Patents by Inventor Yoshihiro Fujitani

Yoshihiro Fujitani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate cleaning method and substrate cleaning apparatus
    Patent number: 7255749
    Abstract: In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the cleaning liquid is replenished by at least one liquid selected from the group consisting of water, ammonia, aqueous ammonia, and an aqueous solution of ammonium fluoride with the lapse of time during the use of the cleaning liquid, in which the required amount of the liquid to be added according to the time lapse is calculated based on the measurement date and controlled, or the component concentration of the cleaning liquid is detected and the liquid is added according to the obtained result, so that not only can the substrate be cleaned uniformly and stably, but also a resource saving and a reduction in waste can be achieved.
    Type: Grant
    Filed: September 9, 2004
    Date of Patent: August 14, 2007
    Assignee: Sony Corporation
    Inventors: Yasuhito Inagaki, Mineo Shimizu, Yoshihiro Fujitani
  • Substrate cleaning method and substrate cleaning apparatus
    Publication number: 20050022845
    Abstract: In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the cleaning liquid is replenished by at least one liquid selected from the group consisting of water, ammonia, aqueous ammonia, and an aqueous solution of ammonium fluoride with the lapse of time during the use of the cleaning liquid, in which the required amount of the liquid to be added according to the time lapse is calculated based on the measurement date and controlled, or the component concentration of the cleaning liquid is detected and the liquid is added according to the obtained result, so that not only can the substrate be cleaned uniformly and stably, but also a resource saving and a reduction in waste can be achieved.
    Type: Application
    Filed: September 9, 2004
    Publication date: February 3, 2005
    Inventors: Yasuhito Inagaki, Mineo Shimizu, Yoshihiro Fujitani
  • Substrate cleaning method and substrate cleaning apparatus
    Publication number: 20020046757
    Abstract: In a cleaning treatment of a substrate using an aqueous solution of ammonium fluoride or a mixture of an aqueous solution of ammonium fluoride and hydrofluoric acid as a cleaning liquid, the cleaning liquid is replenished by at least one liquid selected from the group consisting of water, ammonia, aqueous ammonia, and an aqueous solution of ammonium fluoride with the lapse of time during the use of the cleaning liquid, in which the required amount of the liquid to be added according to the time lapse is calculated based on the measurement date and controlled, or the component concentration of the cleaning liquid is detected and the liquid is added according to the obtained result, so that not only can the substrate be cleaned uniformly and stably, but also a resource saving and a reduction in waste can be achieved.
    Type: Application
    Filed: July 13, 2001
    Publication date: April 25, 2002
    Inventors: Yasuhito Inagaki, Mineo Shimizu, Yoshihiro Fujitani