Patents by Inventor Yoshiharu Honjo

Yoshiharu Honjo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20020126387
    Abstract: An optical multilayer structure material has a structure such that, on a substrate, a conductive layer in contact with the substrate, a gap portion having a size that enables an interference phenomenon to occur and can be changed, and an optical thin film are formed in this order. The circumference of a movable portion in the optical thin film is uniformly supported by supporting portions, suppressing generation of strain due to an internal stress. Through holes are formed in the movable portion to allow an etchant to easily reach a sacrifice layer when forming a gap portion by etching for sacrifice layer. There is provided an optical multilayer structure material having a simple construction, which can suppress generation of strain due to an internal stress and can be advantageously used in an image display apparatus.
    Type: Application
    Filed: January 8, 2002
    Publication date: September 12, 2002
    Inventors: Hiroichi Ishikawa, Takuya Makino, Hidenori Watanabe, Yoshiharu Honjo
  • Patent number: 6284382
    Abstract: Disclosed is an antireflection film used to be stuck on the surface of a glass panel of a CRT, which can be inexpensively manufactured at a high productivity while satisfying all of requirements regarding its adhesive strength, reflectance characteristic, electric resistance and total light transmittance. The antireflection film is formed by stacking silicon oxide films and indium tin oxide films on a base film in multilevels, wherein the thickness of the uppermost silicon oxide film of the antireflection film is thicker than the indium tin oxide film directly under the uppermost silicon oxide film, and the lowermost silicon oxide film, positioned at the interface with the base film, of the antireflection film is a SiOx film where the value x is in a range of 0.5 to 1.9.
    Type: Grant
    Filed: November 25, 1998
    Date of Patent: September 4, 2001
    Assignee: Sony Corporation
    Inventors: Hiroichi Ishikawa, Barret Lippey, Tomio Kobayashi, Yoshihiro Oshima, Shinobu Mitsuhashi, Masataka Yamashita, Yoshiharu Honjo, Koichi Kaneko
  • Patent number: 6111648
    Abstract: Disclosed is a black roll for optical measurement, which is used for a process of moving a film substrate around the black roll, and measuring optical characteristics of a thin film formed on the film substrate by using an optical monitor disposed in proximity to the film substrate. The black roll includes: a rotating cylinder colored in black, with the circumferential surface of which the film substrate is in close-contact; wherein the rotating cylinder has at least one groove formed in the circumferential surface of the rotating cylinder in such a manner as to extend in the circumferential direction, the groove being adapted to absorb light which is emitted from the optical monitor, passing through the film substrate, and is made incident on the black roll. The black roll is effective to eliminate almost all reflectance of light from the black roll in the case of measuring the reflectance of an optical thin film formed on a film substrate moved in such a manner as to be in close-contact with the black roll.
    Type: Grant
    Filed: August 6, 1999
    Date of Patent: August 29, 2000
    Assignee: Sony Corporation
    Inventor: Yoshiharu Honjo