Abstract: The reduced pressure double glazed glass panel of the present invention includes an outside glass sheet, an inside glass sheet, and a gap portion that are joined together, with the gap portion being formed between the glass sheets and sealed under reduced pressure. Here, the outside glass sheet has a first glass surface disposed to face the outdoor space and a second glass surface disposed to face the gap portion. A Low-E film is formed on the second glass surface. The following relations hold: (Emissivity of Low-E film ?)?0.067; 31%?(Solar reflectance on First glass surface RG(solar))?40%; (48?RG(solar))%?(Solar absorptance on First glass surface AG(solar))?17%; (AG(solar))?{18.3?(0.07×RG(solar))+(20×?)}%; (Solar heat gain coefficient SHGC)?0.50; and (Thermal transmittance U value)?1.2 W/m2·K or less.

Abstract: The reduced pressure double glazed glass panel of the present invention includes an outside glass sheet, an inside glass sheet, and a gap portion that are joined together, with the gap portion being formed between the glass sheets and sealed under reduced pressure. Here, the outside glass sheet has a first glass surface disposed to face the outdoor space and a second glass surface disposed to face the gap portion. A Low-E film is formed on the second glass surface. The following relations hold: (Emissivity of Low-E film ?)?0.067; 31%?(Solar reflectance on First glass surface RG(solar))?40%; (48?RG(solar))%?(Solar absorptance on First glass surface AG(solar))?17%; (AG(solar))?{18.3?(0.07×RG(solar))+(20×?)}%; (Solar heat gain coefficient SHGC)?0.50; and (Thermal transmittance U value)?1.2 W/m2·K or less.

Abstract: A photocatalyst layer (TiO2) is formed on the surface of a substrate (glass plate) through the intermediary of a monoclinic undercoat layer (ZrO2), and no dead layer is substantially present between the photocatalyst layer and the undercoat layer. Also, by providing a peel preventing layer between the substrate and the undercoat layer, it is possible to eliminate film peeling between the photocatalyst layer and the substrate, defects and discoloration. A metal element may be doped in the photocatalyst layer, and it is preferable that the metal element is at least one of Sn, Zn, Mo and Fe. The phrase “no dead layer is substantially present” means that the thickness of the dead layer is 20 nm or less. The thickness of the photocatalyst layer is preferably from 1 nm to 1,000 nm, more preferably from 1 nm to 500 nm.

Abstract: The present invention provides a glass member including a photocatalyst layer and a heat reflecting layer, the glass member having high photocatalytic activity and exhibiting a low reflectance and a colorless or pale blue reflection color tone or a bluish green or green reflection color tone. The glass member is produced by laminating an antistripping layer made of silicon oxide or the like, a crystalline undercoat layer made of zirconium oxide or the like and a photocatalyst layer made of titanium oxide or the like on the other surface of a glass substrate having a heat reflecting layer formed on one surface thereof.

Abstract: A member having high photocatalytic activity and multiple glass using the member are provided. A photocatalyst layer (TiO2) is formed on the surface of a substrate (glass sheet) through the intermediary of a crystalline undercoat layer (ZrO2), and no dead layer is substantially present between the photocatalyst layer and the undercoat layer. Also, provision of an amorphous layer between the substrate and the undercoat layer prevents peeling or defects between the photocatalyst layer and the substrate. In particular, by adjusting the thickness of each layer within a specific range, it is possible to obtain an article having a film configuration in which the optical feature of a reflection color, small variation of the reflectance, and a photocatalytic function are combined.

Abstract: The present invention provides a method for forming a titanium compound film on a substrate by a sputtering process by use of, in place of a conventional metallic titanium target, a titanium target containing a metal (such as tin or zinc) having two or more times higher sputtering yield in an argon atmosphere than titanium; an article coated with a titanium compound film; and a sputtering target for use in the film coating. The content of tin or zinc in the titanium target containing tin or zinc is preferably in the range of 1 to 45 at %, and further a third metal may be added. These can remove drawbacks in that the film has a low film formation rate and a high output power cannot be applied due to the occurrence of arcing in forming a titanium compound film on the surface of a substrate, such as plate-shaped glass, by a reactive sputtering process.

Abstract: A photocatalyst layer (TiO2) is formed on the surface of a substrate (glass plate) through the intermediary of a monoclinic undercoat layer (ZrO2), and no dead layer is substantially present between the photocatalyst layer and the undercoat layer. Also, by providing a peel preventing layer between the substrate and the undercoat layer, it is possible to eliminate film peeling between the photocatalyst layer and the substrate, defects and discoloration. In the above-described TiO2 layer, metal such as tin (Sn), zinc (Zn), molybdenum (Mo) or iron (Fe) is doped. The phrase “no dead layer is substantially present” means that the thickness of the dead layer is 20 nm or less. The thickness of the photocatalyst layer is preferably from 1 nm to 1,000 nm, more preferably from 1 nm to 500 nm.

Abstract: A method for forming a zirconium compound film on a substrate by a sputtering process using a zirconium target which contains a metal (such as tin or zinc) of which the sputtering yield in an argon atmosphere is more than twice that of zirconium in place of a conventional metallic zirconium target. An article coated with the zirconium compound film and a sputtering target used for coating the film are provided. It is desirable that the content of the metal be 1-45 at %, but a third metal can be added thereto.

Abstract: A method for forming a zirconium compound film on a substrate by a sputtering process using a zirconium target which contains a metal (such as tin or zinc) of which the sputtering yield in an argon atmosphere is more than twice that of zirconium in place of a conventional metallic zirconium target. An article coated with the zirconium compound film and a sputtering target used for coating the film are provided. It is desirable that the content of the metal be 1-45 at %, but a third metal can be added thereto.

Abstract: A surface of a glass plate is coated with a first n-type semiconductor film which is a 50 nm-thick niobium oxide film as a primer layer. The primer layer is coated with a 250 nm-thick photocatalyst film comprising titanium oxide. Thus, an article having a photocatalytically active surface is obtained. The two coating films can be formed by sputtering. The first n-type semiconductor film as the primer layer is selected so as to have a larger energy band gap than the titanium oxide. Due to this constitution, more holes are generated near the film surface. This article can be free from the problem of conventional titanium oxide films having photocatalytic activity that it is difficult to generate many surface holes contributing to photocatalytic activity, because electrons and holes generated by charge separation recombine within the film, making it impossible to effectively heighten catalytic activity.

Abstract: The sheet resistance of titanium oxide film can be controlled in 109 to 1013 &OHgr;/□ by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under and oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.

Abstract: A method for forming a zirconium compound film on a substrate by a sputtering process using a zirconium target which contains a metal (such as tin or zinc) of which the sputtering yield in an argon atmosphere is more than twice that of zirconium in place of a conventional metallic zirconium target. An article coated with the zirconium compound film and a sputtering target used for coating the film are provided. It is desirable that the content of the metal be 1-45 at %, but a third metal can be added thereto.

Abstract: This invention relates to an article having a substrate with a photocatalyst coating film formed thereon by ae sputtering method, characterized in that the photocatalyst coating film comprises titanium oxide as a main component and at least one kind of metal having a sputtering rate for Ar being 0.9 to 2.7 times that of Ti, preferably at least one kind of metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr, in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed by a method using a Ti metal sputtering target or a Ti sub-oxide sputtering target containing the metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two kinds of targets for two sputtering cathodes and applying reversing potential so as to have a cathode and an anode alternately.

Abstract: This invention relates to an article having a substrate with a photocatalyst coating film formed thereon by ae sputtering method, characterized in that the photocatalyst coating film comprises titanium oxide as a main component and at least one kind of metal having a sputtering rate for Ar being 0.9 to 2.7 times that of Ti, preferably at least one kind of metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr, in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed by a method using a Ti metal sputtering target or a Ti sub-oxide sputtering target containing the metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two kinds of targets for two sputtering cathodes and applying reversing potential so as to have a cathode and an anode alternately.

Abstract: A photocatalytic member including a titanium-based oxide film disposed on one of the major surfaces of a transparent substrate, the titanium-based oxide film having a photocatalytic function and a physical thickness of 50 to 500 nm; and a primer film interposed between the transparent substrate and the titanium-based oxide film, the primer film being composed of two layers and having a total physical thickness of 40 to 200 nm, the layer of the primer film adjoining the transparent substrate having at least a function of blocking the gas and impurities which are discharged or eluted from the transparent substrate, and the layer of the primer film adjoining the titanium-based oxide having a larger refractive index than that of the layer adjoining the transparent substrate; in which the primer film reduces the dependence of the color on the thickness of the titanium-based oxide film, and the color of reflected visible light and the color of transmitted visible light of one of the major surfaces of the transparen

Abstract: The surface resistance of a titanium oxide film can be controlled in 109 to 1013 &OHgr;/ by coating a titanium oxide film on a substrate by sputtering a target containing metallic titanium under an atmosphere at reduced pressure and then subjecting the film to heat treatment under an oxidizing, inert or reducing atmosphere, depending on the oxygen-deficient state of the film. It is possible that a small amount of niobium oxide is contained in the titanium oxide, or a niobium oxide film is provided as an underlying film.

Abstract: An article having a substrate and a photocatalyst coating film formed thereon by the sputtering method, characterized in that the photocatalyst coating film comprises a titanium oxide as a main component and at least one metal having a sputtering rate for Ar which is 0.9 to 2.7 times that of Ti, preferably at least one metal selected from the group consisting of Fe, V, Mo, Nb, Al and Cr in an amount of 0.01 to 10 wt % in terms of the sum of such metals. The coating film is formed on the substrate by a method using a sputtering target of Ti metal or a Ti suboxide containing the at least one metal in an amount of 0.01 to 10 wt % in terms of the sum of such metals, or a method using two sputtering targets to which reversing voltages are applied in a manner such that the two targets become a positive electrode and a negative electrode alternatively.

Abstract: A conductive sinter obtained from a mixture of titanium oxide particles and 2.5% by weight niobium oxide particles is used as a target in direct current sputtering to form a photocatalytically active film mainly comprising titanium oxide on a glass substrate. The target has a surface resistance of 500 &OHgr;/□ or lower and the sputtering is conducted while heating the substrate at 230° C. The photocatalytically active film is based on an amorphous matrix. This process is free from problems of a conventional process in which a photocatalytically active titanium oxide film is deposited by reactive sputtering using titanium metal as a target. The problems are that the substrate needs to be heated to 350° C. or higher and that the deposited film does not have high photocatalytic activity.