Patents by Inventor Yoshifumi Ogiso

Yoshifumi Ogiso has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7381671
    Abstract: Disclosed is a ferroelectric ceramic composition that does not contain harmful lead and that have satisfactory sinterability, as well as a nonlinear optical element including the ferroelectric ceramic composition. The ferroelectric ceramic composition includes a main component represented by a general formula (Ba1-x-ySrxCay)Ag1-dNb5O15-d/2 and having a tungsten bronze structure; and auxiliary components represented by a general formula aMnO2+bSiO2 (wherein a and b each represent parts by weight with respect to 100 parts by weight of the main component), wherein x, y, a, b, and d meet expressions 0.1?x+y?0.8, a+b?5, and 0?d?0.6.
    Type: Grant
    Filed: November 17, 2004
    Date of Patent: June 3, 2008
    Assignee: Murata Manufacturing Co., Ltd.
    Inventor: Yoshifumi Ogiso
  • Publication number: 20070161497
    Abstract: Disclosed is a ferroelectric ceramic composition that does not contain harmful lead and that have satisfactory sinterability, as well as a nonlinear optical element including the ferroelectric ceramic composition. The ferroelectric ceramic composition includes a main component represented by a general formula (Ba1-x-ySrxCay)Ag1-dNb5O15-d/2 and having a tungsten bronze structure; and auxiliary components represented by a general formula aMnO2+bSiO2 (wherein a and b each represent parts by weight with respect to 100 parts by weight of the main component), wherein x, y, a, b, and d meet expressions 0.1?x+y?0.8, a+b?5, and 0?d?0.6.
    Type: Application
    Filed: November 17, 2004
    Publication date: July 12, 2007
    Inventor: Yoshifumi Ogiso
  • Patent number: 6686256
    Abstract: A method of manufacturing chip type electronic parts, comprises the steps of: applying a photo-active catalyst liquid to chip substrates to form a photo-sensitive film consisting of the photo-active catalyst liquid on the chip substrates; arranging the chip substrates with respect to a light source in a manner such that portions of the chip substrates on which electrodes are to be formed will become light irradiation portions; irradiating the chip substrates with a light so as to activate irradiated portions of the photo-sensitive film; dipping the chip substrates in an electroless plating bath and precipitating a plating metal on said activated portions.
    Type: Grant
    Filed: November 30, 2001
    Date of Patent: February 3, 2004
    Assignee: Murata Manufacturing Co, Ltd.
    Inventors: Osamu Kanoh, Yasushi Yoshida, Yoshifumi Ogiso
  • Patent number: 6495456
    Abstract: A method of manufacturing chip type electronic parts, comprises the steps of: applying a photo-active catalyst liquid to chip substrates to form a photo-sensitive film consisting of the photo-active catalyst liquid on the chip substrates; arranging the chip substrates with respect to a light source in a manner such that portions of the chip substrates on which electrodes are to be formed will become light irradiation portions; irradiating the chip substrates with a light so as to activate irradiated portions of the photo-sensitive film; dipping the chip substrates in an electroless plating bath and precipitating a plating metal on said activated portions.
    Type: Grant
    Filed: October 14, 1999
    Date of Patent: December 17, 2002
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Osamu Kanoh, Yasushi Yoshida, Yoshifumi Ogiso
  • Publication number: 20020076926
    Abstract: A method of manufacturing chip type electronic parts, comprises the steps of: applying a photo-active catalyst liquid to chip substrates to form a photo-sensitive film consisting of the photo-active catalyst liquid on the chip substrates; arranging the chip substrates with respect to a light source in a manner such that portions of the chip substrates on which electrodes are to be formed will become light irradiation portions; irradiating the chip substrates with a light so as to activate irradiated portions of the photo-sensitive film; dipping the chip substrates in an electroless plating bath and precipitating a plating metal on said activated portions.
    Type: Application
    Filed: November 30, 2001
    Publication date: June 20, 2002
    Applicant: Murata Manufacturing Co., Ltd.
    Inventors: Osamu Kanoh, Yasushi Yoshida, Yoshifumi Ogiso
  • Patent number: 5989787
    Abstract: A hydrophilic activating catalytic solution for electroless plating is a mixture of lactate, palladium and alkaline medium. The solution enables depositing palladium catalyst in a short time radiation exposure and removing unwanted photo-sensitive film more effectively by water or the like. The lactate preferably comprises copper lactate and/or zinc lactate and the palladium salt is preferably palladium chloride.
    Type: Grant
    Filed: February 23, 1998
    Date of Patent: November 23, 1999
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Osamu Kanoh, Yasushi Yoshida, Yoshifumi Ogiso
  • Patent number: 5494711
    Abstract: Disclosed herein is a method of preparing an InSb thin film, which comprises a step of physically sticking InSb powder onto a major surface of a substrate, and a step of depositing an InSb thin film on the major surface of the substrate provided with the as-stuck InSb powder by a method such as vacuum evaporation.
    Type: Grant
    Filed: January 11, 1994
    Date of Patent: February 27, 1996
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Toshikazu Takeda, Yoshifumi Ogiso, Takuji Nakagawa, Atsuo Senda
  • Patent number: 5432494
    Abstract: A magnetoresistance element includes an insulating substrate, a patterned magnetoresistance film of a ferromagnetic material deposited thereon and having a uniaxis magnetic anisotropy, and a patterned hard biasing layer of a ferromagnetic material deposited on the substrate. The biasing layer is divided into two parts on both sides of the magnetoresistance layer and magnetized in the direction parallel to a line which intersects the easy direction of magnetization of the patterned magnetoresistance layer at an acute angle (.theta.).
    Type: Grant
    Filed: May 26, 1993
    Date of Patent: July 11, 1995
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Keizou Inoue, Masaaki Kanae, Yoshifumi Ogiso, Takuji Nakagawa
  • Patent number: 4737757
    Abstract: A thin-film resistor comprising a thin film of a nitride of at least one element belonging to groups III-VI of the periodic table. The thin-film resistor has a metal oxide layer comprising at least one metal oxide selected from the group consisting of manganese oxide, iron oxide, cobalt oxide, nickel oxide, zinc oxide, indium oxide, tin oxide and indium tin oxide interposed between the nitride thin film and an electrode for external connection.
    Type: Grant
    Filed: June 11, 1986
    Date of Patent: April 12, 1988
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Atsuo Senda, Toshi Numata, Takuji Nakagawa, Yoshifumi Ogiso
  • Patent number: 4604676
    Abstract: A monolithic ceramic capacitor comprises a dielectric ceramic element assembly, metal electrodes for external connection and conductive metal oxide layers formed between the ceramic element assembly and the metal electrodes for preventing reduction of metal oxide forming the dielectric ceramic material.
    Type: Grant
    Filed: September 30, 1985
    Date of Patent: August 5, 1986
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Atsuo Senda, Toshi Numata, Takuji Nakagawa, Yoshifumi Ogiso