Patents by Inventor Yoshiharu Mitono

Yoshiharu Mitono has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 4868630
    Abstract: A semiconductor integrated circuit including at least one conventional inner cell region and an outer cell region. The outer cell region comprising a plurality of outer cells. Each outer cell is comprised of circuit elements for achieving a predetermined logic function, in addition to circuit elements for achieving the conventional buffer function of an outer cell. Further, two or more adjacent outer cells are connected each other and act as an independent circuit so as to form a macro-cell.
    Type: Grant
    Filed: August 27, 1985
    Date of Patent: September 19, 1989
    Assignee: Fujitsu Limited
    Inventors: Tetsu Tanizawa, Yoshiharu Mitono, Hitoshi Omichi
  • Patent number: 4613887
    Abstract: In an output transistor of transistor-transistor logic (TTL) circuits, an output transistor of TTL is provided with, in a region between a p-type base region and the p-type semiconductor substrate on which a TTL circuit is fabricated, a p.sup.- diffusion which causes carriers stored in the base region when the output transistor is switched from ON state to OFF state to be discharged quickly. When the output transistor is OFF, the p.sup.- diffusion is pinched off and no current flows. Thus, when the output transistor is switched from OFF state to ON state, the output voltage changes sharply. Because of this, the switching speed of the TTL is improved. In another embodiment, a p.sup.- region is formed between a p-type base region and p.sup.+ isolation diffusion, and an n.sup.+ diffusion is formed to cover at least one part of the p.sup.- diffusion and is connected to an n-type collector region. In another embodiment, a p-type base region extends to the p.sup.+ isolation diffusion, and an n.sup.
    Type: Grant
    Filed: January 27, 1984
    Date of Patent: September 23, 1986
    Assignee: Fujitsu Limited
    Inventors: Takeshi Fukuda, Yoshiharu Mitono, Tadashi Kiriseko
  • Patent number: 4564773
    Abstract: In a semiconductor device having a gate array structure, a macro-cell includes more basic cells than conventional macro-cells, for preforming a logic function, whereby the density of the terminals in a direction vertical to a direction in which wiring lines are drawn, is decreased.
    Type: Grant
    Filed: August 11, 1982
    Date of Patent: January 14, 1986
    Assignee: Fujitsu Limited
    Inventors: Tetsu Tanizawa, Hitoshi Omichi, Yoshiharu Mitono
  • Patent number: 4523106
    Abstract: An integrated circuit device such as a gate array or a master slice LSI device which is formed on a semiconductor chip and which comprises an inner cell array including a plurality of inner cells, an outer cell array including a plurality of outer cells formed around the inner cell array, a power supply portion having one or more outer power supply lines, and a plurality of inner power supply lines connected to the outer power supply lines and formed on the inner cell array. The ratio of the pitch length of the outer cells to the pitch length of the inner power supply lines or the inner cells is determined by the ratio of two integers. In the integrated circuit device, at least one set of an outer cell, and an inner cell which are arranged in a predetermined positional relation, is formed a plurality of times along a side of the semiconductor chip.
    Type: Grant
    Filed: August 25, 1982
    Date of Patent: June 11, 1985
    Assignee: Fujitsu Limited
    Inventors: Tetsu Tanizawa, Hitoshi Omichi, Yoshiharu Mitono
  • Patent number: 4499484
    Abstract: In an integrated circuit manufactured by the master slice method, the feeder line for supplying electric power to a unit-cell array is gradually narrowed in width from the periphery to the middle of the array. As a result, sufficient voltage is supplied to the unit-cells at the middle of the IC and an area of an interconnecting domain for connecting the unit-cells is expanded.
    Type: Grant
    Filed: September 8, 1982
    Date of Patent: February 12, 1985
    Assignee: Fujitsu Limited
    Inventors: Tetsu Tanizawa, Hitoshi Omichi, Yoshiharu Mitono
  • Patent number: 4449063
    Abstract: A fundamental logic circuit used, for example, in an electronic computer, comprising an output inverter transistor and a switching transistor which discharges a base charge stored in a storage capacitance in a base-emitter junction of the output inverter transistor when the output inverter transistor changes from the turned on condition to the turned off condition.
    Type: Grant
    Filed: August 22, 1980
    Date of Patent: May 15, 1984
    Assignee: Fujitsu Limited
    Inventors: Hitoshi Ohmichi, Hiromu Enomoto, Yasushi Yasuda, Yoshiharu Mitono, Taketo Imaizumi
  • Patent number: 4409495
    Abstract: A Schmitt trigger circuit has an input-voltage hysteresis characteristic for reducing noise sensitivity and preventing oscillation. In its input stage there is a multi-emitter transistor, and in its output stage a second transistor. The multi-emitter transistor comprises a first emitter and a second emitter. The first emitter is associated with a switching operation in response to the input voltage applied to the base of the multi-emitter transistor. The second emitter is associated with the operation of drawing charges from the base of the second transistor through the base of the multi-emitter transistor to the ground. The use of the multi-emitter transistor prevents the input current from increasing greatly as the input voltage falls.
    Type: Grant
    Filed: May 29, 1981
    Date of Patent: October 11, 1983
    Assignee: Fujitsu Limited
    Inventors: Hiromu Enomoto, Yoshiharu Mitono, Yasushi Yasuda, Taketo Imaizumi, Hiroshi Ohta
  • Patent number: 4388755
    Abstract: A structure and method for manufacturing semiconductor devices by the master slice method, in which various kinds of semiconductor devices are manufactured through utilization of a common master pattern and a plurality of different kinds of selective wiring patterns. A number of bipolar transistors each having plural emitter regions, is formed in a predetermined region, or portion, of a semiconductor substrate by employing a common master pattern, and the plural emitter regions of the respective bipolar transistors are selectively connected by the associated wiring patterns of each thereof to form corresponding bipolar transistors of different, predetermined D.C. characteristics. When manufacturing many different kinds of semiconductor devices by the master slice method, the area which would be wasted on the semiconductor substrate by prior art techniques is greatly reduced, thus providing for enhanced area efficiency.
    Type: Grant
    Filed: November 17, 1980
    Date of Patent: June 21, 1983
    Assignee: Fujitsu Limited
    Inventors: Hiromu Enomoto, Yasushi Yasuda, Yoshiharu Mitono, Taketo Imaizumi, Hitoshi Ohmichi
  • Patent number: 4276556
    Abstract: A semiconductor device including a diode and a bipolar transistor which are connected to each other and formed in an isolated area of a semiconductor layer has a diffused region formed between a base region of the bipolar transistor and a formation region of the diode across the isolated area. The diffused region has the same conductivity type as that of the base region, so that a PNPN diode effect does not occur.
    Type: Grant
    Filed: November 15, 1979
    Date of Patent: June 30, 1981
    Assignee: Fujitsu Limited
    Inventors: Hiromu Enomoto, Yasushi Yasuda, Hitoshi Ohmichi, Yoshiharu Mitono