Patents by Inventor Yoshifumi Noto

Yoshifumi Noto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • High-molecular weight polyorganosilyl silicate and process for producing the same
    Patent number: 5932679
    Abstract: A partially silylated organosilicic acid polymer is disclosed. The polymer has a weight average molecular weight of from 2,000 to 6,000 and is prepared by silylating a purified sodium silicate having an M.sub.w /M.sub.n ratio of not more than 1.8.
    Type: Grant
    Filed: July 17, 1997
    Date of Patent: August 3, 1999
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Yoshifumi Noto, Koichiro Matsuki
  • High-molecular weight polyorganosilyl silicate and process for producing the same
    Patent number: 5686550
    Abstract: A high-molecular weight polyorganosilyl silicate having a weight-average molecular weight of 30,000 to 2,000,000 on polystyrene conversion in which the repeating units form a ladder structure through siloxane bonding, and the ladder structures are further bonded together through siloxane bonding is disclosed. Also disclosed is a process for producing the polymer. The polymer is useful as a coating material or a film-forming material to provide a coating film or a film having excellent electrical characteristics, weather resistance, adhesion, water repellency, processability and scratch resistance.
    Type: Grant
    Filed: March 24, 1995
    Date of Patent: November 11, 1997
    Assignee: Dainippon Ink and Chemicals, Inc.
    Inventors: Yoshifumi Noto, Koichiro Matsuki