Patents by Inventor Yoshihiro Tani

Yoshihiro Tani has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8932419
    Abstract: Disclosed is a urethane (meth)acrylate oligomer which is obtained by reacting at least one polyoxyalkylene polyol (A), at least one monool (B1) soluble in the component (A) and/or at least one silane coupling agent (B2) reactive with an isocyanate group, at least one polyisocyanate (C) and at least one hydroxylated mono (meth)acrylate compound (D) at a ratio at which the equivalent weights of hydroxy groups, active hydrogen groups and isocyanate groups in the respective components satisfy the following formulae (1)-(3). The urethane (meth)acrylate oligomer does not substantially contain an unreacted isocyanate group. B(active hydrogen)+D(OH)=C(NCO)?A(OH) (1) 1.05?C(NCO)/A(OH)?2 (2) {C(NCO)?2A(OH)+2m}×0.35?D(OH)?{C(NCO)?2A(OH)+2m}×0.
    Type: Grant
    Filed: December 31, 2013
    Date of Patent: January 13, 2015
    Assignee: Hitachi Chemical Company, Ltd.
    Inventors: Yoshinobu Ogawa, Kazutoshi Doki, Osamu Kawata, Yoshihiro Tani
  • Publication number: 20140110048
    Abstract: Disclosed is a urethane (meth)acrylate oligomer which is obtained by reacting at least one polyoxyalkylene polyol (A), at least one monool (B1) soluble in the component (A) and/or at least one silane coupling agent (B2) reactive with an isocyanate group, at least one polyisocyanate (C) and at least one hydroxylated mono (meth)acrylate compound (D) at a ratio at which the equivalent weights of hydroxy groups, active hydrogen groups and isocyanate groups in the respective components satisfy the following formulae (1)-(3). The urethane (meth)acrylate oligomer does not substantially contain an unreacted isocyanate group. B(active hydrogen)+D(OH)=C(NCO)?A(OH) (1) 1.05?C(NCO)/A(OH)?2 (2) {C(NCO)?2A(OH)+2m}×0.35?D(OH)?{C(NCO)?2A(OH)+2m}×0.
    Type: Application
    Filed: December 31, 2013
    Publication date: April 24, 2014
    Applicant: HITACHI CHEMICAL COMPANY, LTD.
    Inventors: Yoshinobu OGAWA, Kazutoshi DOKI, Osamu KAWATA, Yoshihiro TANI
  • Patent number: 8329305
    Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.
    Type: Grant
    Filed: March 24, 2011
    Date of Patent: December 11, 2012
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Kenichi Motoyama, Yoshihiro Tani
  • Publication number: 20110172355
    Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.
    Type: Application
    Filed: March 24, 2011
    Publication date: July 14, 2011
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Kenichi MOTOYAMA, Yoshihiro Tani
  • Publication number: 20100273909
    Abstract: Disclosed is a urethane (meth)acrylate oligomer which is obtained by reacting at least one polyoxyalkylene polyol (A), at least one monool (B1) soluble in the component (A) and/or at least one silane coupling agent (B2) reactive with an isocyanate group, at least one polyisocyanate (C) and at least one hydroxylated mono(meth)acrylate compound (D) at a ratio at which the equivalent weights of hydroxy groups, active hydrogen groups and isocyanate groups in the respective components satisfy the following formulae (1)-(3). The urethane (meth)acrylate oligomer does not substantially contain an unreacted isocyanate group. B(active hydrogen)+D(OH)=C(NCO)?A(OH) (1) 1.05?C(NCO)/A(OH)?2 (2) {C(NCO)?2A(OH)+2 m}×0.35?D(OH)?{C(NCO)?2A(OH)+2 m}×0.
    Type: Application
    Filed: August 3, 2007
    Publication date: October 28, 2010
    Inventors: Yoshinobu Ogawa, Kazutoshi Doki, Osamu Kawata, Yoshihiro Tani
  • Publication number: 20100204202
    Abstract: A drug containing a compound having the formula (I): or a pharmacologically acceptable salt thereof or their hydrates, which alleviates motor complications associated with a treatment with levodopa for Parkinson's disease, delays the onset of motor complications associated with a treatment with levodopa, and inhibiting or delaying the advance of symptoms of Parkinson's disease is provided. The compound having the formula (I) has a serotonin 1A receptor partial agonist action, does not have an antagonist action against dopamine D2 receptors, has an agonist action against dopamine D3 receptors, has an effect of alleviation and delay of onset of motor complications associated with repeated doses of levodopa and, further, is also effective against associated with psychiatric symptoms in advanced stage Parkinson's disease patients.
    Type: Application
    Filed: November 28, 2008
    Publication date: August 12, 2010
    Applicant: Asubio Pharma Co., Ltd.
    Inventors: Yoshihiro Tani, Makoto Koyama
  • Patent number: 7758687
    Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.
    Type: Grant
    Filed: February 26, 2009
    Date of Patent: July 20, 2010
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yoshihiro Tani, Kenichi Motoyama
  • Publication number: 20090162665
    Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.
    Type: Application
    Filed: February 26, 2009
    Publication date: June 25, 2009
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Yoshihiro TANI, Kenichi Motoyama
  • Patent number: 7550040
    Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.
    Type: Grant
    Filed: June 9, 2006
    Date of Patent: June 23, 2009
    Assignee: Nissan Chemical Industries, Ltd.
    Inventors: Yoshihiro Tani, Kenichi Motoyama
  • Publication number: 20070155897
    Abstract: To provide a process for forming an improved coating film on a substrate, particularly to provide a coating film formed on a substrate, as adhered to the surface of the substrate, having a refractive index of from 1.28 to 1.38 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.38 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula (R1O)3SiCH2CH2(CF2)nCH2CH2Si(OR1)3, an alcohol (C) of the formula R2CH2OH, and oxalic acid (D), in a specific ratio; heating this reaction mixture at a temperature of from 50 to 180° C. in the absence of water, to form a solution of a polysiloxane; then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating; and heat-curing the coating at a temperature of from 80 to 450° C.
    Type: Application
    Filed: December 17, 2004
    Publication date: July 5, 2007
    Applicant: Nissan Chemical Industries Limited
    Inventors: Yoshihiro Tani, Kenichi Motoyama
  • Publication number: 20070155896
    Abstract: To provide a highly hard coating film formed on a substrate, as adhered to the surface of the substrate and having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°. A coating film having a refractive index of from 1.28 to 1.41 and a contact angle with water of from 90° to 115°, which is formed as adhered to a substrate surface by forming a reaction mixture comprising a silicon compound (A) of the formula Si(OR)4, a silicon compound (B) of the formula CF3(CF2)nCH2CH2Si(OR1)3, a silicon compound (C) of the formula H2NCOH(CH2)mSi(OR2)3, an alcohol (D) of the formula R3CH2OH and oxalic acid (E), in a specific ratio, heating this reaction mixture at a temperature of from 40 to 180° C. in the absence of water to form a solution of a polysiloxane, then applying a coating fluid comprising the polysiloxane solution on a substrate surface to form a coating, and heat-curing the coating at a temperature of from 40 to 450° C.
    Type: Application
    Filed: December 17, 2004
    Publication date: July 5, 2007
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Kenichi Motoyama, Yoshihiro Tani
  • Publication number: 20060287460
    Abstract: To provide a coating fluid for forming a film, which is curable sufficiently by heat treatment at a low temperature of at most 70° C. to form a cured film excellent in abrasion resistance and which is excellent in storage stability, a film obtained from the coating fluid for forming a film, and a process for forming the film. A coating fluid for forming a film, which comprises a polysiloxane (A) obtained by condensation polymerization of a silicon compound of the formula (1) as the essential component, and a compound (B) of the formula (2): Si(OR1)4 ??(1) wherein R1 is a C1-5 hydrocarbon group, each of R2, R3, R4 and R5 which are independent of one another, is a hydrogen atom or a C1-12 organic group.
    Type: Application
    Filed: June 9, 2006
    Publication date: December 21, 2006
    Applicant: Nissan Chemical Industries, Ltd.
    Inventors: Yoshihiro Tani, Kenichi Motoyama
  • Patent number: 6900202
    Abstract: There is provided di-substituted iminoheterocyclic compounds of the following formula (I): in which, A is optionally substituted alkyl group, optionally substituted aryl group or optionally substituted heterocyclic group; X is oxygen atom, sulfur atom, carbon atom or nitrogen atom; the group —X—Y— represents optionally substituted alkylene or cyclic alkenylene bond; and B1 and B2 are, hydrogen atom, optionally substituted alkyl group, optionally substituted aryl group or optionally substituted heterocyclic group, independent from each other, or a pharmaceutically acceptable salt thereof. These compounds have good affinity for ?4?2 nicotinic acetylcholine receptors and activate the same to thereby exert a preventive or therapeutic effect on cerebral dysfunction.
    Type: Grant
    Filed: March 21, 2001
    Date of Patent: May 31, 2005
    Assignee: Daiichi Suntory Pharma Co., Ltd.
    Inventors: Masahiro Imoto, Tatsuya Iwanami, Minako Akabane, Yoshihiro Tani
  • Publication number: 20030134848
    Abstract: There is provided heterocyclic compounds of the following formula (I): 1
    Type: Application
    Filed: November 21, 2001
    Publication date: July 17, 2003
    Inventors: Masahiro Imoto, Tatsuya Iwanami, Minako Akabane, Yoshihiro Tani
  • Publication number: 20030100769
    Abstract: There is provided cyclic amidine compounds of the following formula (I): 1
    Type: Application
    Filed: December 11, 2001
    Publication date: May 29, 2003
    Inventors: Masahiro Imoto, Tatsuya Iwanami, Minako Akabane, Yoshihiro Tani
  • Publication number: 20030078259
    Abstract: There is provided di-substituted iminoheterocyclic compounds of the following formula (I): 1
    Type: Application
    Filed: November 20, 2001
    Publication date: April 24, 2003
    Inventors: Masahiro Imoto, Tatsuya Iwanami, Minako Akabane, Yoshihiro Tani
  • Publication number: 20020028809
    Abstract: There is provided heterocyclic compounds of the following formula (I): 1
    Type: Application
    Filed: August 22, 2001
    Publication date: March 7, 2002
    Applicant: SUNTORY LIMITED
    Inventors: Masahiro Imoto, Tatsuya Iwanami, Minako Akabane, Yoshihiro Tani
  • Patent number: 5676998
    Abstract: A thin film magnet and a cylindrical ferromagnetic thin film having a high maximum energy product (greater than 120 kJ/m.sup.3) and thus suitable for use in miniature high performance devices are provided. The thin film magnet is produced by means of physical vapor deposition. The thin film magnet is an (Nd.sub.1-x R.sub.x).sub.y M.sub.1-y-z B.sub.z alloy having a ferromagnetic compound of the Nd.sub.2 Fe.sub.14 B type as its main phase, wherein R is Tb, Ho, and Dy and M is Fe metal or an Fe-based alloy including at least one of Co and Ni, 0.04.ltoreq.x.ltoreq.0.10,0.11.ltoreq.y.ltoreq.0.15, and 0.08.ltoreq.z.ltoreq.0.15. A perpendicular magnetization film having such a composition is deposited on the side wall of a substrate in the columnar (or cylindrical) form thereby obtaining a cylindrical ferromagnetic thin film having radial anisotropy.
    Type: Grant
    Filed: September 8, 1995
    Date of Patent: October 14, 1997
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takeshi Araki, Yoshihiro Tani, Hideo Ikeda, Masashi Okabe
  • Patent number: RE36517
    Abstract: A thin film magnet and a cylindrical ferromagnetic thin film having a high maximum energy product (greater than 120 kJ/m.sup.3) and thus suitable for use in miniature high performance devices are provided. The thin film magnet is produced by means of physical vapor deposition. The thin film magnet is an (Nd.sub.1-x R.sub.x).sub.y M.sub.1-y-z B.sub.z alloy having a ferromagnetic compound of the Nd.sub.2 Fe.sub.14 B type as its main phase, wherein R is Tb, Ho, and Dy and M is Fe metal or an Fe-based alloy including at least one of Co and Ni, 0.04.ltoreq.x.ltoreq.0.10,0.11.ltoreq.y.ltoreq.0.15, and 0.08.ltoreq.z.ltoreq.0.15. A perpendicular magnetization film having such a composition is deposited on the side wall of a substrate in the columnar (or cylindrical) form thereby obtaining a cylindrical ferromagnetic thin film having radial anisotropy.
    Type: Grant
    Filed: October 15, 1998
    Date of Patent: January 18, 2000
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Takeshi Araki, Yoshihiro Tani, Hideo Ikeda, Masashi Okabe