro-2-methoxypropane, which is useful as a raw material for, for example, the anesthetic Sevoflurane, can be produced efficiently and at low cost.
    Type: Application
    Filed: May 31, 2007
    Publication date: June 18, 2009
    Applicant: DAIKIN INDUSTRIES, LTD.
    Inventors: Tatsuya Ohtsuka, Yoshihiro Yamamoto, Yoshichika Kuroki, Atsushi Suzuki, Akinari Sugiyama
  • Patent number: 7482302
    Abstract: The present invention provides novel fluorosulfonic acids and salts thereof having greater stability and higher acidity than conventional fluorosulfonic acids; and synthetic intermediates thereof. The invention also provides processes for producing novel fluorosulfonic acids from which various derivatives can be easily synthesized; and uses of these fluorosulfonic acids. Specifically, the invention provides a compound represented by formula (1): R—S(?O)n—CF2—SO3H??(1) wherein R is a group bound to an adjacent sulfur atom through a carbon atom, examples of R being an optionally substituted alkyl group, an optionally substituted haloalkyl group, an optionally substituted alkenyl group, an optionally substituted haloalkenyl group, an optionally substituted alkynyl group, an optionally substituted haloalkynyl group, an optionally substituted cycloalkyl group, etc.; and n is 1 or 2. The invention also provides salts of such a compound, etc.
    Type: Grant
    Filed: February 13, 2004
    Date of Patent: January 27, 2009
    Assignee: Daikin Industries, Ltd.
    Inventors: Kenji Adachi, Sumi Ishihara, Yoshichika Kuroki, Tsuyoshi Itagaki
  • Publication number: 20080262273
    Abstract: The present invention relates to a method for producing a compound represented by formula (2): [CF3(CF2)n][CF3(CF2)m]C(OH)2 ??(2) wherein n and m independently represent 0 to 10, the method comprising reacting with a halogen or a halogen-containing oxidizing agent a salt of a compound represented by formula (1): [CF3(CF2)n][CF3(CF2)m]C(OH)COOH ??(1) wherein n and m independently represent 0 to 10.
    Type: Application
    Filed: April 8, 2005
    Publication date: October 23, 2008
    Inventors: Yoshihiro Yamamoto, Yoshichika Kuroki, Daisuke Karube, Tatsuya Ohtsuka
  • Publication number: 20060252961
    Abstract: The present invention provides novel fluorosulfonic acids and salts thereof having greater stability and higher acidity than conventional fluorosulfonic acids; and synthetic intermediates thereof. The invention also provides processes for producing novel fluorosulfonic acids from which various derivatives can be easily synthesized; and uses of these fluorosulfonic acids. Specifically, the invention provides a compound represented by formula (1): R—S(?O)n—CF2—SO3H??(1) wherein R is a group bound to an adjacent sulfur atom through a carbon atom, examples of R being an optionally substituted alkyl group, an optionally substituted haloalkyl group, an optionally substituted alkenyl group, an optionally substituted haloalkenyl group, an optionally substituted alkynyl group, an optionally substituted haloalkynyl group, an optionally substituted cycloalkyl group, etc.; and n is 1 or 2. The invention also provides salts of such a compound, etc.
    Type: Application
    Filed: February 13, 2004
    Publication date: November 9, 2006
    Inventors: Kenji Adachi, Sumi Ishihara, Yoshichika Kuroki, Tsuyoshi Itagaki