Patents by Inventor Yoshifumi ASAHARA

Yoshifumi ASAHARA has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9636877
    Abstract: A method for producing a transparent conductive film includes heat-treating a transparent conductive film comprising a transparent film substrate and a transparent conductive laminate including a first transparent conductive layer and a second transparent conductive layer, so that the first and the second transparent conductive layers in the transparent conductive film are crystallized, wherein the first transparent conductive layer is a first amorphous layer comprising indium oxide or an indium-based complex oxide having a tetravalent metal element oxide, the second transparent conductive layer is a second amorphous layer comprising an indium-based complex oxide having a tetravalent metal element oxide, wherein each of the first and the second contents of the tetravalent metal element oxide content is expressed by the formula: {the amount of the tetravalent metal element oxide/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100(%).
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: May 2, 2017
    Assignee: NITTO DENKO CORPORATION
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Patent number: 9475235
    Abstract: A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time.
    Type: Grant
    Filed: October 11, 2013
    Date of Patent: October 25, 2016
    Assignee: NITTO DENKO CORPORATION
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Patent number: 9366900
    Abstract: An object of the invention is to provide an adhesive for a polarizing plate that has high adhering strength, makes it possible to prevent a reduction in the light transmittance of a polarizing plate and to suppress the occurrence of knicks, and is less likely to cause a reduction in the light transmittance of a polarizing plate even in a humidified environment while having the above characteristics. The invention is directed to an adhesive for a polarizing plate for use in fixing a transparent protective film on at least one side of a polarizer, the adhesive including a resin solution containing a polyvinyl alcohol-based resin and a water-soluble silicate.
    Type: Grant
    Filed: March 3, 2011
    Date of Patent: June 14, 2016
    Assignee: NITTO DENKO CORPORATION
    Inventors: Reiko Akari, Tetsurou Ikeda, Masashi Shinagawa, Yoshifumi Asahara
  • Patent number: 8734936
    Abstract: A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: May 27, 2014
    Assignee: Nitto Denko Corporation
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Publication number: 20140035193
    Abstract: A method for producing a transparent conductive film includes heat-treating a transparent conductive film comprising a transparent film substrate and a transparent conductive laminate including a first transparent conductive layer and a second transparent conductive layer, so that the first and the second transparent conductive layers in the transparent conductive film are crystallized, wherein the first transparent conductive layer is a first amorphous layer comprising indium oxide or an indium-based complex oxide having a tetravalent metal element oxide, the second transparent conductive layer is a second amorphous layer comprising an indium-based complex oxide having a tetravalent metal element oxide, wherein each of the first and the second contents of the tetravalent metal element oxide content is expressed by the formula: {the amount of the tetravalent metal element oxide/(the amount of the tetravalent metal element oxide+the amount of indium oxide)}×100 (%).
    Type: Application
    Filed: October 11, 2013
    Publication date: February 6, 2014
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Publication number: 20140036171
    Abstract: A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time.
    Type: Application
    Filed: October 11, 2013
    Publication date: February 6, 2014
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Patent number: 8580088
    Abstract: A method for producing a transparent conductive film including a transparent film substrate and a crystalline transparent conductive layer, including: a first depositing a first indium-based complex oxide having a first tetravalent metal element oxide on the transparent film substrate; and a second depositing indium oxide or a second indium-based complex oxide and lower than the tetravalent metal element oxide content of the indium-based complex oxide used in the first depositing by sputtering to form an amorphous transparent conductive layer, and crystallizing the amorphous transparent conductive layer. The method allows a reduction in crystallization time.
    Type: Grant
    Filed: October 25, 2011
    Date of Patent: November 12, 2013
    Assignee: Nitto Denko Corporation
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara
  • Publication number: 20120320459
    Abstract: An object of the invention is to provide an adhesive for a polarizing plate that has high adhering strength, makes it possible to prevent a reduction in the light transmittance of a polarizing plate and to suppress the occurrence of knicks, and is less likely to cause a reduction in the light transmittance of a polarizing plate even in a humidified environment while having the above characteristics. The invention is directed to an adhesive for a polarizing plate for use in fixing a transparent protective film on at least one side of a polarizer, the adhesive including a resin solution containing a polyvinyl alcohol-based resin and a water-soluble silicate.
    Type: Application
    Filed: March 3, 2011
    Publication date: December 20, 2012
    Applicant: NITTO DENKO CORPORATION
    Inventors: Reiko Akari, Tetsurou Ikeda, Masashi Shinagawa, Yoshifumi Asahara
  • Publication number: 20120111718
    Abstract: A method for producing a transparent conductive film including a transparent film substrate and a crystalline transparent conductive layer, including: a first depositing a first indium-based complex oxide having a first tetravalent metal element oxide on the transparent film substrate; and a second depositing indium oxide or a second indium-based complex oxide and lower than the tetravalent metal element oxide content of the indium-based complex oxide used in the first depositing by sputtering to form an amorphous transparent conductive layer, and crystallizing the amorphous transparent conductive layer. The method allows a reduction in crystallization time.
    Type: Application
    Filed: October 25, 2011
    Publication date: May 10, 2012
    Applicant: NITTO DENKO CORPORATION
    Inventors: Motoki HAISHI, Tomotake NASHIKI, Tomonori NOGUCHI, Yoshifumi ASAHARA
  • Publication number: 20120114923
    Abstract: A transparent conductive film includes a transparent film substrate; and a first and second crystalline transparent conductive laminate, wherein the second crystalline layer is located between the transparent film substrate and the first transparent conductive layer, and a second content of the tetravalent metal element oxide of the second transparent conductive layer is higher than a first content of the tetravalent metal element oxide of the second transparent conductive layer. The transparent conductive film allows a reduction in crystallization time.
    Type: Application
    Filed: October 25, 2011
    Publication date: May 10, 2012
    Applicant: NITTO DENKO CORPORATION
    Inventors: Motoki Haishi, Tomotake Nashiki, Tomonori Noguchi, Yoshifumi Asahara