Abstract: Disclosed is an X-ray exposure apparatus having a low attenuation chamber supplied with a gas absorbing little X-rays, the low attenuation chamber being interposed between an X-ray source and a mask so that X-rays transmitted through the low attenuation chamber are irradiated on the mask so as to transfer a mask pattern onto a resist on a wafer, the apparatus comprising detecting means for detecting the gas or components mixed in the gas in the low attenuation chamber, control means for controlling a quantity of supply of the gas into the low attenuation chamber in accordance with an output signal of the detecting means, and/or adjusting means for adjusting a quantity of exposure of said X-rays irradiated on the mask in accordance with an output signal of the detecting means.

Abstract: A method and apparatus for alignment for use in X-ray exposure or the like wherein a mask is provided having a formation of an alignment pattern made up of at least one linear segment formed in a peripheral section of the mask and a wafer is provided having a formation of an alignment pattern formed in a same direction as the alignment pattern of the mask and made up of linear segments. An illuminating arrangement illuminates a light to the mask alignment pattern along a direction inclined to the alignment direction and the mask alignment pattern and the wafer alignment pattern are imaged and transformed into a video signal. An A/D converts the video signal into a digital signal and stores the digital signal in a memory.

Abstract: The present invention relates, in a projection aligner wherein a mask and a wafer are held proximate to one another and wherein a circuit pattern depicted on the mask is transferred onto the wafer, to a method of detecting the respective positions of the mask and the wafer for the relative positioning between the mask and the wafer.

Abstract: In an aligner system wherein a mask and a wafer are arranged so as to oppose each other with a predetermined gap therebetween, an alignment apparatus is provided including an objective for focusing an alignment marks formed on the mask and on the wafer, a photodetector for imaging both alignment marks, an optical length-varying optical system, a displacement detector, a magnification compensation arrangement, and a relative displacement magnitude detector. The optical length-varying optical system includes at least one prism arrangement for changing an optical length of the optical system to bring each of the alignment marks into focus.

Abstract: The present invention consists in an X-ray lithographic apparatus having an X-ray generator which generates X-rays, and a gastight chamber which is gastightly coupled to the X-ray generator and which holds a mask to be exposed to the X-rays, on its surface remote from the X-ray generator, characterized in that the gastight chamber is provided with a window on which a soft member softer than the mask is mounted.

Abstract: A precision parallel translation system including a pair of tables or upper and lower tables movable parallel to and in directions perpendicular to each other, and a pair of drive means for rough movement each detachably connected to one of the tables to drive the respective table for movement a relatively long distance. Each table supports drive means for fine movement detachably connected to a base (which is the lower table in the case of the upper table) supporting the respective table. The table is moved a relatively long distance by the drive means for rough movement when rough movement is effected, to effect rough positioning of the table. Then the drive means for fine movement is secured to the base while detaching the drive means for rough movement from the table, to drive the table for fine movement to effect precision positioning of the table.