Abstract: Disclosed are a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Described are a noble aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R10 are each an optionally substituted C1-C18 alkyl, etc.; R11 to R17 are each an optionally substituted C1-C18 alkyl, etc.; R18 is an optionally substituted C1-C18 alkyl, etc.; and X131 is a monovalent anion.

Abstract: Disclosed are a novel sulfonic acid derivative compound and a novel naphthalic acid derivative compound with high solubility in organic solvents, good photosensitivity, and suitability as a photoacid generator and a polymerization initiator. The sulfonic acid derivative compound is represented by the formula (I) (wherein R01, R04, R05, and R06 represent a hydrogen atom; any one of R02 and R03 represents an alkoxy group having a carbon number of 4 to 18 which may be substituted with an alicyclic hydrocarbon group, a heterocyclic group, or a halogen atom and which may have a branch, or the like; and R07 represents an aliphatic hydrocarbon group having a carbon number of 1 to 18 which may be substituted with a halogen atom and/or an alkylthio group, or the like).

Abstract: Disclosed are a novel sulfonic acid derivative compound and a novel naphthalic acid derivative compound with high solubility in organic solvents, good photosensitivity, and suitability as a photoacid generator and a polymerization initiator. The sulfonic acid derivative compound is represented by the formula (I) (wherein R01, R04, R05, and R06 represent a hydrogen atom; any one of R02 and R03 represents an alkoxy group having a carbon number of 4 to 18 which may be substituted with an alicyclic hydrocarbon group, a heterocyclic group, or a halogen atom and which may have a branch, or the like; and R07 represents an aliphatic hydrocarbon group having a carbon number of 1 to 18 which may be substituted with a halogen atom and/or an alkylthio group, or the like).

Abstract: Disclosed are a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Described are a noble aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R10 are each an optionally substituted C1-C18 alkyl, etc.; R11 to R17 are each an optionally substituted C1-C18 alkyl, etc.; R18 is an optionally substituted C1-C18 alkyl, etc.; and X1? is a monovalent anion.

Abstract: Disclosed is a photo-acid generator having high developing properties, a cationic polymerization initiator having high curing properties, and a resist composition and a cationically polymerizable composition containing the photo-acid generator and the cationic polymerization initiator, respectively. Specifically, disclosed is an aromatic sulfonium salt compound of general formula (I) and a photo-acid generator, a cationic polymerization initiator, a resist composition, and a cationically polymerizable composition containing the compound. In formula (I), R1 to R19 are each hydrogen, halogen, hydroxyl, optionally hydroxyl-substituted C1-C18 alkyl, optionally hydroxyl-substituted C1-C18 alkoxy, optionally hydroxyl-substituted C1-C18 thioalkoxy, etc.; An? is a monovalent anion; at least one of R1 to R19 is a substituent selected from the group consisting of hydroxyl, hydroxyl-substituted C1-C12 ester group, hydroxyl-substituted C1-C18 alkoxy, and hydroxyl-substituted C1-C18 thioalkoxy.

Abstract: A colored alkali-developable photosensitive resin composition comprising an alkali-developable resin composition that contains a reaction product obtained by esterification of an epoxy-adduct with a polybasic acid anhydride (C) and then with a polyfunctional epoxy compound (D), wherein the epoxy-adduct has a structure in which an unsaturated monobasic acid (B) is added to an epoxy resin (A) represented by general formula (I) below, a coloring material (E) and a photopolymerization initiator (F).

Abstract: An alkali-developable, colored photosensitive resin composition obtained by adding a colorant and a photopolymerization initiator to an alkali-developable resin composition, containing a reaction product obtained by esterification between an epoxy adduct and a polybasic acid anhydride, the epoxy adduct having a structure formed by adding an unsaturated monobasic acid and a compound selected from a phenol compound, an alcohol compound, an amine compound, and a carboxylic acid to an epoxy resin represented by general formula. The epoxy adduct is formed by adding 0.1 to 1.0 carboxyl group of the unsaturated monobasic acid and 0 to 0.9 phenolic hydroxyl group, alcoholic hydroxyl group, amino group or carboxyl group per epoxy group of the epoxy resin, with the sum of the carboxyl unsaturated monobasic acid and the phenolic hydroxyl group, alcoholic hydroxyl, amino or carboxyl group being 0.1 to 1.0 per epoxy group.

Abstract: A colored alkali-developable photosensitive resin composition comprising an alkali-developable resin composition that contains a reaction product obtained by esterification of an epoxy-adduct with a polybasic acid anhydride (C) and then with a polyfunctional epoxy compound (D), wherein the epoxy-adduct has a structure in which an unsaturated monobasic acid (B) is added to an epoxy resin (A) represented by general formula (I) below, a coloring material (E) and a photopolymerization initiator (F).

Abstract: An alkali-developable, colored photosensitive resin composition obtained by adding a colorant and a photopolymerization initiator to an alkali-developable resin composition, containing a reaction product obtained by esterification between an epoxy adduct and a polybasic acid anhydride, the epoxy adduct having a structure formed by adding an unsaturated monobasic acid and a compound selected from a phenol compound, an alcohol compound, an amine compound, and a carboxylic acid to an epoxy resin represented by general formula. The epoxy adduct is formed by adding 0.1 to 1.0 carboxyl group of the unsaturated monobasic acid and 0 to 0.9 phenolic hydroxyl group, alcoholic hydroxyl group, amino group or carboxyl group per epoxy group of the epoxy resin, with the sum of the carboxyl unsaturated monobasic acid and the phenolic hydroxyl group, alcoholic hydroxyl, amino or carboxyl group being 0.1 to 1.0 per epoxy group.