Abstract: According to one embodiment, a pattern forming method includes: forming a first mask layer on a sample; forming a second mask layer on the first mask layer, the second mask layer containing a first inorganic material and a first organic material; forming a pattern in the second mask layer; oxidizing the first inorganic material and removing at least a portion of the first organic material from the second mask layer by exposing the second mask layer to a first oxidizing gas containing ozone; and transferring the pattern to the first mask layer by etching the first mask layer with the second mask layer.

Abstract: According to one embodiment, a pattern forming method includes: forming a first mask layer on a sample; forming a second mask layer on the first mask layer, the second mask layer containing a first inorganic material and a first organic material; forming a pattern in the second mask layer; oxidizing the first inorganic material and removing at least a portion of the first organic material from the second mask layer by exposing the second mask layer to a first oxidizing gas containing ozone; and transferring the pattern to the first mask layer by etching the first mask layer with the second mask layer.

Abstract: A pattern forming method according to the present embodiment forms a self-assembly material layer including a liquid-crystal material in at least one block thereof on a surface of a base material. An external field in a first region of the self-assembly material layer is applied locally, the first region of the self-assembly material layer is rubbed locally, or a film thickness of the first region of the self-assembly material layer is changed locally. The self-assembly material layer is phase-separated.

Abstract: According to one embodiment, a pattern data generation method includes: decomposing data of a pattern to be formed into first guide pattern data and first DSA pattern data; generating a plurality of combinations of second guide pattern data and second DSA pattern data based on combinations of the first guide pattern data and the first DSA pattern data; carrying out simulation for each of the plurality of combinations of the second guide pattern data and the second DSA pattern data, and evaluating the simulation results using a predetermined evaluation function; and extracting one set or a plurality of sets of combinations that are suitable for forming the pattern to be formed, from among the plurality of combinations of the second guide pattern data and the second DSA pattern data, based on the evaluation results.

Abstract: A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developing the photoresist film. The lower layer film contains at least any one of a free acid, a thermoacid-generating agent, and a photoacid-generating agent, on a substrate to be treated.

Abstract: According to one embodiment, a method of forming an organic thin film includes coating organic solution onto a substrate and heating the coated organic solution after the coating. The organic solution contains a first component and a second component. The second component has higher hydrophobicity than hydrophobicity of the first component. The coating includes making the organic solution to be dropped onto the substrate, equalizing a thickness of the dropped organic solution in an atmosphere containing a vapor at a first vapor pressure, and equalizing the thickness of the dropped organic solution in an atmosphere containing the vapor at a second vapor pressure after the equalization in the atmosphere containing the vapor at the first vapor pressure. The vapor is formed by a vaporization of a liquid. The second vapor pressure is higher than the first vapor pressure.

Abstract: A method for forming a resist pattern, includes forming a lower layer film, forming an intermediate film on the lower layer film, forming a photoresist film containing a photoacid-generating agent on the intermediate film, exposing the photoresist film, and developing the photoresist film. The lower layer film contains at least any one of a free acid, a thermoacid-generating agent, and a photoacid-generating agent, on a substrate to be treated.

Abstract: An overhead traveling crane system has cylindrical guide members (16d, 18d) and guide bars (15a, 16a) installed on a moving device (18) and a lifting device (15), respectively. The guide bars (15a, 16a) are inserted nestably into the cylindrical guide members (16d, 18d) so [as to move] that the lifting device (15) can be raised and lowered by wires only substantially vertically relative to the moving device (18) when wires (15b, 16b) are wound up and down. The lower end parts of the cylindrical guide members (16d, 18d) are expanded in a flared shape so that the upper end parts of the guide bars (15a, 16a) can be moved minutely horizontally in the period between the start of engagement and the completion of engagement. Similarly, a flared position guide means may be provided on a lower part of the lifting device for engagement with positioning means located on the target on the ground.

Abstract: A backup control system comprises a control package, a file package including a battery monitor and a flip-flop circuit, and a back board having a return wire which provides connection/disconnection of the monitor terminal of the monitor. The monitor checks a voltage of the monitor terminal at all times and outputs a reset signal to the flip-flop circuit when the voltage of the monitor terminal becomes lower than a reference voltage. The return wire connects the monitor terminal to the power line when the file package is connected to the connection board, and disconnects the monitor terminal from the power line when the file package is removed from the connection board. The flip-flop circuit stores one of a set state and a reset state, and changes in state from the set state to the reset state when the reset signal is received from the monitor.

Abstract: In a secondary station which is used in a data communication network between a pair of primary stations and which comprises a receiver for detecting a flag in each of signal combinations transmitted from either of the primary stations at a predetermined time interval and a transmitter for transmitting towards a particular one of the primary station, upon detection of the flag, a first combined signal comprising the flag and a data signal which should be transmitted towards the particular primary station, a controller is used in controlling the transmitter to make the transmitter transmit towards a different one of the primary stations, when the receiver does not detect the flag transmitted from the particular primary station upon lapse of the predetermined time interval from next previous detection of the flag transmitted from the particular primary station but detects the flag transmitted from the different primary station, a second combined signal comprising the data signal and the flag which is transmitted

Abstract: A repeater includes a receiver, a synchronizing signal generator, a step out detector, a first selector for selecting either a receiver output or a synchronizing signal generator output in accordance with a first control signal, a second selector for selecting one of the receiver output or the synchronizing signal generator output and supplying it to the step out detector, and a controller for outputting first and second control signals for controlling the first selector to select the synchronizing signal generator output when step out is detected in the receiver output and controlling the first and second selectors to select the receiver output when step out is detected in the synchronizing signal generator.