Abstract: A three-dimensional modeling device models a three-dimensional object by irradiating a powdered material with an electron beam to melt and stack the powdered material. The three-dimensional modeling device includes a beam emitting unit that irradiates the powdered material with the electron beam by emitting the electron beam. The beam emitting unit irradiates the powdered material with the electron beam while scanning the electron beam in a direction orthogonal to a contour line of a modeling region in at least a contour portion of the modeling region that is a cross-section of the object.

Abstract: A kneading device for dispersing a dispersoid in a dispersion medium includes a casing in which a kneading material containing the dispersion medium and the dispersoid is accommodated, a rotor disposed in the casing and kneading the kneading material while dispersing the dispersoid in the dispersion medium by rotating about a rotation axis, and a detection unit detecting a dispersion degree of the dispersoid in the dispersion medium by observing a state of the kneading material in the casing.

Abstract: Provided is a kneading device 1 for dispersing a dispersoid in a dispersion medium. The kneading device includes a casing in which a kneading material containing the dispersion medium and the dispersoid is accommodated, a rotor disposed in the casing and kneading the kneading material while dispersing the dispersoid in the dispersion medium by rotating about a rotation axis, and a detection unit detecting a dispersion degree of the dispersoid into the dispersion medium by observing a state of the kneading material in the casing.

Abstract: A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of rectangle) so that the angle alpha (?) included between the side wall of the agglutinant layer and said annular face is 90 degrees or smaller.

Abstract: There is provided a method for air-tightly enclosing a pellicle case in a filmy bag which protects the pellicle case against dust without the use of a plurality of bags or without modifying the filmy bag except for folding it like origami and eventually consolidating with an adhesive material: in short the opening of the bag is folded a number of times compactly.

Abstract: A pellicle is proposed wherein the mask-bonding agglutinant layer coated on one annular face of the pellicle frame is designed to have a cross-section which is trapezoidal (including the case of rectangle) so that the angle alpha (?) included between the side wall of the agglutinant layer and said annular face is 90 degrees or smaller.

Abstract: There is provided a method for packing a pellicle container in plastic resin bags, which is meant to prevent foreign particles from reaching the pellicle container and eventually the product pellicle; the points of the invention lie in that bags are either antistatic or of special cleanroom-use grade prepared and preserved in a cleanroom environment.

Abstract: There is provided a pellicle in which the frame is chamfered along all of its horizontal edges (as viewed when the pellicle frame is laid flat), and in particular those edges of the frame where the membrane-bonding frame face meets the external side walls of the frame are chamfered to the extent of C:0.01 mm-C:0.12 mm; in relation to this chamfer, a method is also provided wherein, after attaching a preformed pellicle membrane to the membrane-bonding frame face, the excessive part of the preformed membrane which extends beyond outer edges of the frame face is cut off in a manner wherein a blade of a knife is caused to scour the chamfer over the membrane in a manner such that the knife blade is kept in such an angle that the blade gets in a face-to-face contact with the chamfer face or that the blade touches only that edge of the frame where the chamfer face meets the first frame face while the knife blade is moved along the chamfered edge of the frame.

Abstract: There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which the air vents in the frame are counterbored and a counterbored wall surface of the air vents is tapered.

Abstract: There is provided a method for air-tightly enclosing a pellicle case in a filmy bag which protects the pellicle case against dust without the use of a plurality of bags or without modifying the filmy bag except for folding it like origami and eventually consolidating with an adhesive material: in short the opening of the bag is folded a number of times compactly.

Abstract: There is provided a pellicle in which the frame is chamfered along all of its horizontal edges (as viewed when the pellicle frame is laid flat), and in particular those edges of the frame where the membrane-bonding frame face meets the external side walls of the frame are chamfered to the extent of C:0.01 mm-C:0.12 mm; in relation to this chamfer, a method is also provided wherein, after attaching a preformed pellicle membrane to the membrane-bonding frame face, the excessive part of the preformed membrane which extends beyond outer edges of the frame face is cut off in a manner wherein a blade of a knife is caused to scour the chamfer over the membrane in a manner such that the knife blade is kept in such an angle that the blade gets in a face-to-face contact with the chamfer face or that the blade touches only that edge of the frame where the chamfer face meets the first frame face while the knife blade is moved along the chamfered edge of the frame.

Abstract: There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.

Abstract: There is provided a pellicle for photolithography having a plurality of air vents formed in a pellicle frame for photolithography and having the air vents covered with a dustproof filter in which the air vents in the frame are counterbored and a counterbored wall surface of the air vents is tapered.

Abstract: There is disclosed a pellicle for lithography comprising a pellicle film, a pellicle frame to which the pellicle film is adhered, and a sticking layer placed on another end face of the pellicle frame, wherein the pellicle film consists of multi-layer structure of fluorine-doped silica and fluorocarbon resin. Thereby, there is provided a pellicle for lithography which has high transmittance and high light stability against light of short wavelength such as far-ultraviolet light in a range of 200-300 nm and especially vacuum ultraviolet light of 200 nm or less, and is sufficiently practicable.

Abstract: There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.

Abstract: In a tie bar strain measuring device, even if an elongation is generated in a belt for attachment, a strain gauge can be pressed against a tie bar continuously with a sufficient pressing force by absorbing the elongation. The strain gauge is fixed to a strain gauge fixing member, and a belt-like member is wound around an outer circumference of the tie bar so as to retain the strain gauge fixing member while pressing against an outer circumferential surface of the tie bar. The belt-like member is clamped by a clamping device. A clamping force is generated by a resilient restoration force of a conical plate spring provided in the clamping device.

Abstract: An object is to provide a mold-supporting apparatus whose mold-mounting surface does not deform, irrespective of whether a mold is large or small, so that a uniform surface pressure is produced, and which can be readily produced by means of casting. The mold-supporting apparatus includes a mold-mounting portion having a mold-mounting surface to which a mold is mounted; and a rear surface portion having reaction-force-receiving portions at corners thereof, the reaction-force-receiving portions receiving reaction force from a reaction force applying member, wherein a central region of the mold-mounting portion and a central region of the rear surface portion are connected together by means of a central connection member, and an outer peripheral portion of the mold-mounting portion and an outer peripheral portion of the rear surface portion are connected together by means of an outer peripheral portion connection member.

Abstract: The present invention realizes a balance training device usable for training a capability of balancing with a user carried thereon in a standing posture or a sitting posture without the need for any complicated linkage mechanism, said device comprising: a plate (1) for carrying a user; a motor (2) for driving said plate; a sensor (3) for measuring a rotation angle of said plate; a torque measuring mechanism (including a pair of force plates 41) for measuring a torque applied to said plate; a kinetic model analyzer (5) for determining a target rotation angle for said plate (1) from said measured torque; and a motor controller (6) for controlling said motor in accordance with a predetermined kinetic model.

Abstract: There is disclosed a pellicle 1 for photolithography comprising, a pellicle frame 2 for constituting a pellicle for photolithography, wherein the frame is made of an aluminum alloy whose surface is anodized, and each content of sulfate ion, nitrate ion, chlorine ion, and organic acid (total of oxalic acid, formic acid, and acetic acid) is 1.1 ppm or less in elution concentration after immersed in 100 ml of pure water at 25° C. for 168 hours, per 100 cm2 of a surface area of the frame, and a pellicle film 3 that is adhered to one end face of the frame. Thereby, there can be provided a pellicle that can effectively prevent haze from being generated on a mask substrate even in a photolithography process with a wavelength being shorter.

Abstract: There is provided a pellicle for lithography which has at least, a pellicle film for dustproof protection, a pellicle frame to which the pellicle film is adhered, an adhesive layer provided on one end face of the pellicle frame in order to adhere the pellicle film, and a sticking layer formed on another end face of the pellicle frame, wherein the pellicle film is formed by a die coating machine and a method for producing it. There can be provided a relatively large-sized pellicle for lithography which has a pellicle film with little unevenness of film thickness and with a uniform and high light transmission can be produced easily and at low cost, compared with those using the conventional spin coater.