Abstract: A method for producing a thin film transistor and a thin film transistor that can suppress deterioration and variation in performance are provided. A method for producing a thin film transistor includes: forming an organic semiconductor layer on a first main surface of a substrate; forming a first conductive layer on the organic semiconductor layer, while forming a second conductive layer on a second main surface of the substrate; forming mask layers collectively on the first conductive layer and the second conductive layer; and bringing the first conductive layer and the second conductive layer collectively into contact with etching liquid so that partial regions of the first conductive layer and the second conductive layer are removed, so as to form a source electrode and a drain electrode on the organic semiconductor layer, while to form a gate electrode on the second main surface of the substrate.

Abstract: The present invention addresses the problem of providing: a polyimide film that has a small phase difference in the thickness direction and has a low coefficient of linear thermal expansion; and a polyamic acid and varnish to obtain the same. In order to solve this problem, the present invention provides a polyimide film which comprises polyimide that is produced by reacting a diamine component and a tetracarboxylic dianhydride component, the polyimide film having a coefficient of linear thermal expansion of 35 ppm/K or less over a temperature range of 100 to 200 DEG C, an absolute value of phase difference in the thickness direction of 200 nm or less per 10 ?m thickness, a glass transition temperature of 260 DEG C or more, and a total light transmittance of 85% or more.

Abstract: The present invention addresses the problem of providing a high-transparency polyimide film in which the thickness-direction phase difference Rth is kept within a predetermined range. The present invention also addresses the problem of providing a polyamic acid and a varnish used to obtain the polyimide film. In order to overcome the aforementioned problem, the present invention is a polyimide film containing a polyimide obtained by bringing about a reaction between a tetracarboxylic dianhydride and a diamine, the polyimide film having (a) a thickness-direction phase difference Rth of ?5 to 100 nm per 10 ?m of thickness, (b) a transmittance of 80% or more with respect to light having a wavelength of 400 nm, (c) a haze of 3% or less, and (d) a glass transition point of 250° C. or higher.

Abstract: Provided is a polyimide excellent in heat resistance and colorless transparency and also excellent in flexibility and ultraviolet ray transmittance. The polyimide includes a structural unit represented by Formula (1a) and a structural unit represented by Formula (1b) wherein R is a specific aromatic group.

Abstract: A fuel system component used to supply a fuel to a fuel tank or used to discharge the fuel from the fuel tank comprises a first resin layer; and a second resin layer formed in a similar color to that of the first resin layer and configured to include a welding portion that is welded to the first resin layer and an exposed portion that is not adjacent to or in contact with the first resin layer. A belt-like portion is formed on a first resin layer-side surface of the exposed portion to be parallel to a boundary between the welding portion and the exposed portion and is configured to include at least one of a concave and a convex extended intermittently or continuously.

Abstract: [Object] To provide a method for producing an electrical wiring member having a layered structure of copper wiring and a blackening layer and to provide the electrical wiring member through a search for a material for the blackening layer, the material being etched at a rate close to that for the copper wiring under conditions where etching controllability is ensured. [Solution] A method for producing an electrical wiring member according to the present invention includes a step of forming, on at least one main surface of a substrate, a layered film 6 of a Cu layer 3 and CuNO-based blackening layers (2a and 2b); a step of forming a resist layer 4a in a predetermined region on the layered film 6; and a step of removing a partial region of the layered film 6 by bringing the layered film 6 into contact with an etchant.

Abstract: The purpose of the present invention is to provide a polyimide resin which exhibits higher heat resistance than that of a conventional polyimide resin by controlling the geometric configuration of the constituent units. Provided is a polyamic acid which comprises repeating units represented by general formula (1), wherein the 1,4-bismethylenecyclohexane skeleton units consist of both trans- and cis-form units, and the contents of the trans- and cis-form units are 60 to 100% and 0 to 40% respectively (with the sum total of the trans- and cis-form units being 100%).

Abstract: Provided are a block polyamide acid imide having an appropriate solubility in aqueous alkaline solutions, and block polyimides that are obtained using same and have high transparency and a low coefficient of linear thermal expansion (low CTE). The block polyimide comprises blocks configured from repeating structural units represented by defined formula (1A) and blocks configured from repeating structural units represented by defined formula (1B).

Abstract: A negative electrode for a lithium-ion secondary cell, the negative electrode including a layered body of a collector and a negative electrode active material layer containing an alloy-based material (A) containing silicon or tin as a constituent element, a carbon coating (C) that covers the surface of the alloy-based material (A), carbon particles (B), and a binder (D), wherein the negative electrode for a lithium-ion secondary cell is characterized in that the total pore volume and average pore diameter of the carbon particles (B), as measured by nitrogen gas adsorption, satisfy the ranges of 1.0×10?2 to 1.0×10?1 cm3/g and 20 to 50 nm, respectively. The negative electrode for a lithium-ion secondary cell, and a lithium-ion secondary cell in which such a negative electrode for a lithium-ion secondary cell is used, have a high capacity and excellent cycle characteristics.

Abstract: A polyamic acid solution includes a polyamic acid, a solvent (C) in which the polyamic acid (PAA1) is dissolved, and a substance (M) that can release at least one metal selected from groups 1 and 2 of the periodic table as a metal ion, or a substance (m) that contains the substance (M). A polyimide composite is produced from the polyamic acid solution. The polyimide composite can provide a greatly improved glass transition temperature without impairing the intrinsic physical properties of the polyimide.

Abstract: Provided is a low-cost polyimide, containing cyclohexane diamine as a diamine unit, that has a low thermal expansion coefficient. Said block polyimide contains blocks having the repeating structural unit shown in formula (1A) and blocks having the repeating structural unit shown in formula (1B). This block polyimide is preferably obtained by imidizing a block polyamide acid imide that contains blocks having the repeating structural unit shown in formula (2A) and blocks having the repeating structural unit shown in formula (2B).

Abstract: Provided is a polyimide excellent in heat resistance and colorless transparency and also excellent in flexibility and ultraviolet ray transmittance. The polyimide includes a structural unit represented by Formula (1a) and a structural unit represented by Formula (1b) wherein R is a specific aromatic group.

Abstract: The purpose of the present invention is to provide a block polyamide acid imide having an appropriate solubility in aqueous alkaline solutions, and block polyimides that are obtained using same and have high transparency and a low coefficient of linear thermal expansion (low CTE). This block polyimide comprises blocks configured from repeating structural units represented by formula (1A) and blocks configured from repeating structural units represented by formula (1B).

Abstract: The present invention addresses the problem of providing a high-transparency polyimide film in which the thickness-direction phase difference Rth is kept within a predetermined range. The present invention also addresses the problem of providing a polyamic acid and a varnish used to obtain the polyimide film. In order to overcome the aforementioned problem, the present invention is a polyimide film containing a polyimide obtained by bringing about a reaction between a tetracarboxylic dianhydride and a diamine, the polyimide film having (a) a thickness-direction phase difference Rth of ?5 to 100 nm per 10 ?m of thickness, (b) a transmittance of 80% or more with respect to light having a wavelength of 400 nm, (c) a haze of 3% or less, and (d) a glass transition point of 250° C. or higher.

Abstract: The present invention addresses the problem of providing: a polyimide film that has a small phase difference in the thickness direction and has a low coefficient of linear thermal expansion; and a polyamic acid and varnish to obtain the same. In order to solve this problem, the present invention provides a polyimide film which comprises polyimide that is produced by reacting a diamine component and a tetracarboxylic dianhydride component, the polyimide film having a coefficient of linear thermal expansion of 35 ppm/K or less over a temperature range of 100 to 200 DEG C, an absolute value of phase difference in the thickness direction of 200 nm or less per 10 ?m thickness, a glass transition temperature of 260 DEG C or more, and a total light transmittance of 85% or more.

Abstract: A method of manufacturing a narrow frame touch input sheet having very good anticorrosion properties and suitable for a narrow frame capacitance type touch sensor having a double-layer transparent conductive film pattern.

Abstract: A method of manufacturing a narrow frame touch input sheet having very good anticorrosion properties and suitable for a narrow frame capacitance type touch sensor having a double-layer transparent conductive film pattern.

Abstract: A method for manufacturing a narrow frame touch input sheet includes forming and stacking transparent conductive films, light-excluding conductive electrode films, and first resist layers sequentially on both surfaces of a transparent base sheet, exposing and developing the first resist layers simultaneously on the both surfaces, etching the transparent and light-excluding conductive electrode films on the both surfaces, and stripping the first resist layers to form a fine wiring circuit pattern with the stacked transparent conductive film and light-excluding conductive electrode film in an outer edge portion on each of the two surfaces. The method further includes forming a second resist layer to cover the fine wiring circuit pattern on each surface, and etching only the light-excluding electrode conductive film layer on which the second resist layer is not formed, to expose a circuit pattern of the transparent conductive film in a central window portion on each surface.

Abstract: A method of manufacturing a narrow frame touch input sheet having very good anticorrosion properties and suitable for a narrow frame capacitance type touch sensor having a double-layer transparent conductive film pattern. The method uses an electrical conductivity sheet obtained by sequentially forming transparent and light blocking conductive films, and first resist layers, on both sides of a transparent base sheet, exposing and developing the resist layers on both sides simultaneously, etching the transparent and light blocking films simultaneously, removing the resist layers, laminating second resist layers with anticorrosion agent on the revealed light blocking films, etching the light blocking films in center windows and terminal portions to reveal the transparent films, and side etching revealed end faces of the light blocking films at center window and terminal portion boundaries to create visor structured second resist layers that are heat softened as an anticorrosion layer on the revealed faces.

Abstract: A method for manufacturing a narrow frame touch input sheet includes forming and stacking transparent conductive films, light-excluding conductive electrode films, and first resist layers sequentially on both surfaces of a transparent base sheet, exposing and developing the first resist layers simultaneously on the both surfaces, etching the transparent and light-excluding conductive electrode films on the both surfaces, and stripping the first resist layers to form a fine wiring circuit pattern with the stacked transparent conductive film and light-excluding conductive electrode film in an outer edge portion on each of the two surfaces. The method further includes forming a second resist layer to cover the fine wiring circuit pattern on each surface, and etching only the light-excluding electrode conductive film layer on which the second resist layer is not formed, to expose a circuit pattern of the transparent conductive film in a central window portion on each surface.