Patents by Inventor Yoshifumi Oda

Yoshifumi Oda has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8663432
    Abstract: A magnetron sputtering apparatus of the invention includes: a sputtering chamber in which a target can be opposed to an object to be subjected to film formation; a gas introduction port facing the sputtering chamber; a magnet provided outside the sputtering chamber and opposite to the target and being rotatable about a rotation center which is eccentric with respect to center of the magnet; a sensor configured to detect a circumferential position of the magnet in a plane of rotation of the magnet; and a controller configured to start voltage application to the target to cause electrical discharge in the sputtering chamber on the basis of the circumferential position of the rotating magnet and gas pressure distribution in the sputtering chamber.
    Type: Grant
    Filed: February 6, 2009
    Date of Patent: March 4, 2014
    Assignees: Shibaura Mechatronics Corporation, Sony DADC Corporation
    Inventors: Masaaki Iwasaki, Yoshifumi Oda, Takehiro Sato
  • Publication number: 20110114473
    Abstract: A magnetron sputtering apparatus of the invention includes: a sputtering chamber in which a target can be opposed to an object to be subjected to film formation; a gas introduction port facing the sputtering chamber; a magnet provided outside the sputtering chamber and opposite to the target and being rotatable about a rotation center which is eccentric with respect to center of the magnet; a sensor configured to detect a circumferential position of the magnet in a plane of rotation of the magnet; and a controller configured to start voltage application to the target to cause electrical discharge in the sputtering chamber on the basis of the circumferential position of the rotating magnet and gas pressure distribution in the sputtering chamber.
    Type: Application
    Filed: February 6, 2009
    Publication date: May 19, 2011
    Applicants: SHIBAURA MECHATRONICS CORPORATION, SONY DISC & DIGITAL SOLUTIONS INC.
    Inventors: Masaaki Iwasaki, Yoshifumi Oda, Takehiro Sato
  • Patent number: 6337003
    Abstract: The invention provides a vacuum apparatus, which is equipped with a drive mechanism of small size and does not need a special mechanism for vacuum seals. This drive mechanism includes an air bag container 41 which is provided fixedly in an airtight vessel with one end open, an air bag 42 stored in the container, and a source for supplying high pressure gas penetrating through the air bag container 41. A part of the air bag 42 is projected from the open end of the air bag container 41 by supplying air bag 42 with a high pressure gas with a high pressure gas supply source 43, thereby moving objects in the vacuum vessel.
    Type: Grant
    Filed: August 18, 2000
    Date of Patent: January 8, 2002
    Assignee: Shibaura Mechatronics Corporation
    Inventors: Kyoji Kinokiri, Jiro Ikeda, Yoshifumi Oda
  • Patent number: 4555398
    Abstract: A vasodilator product having a sustained releasing function is produced by mixing and kneading an atoxic agent having vasodilating activity with a setting or thermoplastic resin and then molding them to form the molded product.Further, the vasodilator can be molded integratedly together with a medical device to be implanted into a human body. These vasodilators can be used not only for an operation of cerebral aneurysm, but also for drainage and vasodilator after microvascular anastomosis and endarterectomy.
    Type: Grant
    Filed: September 22, 1983
    Date of Patent: November 26, 1985
    Assignee: Chisso Corporation
    Inventor: Yoshifumi Oda