Patents by Inventor Yoshie Izawa

Yoshie Izawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic mask structure and lithographic process
    Patent number: 4735877
    Abstract: There is disclosed a lithographic mask structure which comprises a masking material support film and an annular support substrate for supporting the masking material support film at the periphery, the masking material support film containing a fluorescent substance. Also disclosed is a lithographic process for exposing a photosensitive material to irradiation with a radiation beam through a masking material support film provided with a masking material pattern-wise.
    Type: Grant
    Filed: October 6, 1986
    Date of Patent: April 5, 1988
    Assignee: Canon Kabushiki Kaisha
    Inventors: Hideo Kato, Yoshie Izawa, Keiko Chiba