Patents by Inventor Yoshihiro Kamon

Yoshihiro Kamon has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200277447
    Abstract: Provided is a resin composition for producing a coating composition excellent in appearance, abrasion resistance, and hardness of a coating film. The resin composition of the present invention includes a compound A having a branched structure which has a terminal hydroxyl group, a polyisocyanate B, and an inorganic particle C, in which the inorganic particle C has a functional group enabling reacting with a hydroxyl group or an isocyanate group on a surface thereof.
    Type: Application
    Filed: May 20, 2020
    Publication date: September 3, 2020
    Applicant: Chiyoda-ku
    Inventors: Riina KANBARA, Takafumi ASAI, Masashi SERIZAWA, Takahiro MUKUDA, Yoshihiro KAMON
  • Publication number: 20190352514
    Abstract: Disclosed herein is an antifouling coating composition containing a resin composition and an antifouling agent, where the resin composition includes a polymer (A) containing at least one monomer-derived structural unit having the structure represented by formula (1), (2) or (3) below, and after the resin composition is stored at 40° C. for 30 days, the decomposition rate of the structure represented by formula (1), (2) or (3) in the polymer (A) is 20% or lower.
    Type: Application
    Filed: August 1, 2019
    Publication date: November 21, 2019
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Sho Katsumata, Kana Taniguchi, Junichi Nakamura, Masatoshi Ura, Yoshihiro Kamon, Takafumi Asai, Ryuichi Ansai
  • Patent number: 10421705
    Abstract: Provided is a production method whereby corresponding carboxylic acid esters can be obtained from a variety of carboxylic acids at a high yield, even under conditions using a simple reaction operation and little catalyst and even if the amount of substrate used is theoretical. A production method for carboxylic acid ester, whereby a prescribed diester dicarbonate, carboxylic acid, and alcohol are reacted in the presence of at least one type of magnesium compound and at least one type of alkali metal compound.
    Type: Grant
    Filed: December 11, 2015
    Date of Patent: September 24, 2019
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Akihiro Goto, Yoshihiro Kamon, Hiroyuki Mori
  • Publication number: 20180354885
    Abstract: Provided is a production method whereby corresponding carboxylic acid esters can be obtained from a variety of carboxylic acids at a high yield, even under conditions using a simple reaction operation and little catalyst and even if the amount of substrate used is theoretical. A production method for carboxylic acid ester, whereby a prescribed diester dicarbonate, carboxylic acid, and alcohol are reacted in the presence of at least one type of magnesium compound and at least one type of alkali metal compound.
    Type: Application
    Filed: December 11, 2015
    Publication date: December 13, 2018
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Akihiro GOTO, Yoshihiro KAMON, Hiroyuki MORI
  • Patent number: 10125081
    Abstract: Provided is a production method whereby corresponding carboxylic acid anhydrides and carboxylic acid esters can be obtained at high yield from various carboxylic acids even without a solvent and near room temperature. A method for producing a carboxylic acid anhydride represented by formula (II), the method comprising reacting a compound represented by formula (I) and a carboxylic acid in the presence of a Group II metal compound having an ionic ligand containing an oxygen atom. A method for producing a carboxylic acid ester, the method comprising reacting a carboxylic acid anhydride produced by the aforementioned method and an alcohol. In formula (I), R1 represents a C1-20 hydrocarbon group. In formula (II), R2 represents a C1-20 hydrocarbon group.
    Type: Grant
    Filed: June 4, 2015
    Date of Patent: November 13, 2018
    Assignee: Mitsubishi Chemical Corporation
    Inventors: Akihiro Goto, Yoshihiro Kamon
  • Publication number: 20180201797
    Abstract: First embodiment of a (meth)acrylic copolymer in the present invention includes following: a (meth)acrylic copolymer having at least one kind of constitutional unit selected from the group consisting of a constitutional unit (A1) having at least one kind of structure (I) selected from the group consisting of structures represented by the following formula (1), formula (2), or formula (3) and a constitutional unit (A2) having a triorganosilyloxycarbonyl group and a constitutional unit (B) derived from a macromonomer (b): (where, X represents —O—, —S—, or —NR14—, R14 represents a hydrogen atom or an alkyl group, R1 and R2 each represent a hydrogen atom or an alkyl group having from 1 to 10 carbon atoms, R3 and R5 each represent an alkyl group having from 1 to 20 carbon atoms, a cycloalkyl group, or an aryl group, and R4 and R6 each represent an alkylene group having from 1 to 10 carbon atoms).
    Type: Application
    Filed: March 15, 2018
    Publication date: July 19, 2018
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Kana TANIGUCHI, Sho KATSUMATA, Junichi NAKAMURA, Masatoshi URA, Yoshihiro KAMON, Takafumi ASAI
  • Publication number: 20180067412
    Abstract: Provided is a polyester resin having excellent low-temperature fluidity and storage stability that achieves both dispersibility and grindability. A polyester resin including a sulfonate component and a hetero alicyclic skeleton component as constituent units.
    Type: Application
    Filed: May 13, 2016
    Publication date: March 8, 2018
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Tadahiro OZAWA, Asako KANEKO, Masaaki KIURA, Yoshihiro KAMON
  • Publication number: 20180051179
    Abstract: A resin composition, formed to have a polymer (A) containing at least one monomer-derived structural unit having the structure represented by formula (1), (2) or (3) below, and after the resin composition is stored at 40° C. for 30 days, the decomposition rate of the structure represented by formula (1), (2) or (3) in the polymer (A) is 20% or lower.
    Type: Application
    Filed: April 15, 2016
    Publication date: February 22, 2018
    Applicant: Mitsubishi Chemical Corporation
    Inventors: Sho KATSUMATA, Kana TANIGUCHI, Junichi NAKAMURA, Masatoshi URA, Yoshihiro KAMON, Takafumi ASAI, Ryuichi ANSAI
  • Publication number: 20170088502
    Abstract: Provided is a production method whereby corresponding carboxylic acid anhydrides and carboxylic acid esters can be obtained at high yield from various carboxylic acids even without a solvent and near room temperature. A method for producing a carboxylic acid anhydride represented by formula (II), the method comprising reacting a compound represented by formula (I) and a carboxylic acid in the presence of a Group II metal compound having an ionic ligand containing an oxygen atom. A method for producing a carboxylic acid ester, the method comprising reacting a carboxylic acid anhydride produced by the aforementioned method and an alcohol. In formula (I), R1 represents a C1-20 hydrocarbon group. In formula (II), R2 represents a C1-20 hydrocarbon group.
    Type: Application
    Filed: June 4, 2015
    Publication date: March 30, 2017
    Applicant: MITSUBISHI RAYON CO., LTD.
    Inventors: Akihiro GOTO, Yoshihiro KAMON
  • Patent number: 7339014
    Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
    Type: Grant
    Filed: October 28, 2004
    Date of Patent: March 4, 2008
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
  • Patent number: 7316884
    Abstract: A 5-methylene-1,3-dioxolan-4-one derivative and a monomer and copolymer thereof and a resist composition containing the polymer or copolymer where the 5-methylene-1,3 -dioxolan-4-one derivative is of formula (1): wherein R1 represents a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms, or a linear or branched alkyl group containing 1 to 6 carbon atoms which has a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms as a substituent; R2 represents a hydrogen atom, or a linear or branched alkyl group containing 1 to 6 carbon atoms; or R1 and R2 represent a bridged cyclic hydrocarbon group containing 4 to 16 carbon atoms together with the carbon atom to which they are bound, provided that the alkyl group and the bridged cyclic hydrocarbon group may have at least one substituent selected from a group consisting of a linear or branched alkyl group containing 1 to 6 carbon atoms which may be optionally substituted, a hydroxy group, a carboxy group, an acyl group containing 2 to 6 car
    Type: Grant
    Filed: October 22, 2002
    Date of Patent: January 8, 2008
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Ryuichi Ansai, Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake, Hikaru Momose
  • Patent number: 7041838
    Abstract: A (meth)acrylate represented by the following formula (1): wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—, which can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol; a polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
    Type: Grant
    Filed: December 5, 2001
    Date of Patent: May 9, 2006
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
  • Patent number: 6927011
    Abstract: A resist resin containing a monomer unit selected from the group comprising a monomer unit represented by Formula (II): wherein a substituent R3 represents an alkyl group, or a functional group comprising an acid-deprotectable protecting group, m representing the number of R3 is 0 (non-substitution), 1, 2 or more, R3 may be different from each other, provided that m is 2 or more, and n represents an integer of 0 to 4, has no rough spots on the surface after etching and so has good dry etching resistance, and therefore the resist resin is preferably used as a photo resist for DUV.
    Type: Grant
    Filed: February 9, 2001
    Date of Patent: August 9, 2005
    Assignee: Mitsubishi Rayon Co., Ltd.
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose
  • Publication number: 20050113538
    Abstract: The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition. wherein each of R1, R2, R3 and R4 represents a hydrogen atom, a methyl group or an ethyl group; either one of X1 or X2 represents a (meth)acryloyloxy group and the other represents a hydrogen atom; both A1 and A2 represent hydrogen atoms, or A1 and A2 form —O—, —CH2— or —CH2CH2—.
    Type: Application
    Filed: October 28, 2004
    Publication date: May 26, 2005
    Applicant: Mitsubishi Rayon co.,Ltd.
    Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
  • Publication number: 20040248031
    Abstract: The 5-methylene-1,3-dioxolan-4-one derivative of the present invention is represented by the formula (1) indicated below, and it is a novel monomer from which a homopolymer and a copolymer excellent in light transparency and heat stability are obtained. Moreover, the polymer obtained by (co)polymerizing a monomer composition comprising the derivative represented by the formula (1) indicated below is excellent in the resist performance such as sensitivity, resolution and dry etching resistance, and solubility in an organic solvent, also having little line edge roughness, and thus it is preferably used as a resin for a resist composition.
    Type: Application
    Filed: April 22, 2004
    Publication date: December 9, 2004
    Inventors: Ryuichi Ansai, Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Atsushi Ootake, Hikayu Momose
  • Publication number: 20040063882
    Abstract: The (meth)acrylate of the present invention is represented by the following formula (1). The (meth)acrylate can be produced by first producing a lactone by reducing an addition product obtained by the Diels-Alder reaction between 1,3-diene and maleic anhydride, and then hydrating the lactone to produce an alcohol followed by (meth)acrylation of the alcohol. A polymer produced by (co)polymerizing a monomer composition comprising the (meth)acrylate of the present invention is excellent in transparency, dry etching resistance, and solubility in organic solvents, and so it is preferably used as a resin for a chemically amplified resist composition.
    Type: Application
    Filed: June 5, 2003
    Publication date: April 1, 2004
    Inventors: Yoshihiro Kamon, Tadayuki Fujiwara, Hideaki Kuwano, Hikaru Momose, Atsushi Koizumi
  • Publication number: 20030148214
    Abstract: A resist resin containing a monomer unit selected from the group consisting of the following Formulas (I) and (II): 1
    Type: Application
    Filed: January 13, 2003
    Publication date: August 7, 2003
    Inventors: Tadayuki Fujiwara, Yukiya Wakisaka, Toru Tokimitsu, Naoshi Murata, Yoshihiro Kamon, Hikaru Momose