Patents by Inventor Yoshihiko IKETANI
Yoshihiko IKETANI has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11542231Abstract: The present invention aims to provide a method by which fluorine-containing sulfide compounds, particularly sulfide compounds that contain hydrogen and fluorine, can be produced in a simple, low-cost and industrial manner. Provided is a method of producing a fluorine-containing sulfide compound represented by the following formula (2): (F)n-A3-S-A4-(F)m??(2) (wherein A3 and A4 are independently an optionally substituted hydrocarbyl group with a carbon number of 1 to 3; n and m represent the numbers of fluorine atoms binding to A3 and A4, with n+m=1 to 13 being satisfied), comprising reacting a chlorine-containing sulfide compound represented by the following formula (1): (Cl)n-A1-S-A2-(Cl)m??(1) (wherein A1 and A2 are independently an optionally substituted hydrocarbyl group with a carbon number of 1 to 3; n and m represent the numbers of chlorine atoms binding to A1 and A2, with n+m=1 to 13 being satisfied) and a fluorinating agent.Type: GrantFiled: March 29, 2019Date of Patent: January 3, 2023Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Wataru Kashikura, Yoshihiko Iketani, Yuki Sato
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Patent number: 11437244Abstract: A dry etching gas composition is used which contains a saturated or unsaturated hydrofluorocarbon compound (excluding 1,2,2,3-pentafluorocyclobutane and 1,1,2,2-tetrafluorocyclobutane) represented by a general formula (1): CxHyFz (where x, y, and z are integers that satisfy 2?x?4, y+z?2x+2, and 0.5<z/y<2). Use of the etching gas composition containing the above-described hydrofluorocarbon makes it possible to selectively etch a nitrogen-containing silicon-based film (b1) with respect to a silicon oxide film, a non-silicon-based mask material, or a polycrystalline silicon film.Type: GrantFiled: April 2, 2018Date of Patent: September 6, 2022Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Korehito Kato, Yoshihiko Iketani, Yukinobu Shibusawa, Hisashi Shimizu
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Patent number: 11315797Abstract: Provided is a plasma etching method that enables, in a semiconductor fabrication process, selective processing of a film consisting of a single material, such as SiO2 or SiN, or a composite material of SiO2 and SiN over a mask material as well as processing into satisfactorily vertical processed shapes.Type: GrantFiled: June 21, 2019Date of Patent: April 26, 2022Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Korehito Kato, Yoshinao Takahashi, Mitsuharu Shimoda, Yoshihiko Iketani
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Publication number: 20210233774Abstract: Provided is a plasma etching method that enables, in a semiconductor fabrication process, selective processing of a film consisting of a single material, such as SiO2 or SiN, or a composite material of SiO2 and SiN over a mask material as well as processing into satisfactorily vertical processed shapes It is possible, for example, to enhance selectivity over a mask material or other materials excluding an etching target, to reduce damage on sidewalls, and to suppress etching in the lateral direction by generating a plasma of a gas compound having a thioether skeleton represented by general formula (1) or a mixed gas thereof and etching a film consisting of a composite material or a single material, such as SiO2 or SiN, thereby depositing a protective film that contains sulfur atoms and has a lower content of fluorine atoms than the cases of using common hydrofluorocarbon gases.Type: ApplicationFiled: June 21, 2019Publication date: July 29, 2021Inventors: Korehito KATO, Yoshinao TAKAHASHI, Mitsuharu SHIMODA, Yoshihiko IKETANI
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Patent number: 11046629Abstract: An object of the present invention is to provide a simple, low-cost, and industrial method of producing a compound having a polyene skeleton containing hydrogen and fluorine and/or chlorine. A method of producing a halogenated diene represented by formula (1): A1A2C?CA3-CA4=CA5A6 [A1, A2, A5, and A6 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A3 and A4 are each independently hydrogen, fluorine, or chlorine; at least one of A1 to A6 is hydrogen; at least one of A1 to A6 is fluorine or chlorine] comprises a step of subjecting the same or different halogenated olefin(s) represented by formula (2): A7A8C?CA9X [A7 and A8 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A9 is each independently hydrogen, fluorine, or chlorine; X is bromine or iodine] to a coupling reaction in the presence of a zero-valent metal and a metal salt.Type: GrantFiled: February 1, 2019Date of Patent: June 29, 2021Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Wataru Kashikura, Yoshihiko Iketani, Ryo Kimura, Yukinobu Shibusawa
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Publication number: 20210061735Abstract: An object of the present invention is to provide a simple, low-cost, and industrial method of producing a compound having a polyene skeleton containing hydrogen and fluorine and/or chlorine. A method of producing a halogenated diene represented by formula (1): A1A2C?CA3-CA4?CA5A6[A1, A2, A5, and A6 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A3 and A4 are each independently hydrogen, fluorine, or chlorine; at least one of A1 to A6 is hydrogen; at least one of A1 to A6 is fluorine or chlorine] comprises a step of subjecting the same or different halogenated olefin(s) represented by formula (2): A7A8C?CA9X[A7 and A8 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A9 is each independently hydrogen, fluorine, or chlorine; X is bromine or iodine] to a coupling reaction in the presence of a zero-valent metal and a metal salt.Type: ApplicationFiled: February 1, 2019Publication date: March 4, 2021Inventors: Wataru KASHIKURA, Yoshihiko IKETANI, Ryo KIMURA, Yukinobu SHIBUSAWA
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Publication number: 20210047265Abstract: The present invention aims to provide a method by which fluorine-containing sulfide compounds, particularly sulfide compounds that contain hydrogen and fluorine, can be produced in a simple, low-cost and industrial manner. Provided is a method of producing a fluorine-containing sulfide compound represented by the following formula (2): (F)n-A3-S-A4-(F)m??(2) (wherein A3 and A4 are independently an optionally substituted hydrocarbyl group with a carbon number of 1 to 3; n and m represent the numbers of fluorine atoms binding to A3 and A4, with n+m=1 to 13 being satisfied), comprising reacting a chlorine-containing sulfide compound represented by the following formula (1): (Cl)n-A1-S-A2-(Cl)m??(1) (wherein A1 and A2 are independently an optionally substituted hydrocarbyl group with a carbon number of 1 to 3; n and m represent the numbers of chlorine atoms binding to A1 and A2, with n+m=1 to 13 being satisfied) and a fluorinating agent.Type: ApplicationFiled: March 29, 2019Publication date: February 18, 2021Inventors: Wataru KASHIKURA, Yoshihiko IKETANI, Yuki SATO
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Patent number: 10899615Abstract: A chlorine fluoride feeding device and feeding process are provided that can stably generate industrially applicable chlorine fluoride (ClF), control flow rate, and provide continual feed. The feeding process of chlorine fluoride of this invention is a feeding process to feed chlorine fluoride generated by loading a gas that contains fluorine atoms and a gas that contains chlorine atoms to a flow-type heat reactor or a plasma reactor, and it can stably generate and safely feed chlorine fluoride for a long time by reacting chlorine fluoride that is difficult to pack at a high pressure, such that an amount that can be packed in a gas container such as a gas cylinder is limited, with two or more types of gas materials that can be packed safely in a gas container by liquefaction, or with such gas material and a solid material.Type: GrantFiled: March 29, 2017Date of Patent: January 26, 2021Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Yoshinao Takahashi, Korehito Kato, Yoshimasa Sakurai, Hiroki Takizawa, Sho Kikuchi, Shinichi Kawaguchi, Yoshihiko Iketani, Yukinobu Shibusawa
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Publication number: 20200377434Abstract: An object of the present invention is to provide a simple, low-cost, and industrial method of producing a compound having a polyene skeleton containing hydrogen and fluorine and/or chlorine. A method of producing a. halogenated diene represented by formula (1): A1A2C=CA3-CA4=CA5A6 [A1, A2, A5, and A6 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A3 and A4 are each independently hydrogen, fluorine, or chlorine; at least one of A1 to A6 is hydrogen; at least one of A1 to A6 is fluorine or chlorine] comprises a step of subjecting the same or different halogenated olefin(s) represented by for (2): A7A8C=CA9X [A7 and A8 are each independently hydrogen, fluorine, chlorine, a (perfluoro)alkyl group having 1 to 3 carbon atoms, or a (perfluoro)alkenyl group; A9 is each independently hydrogen, fluorine, or chlorine; X is bromine or iodine] to a coupling reaction in the presence of a zero-valent metal.Type: ApplicationFiled: April 26, 2018Publication date: December 3, 2020Inventors: Hideki AMII, Mitsuharu SHIMODA, Yoshihiko IKETANI, Ryo KIMURA
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Publication number: 20200234962Abstract: A dry etching gas composition is used which contains a saturated or unsaturated hydrofluorocarbon compound (excluding 1,2,2,3-pentafluorocyclobutane and 1,1,2,2-tetrafluorocyclobutane) represented by a general formula (1): CxHyFz (where x, y, and z are integers that satisfy 2?x?4, y+z?2x+2, and 0.5<z/y<2). Use of the etching gas composition containing the above-described hydrofluorocarbon makes it possible to selectively etch a nitrogen-containing silicon-based film (b1) with respect to a silicon oxide film, a non-silicon-based mask material, or a polycrystalline silicon film.Type: ApplicationFiled: April 2, 2018Publication date: July 23, 2020Inventors: Korehito KATO, Yoshihiko IKETANI, Yukinobu SHIBUSAWA, Hisashi SHIMIZU
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Patent number: 10629449Abstract: A silicon oxide film or a silicon nitride film is selectively etched by using an etching gas composition including a hydrofluorocarbon that has an unsaturated bond in its molecule and is represented by CxHyFz, wherein x is an integer of from 3 to 5, and relationships y+z?2x and y?z are satisfied. Also, a silicon oxide film is etched with high selectivity relative to a silicon nitride film by controlling the ratio among the hydrofluorocarbon, oxygen, argon, etc., included in the hydrofluorocarbon-containing etching gas composition.Type: GrantFiled: October 13, 2016Date of Patent: April 21, 2020Assignee: Kanto Denka Kogyo Co., Ltd.Inventors: Yoshinao Takahashi, Korehito Kato, Tetsuya Fukasawa, Yoshihiko Iketani
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Patent number: 10431472Abstract: A silicon oxide film or a silicon nitride film is selectively etched by using an etching gas composition including a hydrofluorocarbon that has an unsaturated bond in its molecule and is represented by CxHyFz, wherein x is an integer of from 3 to 5, and relationships y+z?2x and y?z are satisfied. Also, a silicon oxide film is etched with high selectivity relative to a silicon nitride film by controlling the ratio among the hydrofluorocarbon, oxygen, argon, etc., included in the hydrofluorocarbon-containing etching gas composition.Type: GrantFiled: October 22, 2018Date of Patent: October 1, 2019Assignee: KANTO DENKA KOGYO CO., LTD.Inventors: Yoshinao Takahashi, Korehito Kato, Tetsuya Fukasawa, Yoshihiko Iketani
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Publication number: 20190057878Abstract: A silicon oxide film or a silicon nitride film is selectively etched by using an etching gas composition including a hydrofluorocarbon that has an unsaturated bond in its molecule and is represented by CxHyFz, wherein x is an integer of from 3 to 5, and relationships y+z?2x and y?z are satisfied. Also, a silicon oxide film is etched with high selectivity relative to a silicon nitride film by controlling the ratio among the hydrofluorocarbon, oxygen, argon, etc., included in the hydrofluorocarbon-containing etching gas composition.Type: ApplicationFiled: October 22, 2018Publication date: February 21, 2019Inventors: Yoshinao TAKAHASHI, Korehito KATO, Tetsuya FUKASAWA, Yoshihiko IKETANI
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Publication number: 20180108537Abstract: A silicon oxide film or a silicon nitride film is selectively etched by using an etching gas composition including a hydrofluorocarbon that has an unsaturated bond in its molecule and is represented by CxHyFz, wherein x is an integer of from 3 to 5, and relationships y+z?2x and y?z are satisfied. Also, a silicon oxide film is etched with high selectivity relative to a silicon nitride film by controlling the ratio among the hydrofluorocarbon, oxygen, argon, etc., included in the hydrofluorocarbon-containing etching gas composition.Type: ApplicationFiled: October 13, 2016Publication date: April 19, 2018Inventors: Yoshinao TAKAHASHI, Korehito KATO, Tetsuya FUKASAWA, Yoshihiko IKETANI