Patents by Inventor Yoshiharu Konya

Yoshiharu Konya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7615201
    Abstract: By using a halogen-free siloxane and an organometallic compound containing at least one metal other than silicon as feed stocks, and simultaneously atomizing and burning them in a flame, spherical particles of silica-containing compound oxide are prepared which are substantially halogen-free, consist of 0.5-99% by weight of metal oxides and the balance of silica, and have a particle size of 10 nm to 3 ?m. The particles are useful as a filler in epoxy resin base semiconductor sealants, a refractive index modifier or the like.
    Type: Grant
    Filed: July 23, 2002
    Date of Patent: November 10, 2009
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 7332144
    Abstract: A hydrophobic silica fine powder is prepared by premixing a hydrophilic silica fine powder with a dimer diol siloxane or cyclic siloxane as a hydrophobizing agent, mixing them in a ball mill for achieving dispersion and for achieving cleavage or disintegration and consolidation, and thereafter heating at 100-300° C. in an ammonia or amine-containing atmosphere. The powder has an aerated bulk density of 100-300 g/l, a specific surface area of 40-300 m2/g, a primary particle diameter of 10-120 nm, and a degree of hydrophobization of 40-80 as measured by methanol titration and is less bulky, easy to handle and disperse and stable in a kneaded mixture.
    Type: Grant
    Filed: November 27, 2002
    Date of Patent: February 19, 2008
    Assignee: Shin - Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20060115405
    Abstract: A hydrophobic silica fine powder is prepared by premixing a hydrophilic silica fine powder with a dimer diol siloxane or cyclic siloxane as a hydrophobizing agent, mixing them in a ball mill for achieving dispersion and for achieving cleavage or disintegration and consolidation, and thereafter heating at 100-300° C. in an ammonia or amine-containing atmosphere. The powder has an aerated bulk density of 100-300 g/l, a specific surface area of 40-300 m2/g, a primary particle diameter of 10-120 nm, and a degree of hydrophobization of 40-80 as measured by methanol titration and is less bulky, easy to handle and disperse and stable in a kneaded mixture.
    Type: Application
    Filed: December 23, 2005
    Publication date: June 1, 2006
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 6797447
    Abstract: By simultaneously atomizing a siloxane and two organometallic compounds of different metals M1 and M2 exclusive of silicon in a flame for combustion, spherical amorphous ternary complex oxide fine particles are obtained which are substantially free of chlorine, have a particle size of 10-500 nm, and have a silica content A of 1-99 wt %, a M1 oxide content B of 1-90 wt % and a M2 oxide content C of 1-90 wt %, all based on the weight of oxides excluding carbon, provided that A+B+C≈100. An electrostatic image developer comprising the fine particles is improved in fluidity and cleanability and bears a uniform and stable quantity of electric charge.
    Type: Grant
    Filed: November 19, 2002
    Date of Patent: September 28, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 6777152
    Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 10-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.
    Type: Grant
    Filed: June 26, 2002
    Date of Patent: August 17, 2004
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20030138716
    Abstract: By simultaneously atomizing a siloxane and two organometallic compounds of different metals M1 and M2 exclusive of silicon in a flame for combustion, spherical amorphous ternary complex oxide fine particles are obtained which are substantially free of chlorine, have a particle size of 10-500 nm, and have a silica content A of 1-99 wt %, a M1 oxide content B of 1-90 wt % and a M2 oxide content C of 1-90 wt %, all based on the weight of oxides excluding carbon, provided that A+B+C≈100. An electrostatic image developer comprising the fine particles is improved in fluidity and cleanability and bears a uniform and stable quantity of electric charge.
    Type: Application
    Filed: November 19, 2002
    Publication date: July 24, 2003
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20030103890
    Abstract: A hydrophobic silica fine powder is prepared by premixing a hydrophilic silica fine powder with a dimer diol siloxane or cyclic siloxane as a hydrophobizing agent, mixing them in a ball mill for achieving dispersion and for achieving cleavage or disintegration and consolidation, and thereafter heating at 100-300° C. in an ammonia or amine-containing atmosphere. The powder has an aerated bulk density of 100-300 g/l, a specific surface area of 40-300 m2/g, a primary particle diameter of 10-120 nm, and a degree of hydrophobization of 40-80 as measured by methanol titration and is less bulky, easy to handle and disperse and stable in a kneaded mixture.
    Type: Application
    Filed: November 27, 2002
    Publication date: June 5, 2003
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20030086855
    Abstract: By using a halogen-free siloxane and an organometallic compound containing at least one metal other than silicon as feed stocks, and simultaneously atomizing and burning them in a flame, spherical particles of silica-containing compound oxide are prepared which are substantially halogen-free, consist of 0.5-99% by weight of metal oxides and the balance of silica, and have a particle size of 10 nm to 3 &mgr;m. The particles are useful as a filler in epoxy resin base semiconductor sealants, a refractive index modifier or the like.
    Type: Application
    Filed: July 23, 2002
    Publication date: May 8, 2003
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 6551567
    Abstract: Spherical, non-crystalline silica particles made by burning a non-halogenated siloxane starting material are substantially halogen-free, and have a content of metallic impurities other than silicon of not more than 1 ppm, a particle size of 10 nm to 10 &mgr;m and a specific surface area of 3-300 m2/g. Production of the particles is carried out by oxidative combustion of the non-halogenated siloxane in a flame at a high adiabatic flame temperature to effect the formation of a large number of core particles and promote their coalescence and growth.
    Type: Grant
    Filed: August 15, 2001
    Date of Patent: April 22, 2003
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20030059700
    Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 10-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.
    Type: Application
    Filed: June 26, 2002
    Publication date: March 27, 2003
    Applicant: SHIN-ETSU CHEMICAL CO., LTD.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20030044706
    Abstract: By atomizing a siloxane and an organic titanium compound for flame combustion, spherical complex oxide fine particles of amorphous silica-titania are obtained having a particle size of 10-300 nm, a specific surface area of 20-100 m2/g, and a titania content of 1-99% by weight. By hydrophobizing the fine particles and adding them to a toner, a developer is obtained which is improved in fluidity, cleanability and uniform and stable charging.
    Type: Application
    Filed: March 29, 2002
    Publication date: March 6, 2003
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 6387302
    Abstract: Spherical silica powder is produced by feeding silica powder having an average particle size of 0.3-40 &mgr;m to a burner flame formed with a flammable gas so as to continuously melt and spheroidize the particles within the flame. The use of a non-halogenated siloxane and/or alkoxysilane as an auxiliary flame-generating source raises the flame temperature and increases the length of the composite flame formed by combustion of the fuel gas with the siloxane or alkoxysilane. Moreover, the fine particles of silica that form as a result of siloxane or alkoxysilane combustion unite and coalesce with the particles of starting silica. These effects accelerate melting and spheroidization of the starting silica powder, resulting in thermally efficient and cost-effective spherical silica powder production.
    Type: Grant
    Filed: August 24, 2001
    Date of Patent: May 14, 2002
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20020041963
    Abstract: Spherical, non-crystalline silica particles made by burning a non-halogenated siloxane starting material are substantially halogen-free, and have a content of metallic impurities other than silicon of not more than 1 ppm, a particle size of 10 nm to 10 &mgr;m and a specific surface area of 3-300 m2/g. Production of the particles is carried out by oxidative combustion of the non-halogenated siloxane in a flame at a high adiabatic flame temperature to effect the formation of a large number of core particles and promote their coalescence and growth.
    Type: Application
    Filed: August 15, 2001
    Publication date: April 11, 2002
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Publication number: 20020024161
    Abstract: Spherical silica powder is produced by feeding silica powder having an average particle size of 0.3-40 &mgr;m to a burner flame formed with a flammable gas so as to continuously melt and spheroidize the particles within the flame. The use of a non-halogenated siloxane and/or alkoxysilane as an auxiliary flame-generating source raises the flame temperature and increases the length of the composite flame formed by combustion of the fuel gas with the siloxane or alkoxysilane. Moreover, the fine particles of silica that form as a result of siloxane or alkoxysilane combustion unite and coalesce with the particles of starting silica. These effects accelerate melting and spheroidization of the starting silica powder, resulting in thermally efficient and cost-effective spherical silica powder production.
    Type: Application
    Filed: August 24, 2001
    Publication date: February 28, 2002
    Inventors: Yoshiharu Konya, Koichiro Watanabe, Susumu Ueno
  • Patent number: 6031026
    Abstract: In a first step, a crosslinkable organopolysiloxane oil (2) is mixed with an inorganic filler (3) in a flow jet mixer (1) to form a flowing silicone rubber compound. In a second step, the silicone rubber compound is fed into a tank (6) equipped at the bottom with a vacuum discharge pump (8) and maintained in vacuum where the compound is continuously deaerated, and a thixotropy controlling agent (10) is then added and mixed with the compound in a mixer (9). In a third step, a crosslinking agent (12) is added and mixed with the silicone rubber compound in a KRC kneader (11), and the compound is degassed in a mixer (13). The process continuously produces an RTV silicone rubber composition which is anti-sagging and improved in applicability on use.
    Type: Grant
    Filed: June 12, 1998
    Date of Patent: February 29, 2000
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yuki Tateyama, Yoshiharu Konya, Takao Kanaya
  • Patent number: 5817285
    Abstract: Silicon nitride powder is continuously prepared by feeding metallic silicon powder into a fluidized bed comprising silicon nitride powder and nitrogen or ammonia gas and discharging a nitrided product from the fluidized bed. The metallic silicon powder is pretreated at a temperature of 1,000.degree.-1,400.degree. C. under a vacuum of 0.001-100 Torr before it is subject to nitriding reaction.
    Type: Grant
    Filed: December 4, 1996
    Date of Patent: October 6, 1998
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hirofumi Fukuoka, Yoshiharu Konya, Masanori Fukuhira
  • Patent number: 5573689
    Abstract: In a fluidized bed reactor for preparing a metal nitride by feeding metal powder and a non-oxidizing gas containing N.sub.2 or NH.sub.3 into a reaction tube (1) to form a fluidized bed (2) therein and heating the fluidized bed for nitriding the metal powder, an envelope (11) encloses the reaction tube (1) for preventing the surrounding air from entering the reaction tube. A heater (9) is disposed outside the envelope (11) for heating the fluidized bed (2) to 1,200.degree. C. or higher. The envelope prevents penetration of the surrounding air into the reaction tube and also prevents deterioration of the heater and surrounding components by scattering of metal fines. The reactor ensures safe operation to prepare metal nitride powder of high purity on an industrial scale.
    Type: Grant
    Filed: January 31, 1996
    Date of Patent: November 12, 1996
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hirofumi Fukuoka, Yoshiharu Konya, Masanori Fukuhira, Ichiro Ishizaka
  • Patent number: 5456896
    Abstract: Silicon nitride powder is prepared by nitriding metallic silicon powder in a nitriding gas atmosphere at a temperature of 1,000.degree. C.-1,500.degree. C. Midway the nitriding step, the nitrided product is heat treated in an inert non-oxidizing gas atmosphere or vacuum at a temperature higher than the nitriding temperature, but lower than 1,600.degree. C. The product is nitrided again, obtaining high .alpha.-content silicon nitride powder.
    Type: Grant
    Filed: July 12, 1994
    Date of Patent: October 10, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Hirofumi Fukuoka, Masaki Watanabe, Yoshiharu Konya, Masanori Fukuhira
  • Patent number: 5441694
    Abstract: In a method for preparing a high .alpha.-type silicon nitride powder by adding to and mixing with metallic silicon powder a copper catalyst and nitriding the mixture in a non-oxidizing gas atmosphere containing nitrogen or ammonia at 1,000.degree. to 1,500.degree. C., the amount of copper catalyst is limited to from 0.05 % to less than 0.5 % by weight of copper based on the weight of the metallic silicon. There is obtained silicon nitride powder of high purity at low cost and high efficiency since the copper catalyst can be efficiently removed from the silicon nitride powder through conventional acid treatment.
    Type: Grant
    Filed: June 10, 1994
    Date of Patent: August 15, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Masanori Fukuhira, Hirofumi Fukuoka, Yoshiharu Konya, Masaki Watanabe
  • Patent number: 4650511
    Abstract: The invention provides an efficient method for the dehydration, i.e. removal of silicon-bonded hydroxy groups, of a porous silica body before vitrification as a precursor of quartz glass-made optical fibers obtained by the flame hydrolysis of a silicon compound and deposition of fine silica particles formed therefrom. The problems and disadvantages accompanying the use of conventional dehydrating agents can be solved in the invention by heating the hydroxy-containing porous silica body at 1000.degree. to 1300.degree. C. in an atmosphere containing thionyl fluoride or sulfuryl fluoride as the dehydrating agent which is also effective as a dechlorinating agent so that the optical fibers prepared from the quartz glass material of the invention are highly transparent and resistant against hydrogen-containing atmosphere at elevated temperatures.
    Type: Grant
    Filed: May 31, 1985
    Date of Patent: March 17, 1987
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Kazuo Koya, Yoshiharu Konya