Abstract: A storage battery management device according to one embodiment includes a hardware processor that causes a display device to display first remaining life information and second remaining life information. The first remaining life information indicates current remaining life of a storage battery system. The first remaining life information is calculated on the basis of a state of health (SOH) of each of multiple storage battery modules constituting the storage battery system. The second remaining life information indicates remaining life of the storage battery system and corresponds to a case where one or more of the multiple storage battery modules are replaced with one or more other storage battery modules. The second remaining life information is calculated on the basis of an SOH of each storage battery module not being replaced and an SOH of each of the one or more other storage battery modules.

Abstract: A storage battery management device includes an acquisition unit, a selection unit, an estimation unit, and a display control unit. The acquisition unit acquires a battery characteristic and an operation condition of a storage battery device. The selection unit selects data values from a data value group of a data item in which variation in data value is caused out of data items included in the battery characteristic and the acquired operation condition. The estimation unit estimates, for each of the selected data values, a battery characteristic after operation corresponding to a case where the storage battery device is operated under the operation condition. The battery characteristic is estimated on the basis of the battery characteristic and the operation condition acquired by the acquisition unit. The display control unit displays the battery characteristic estimated by the estimation unit in a comparable state.

Abstract: A storage battery management device according to one embodiment includes a hardware processor functioning as an acquisition unit, a calculation unit, and a display control unit. The acquisition unit acquires, as current operation state data of a storage battery system including a plurality of storage batteries, charge/discharge power, a cell voltage, a charge/discharge current, and a temperature of a battery board of the storage battery system. The calculation unit calculates, by using a digital model for simulating operation of the storage battery system, a chargeable/dischargeable capacity, a State of Charge (SOC) level change amount, and an SOC maintainable charge/discharge amount being a charge/discharge amount maintaining an SOC level within a predetermined range. The display control unit causes a display unit to display the chargeable/dischargeable capacity, the SOC level change amount, and the SOC maintainable charge/discharge amount.

Abstract: According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: According to one embodiment, a plasma processing apparatus includes: a processing chamber; a decompression section configured to decompress inside of the processing chamber; a member including a control section to be inserted into a depression provided on mounting side of a workpiece, the control section being configured to thereby control at least one of in-plane distribution of capacitance of a region including the workpiece and in-plane distribution of temperature of the workpiece; a mounting section provided inside the processing chamber; a plasma generating section configured to supply electromagnetic energy to a region for generating a plasma for performing plasma processing on the workpiece; and a gas supply section configured to supply a process gas to the region for generating a plasma. The control section performs control so that at least one of the in-plane distribution of capacitance and the in-plane distribution of temperature is made uniform.

Abstract: According to one embodiment, a method is disclosed for manufacturing a reflective mask. The method can include forming a reflection layer on a major surface of a substrate. The method can include forming an absorption layer on the reflection layer. The method can include forming a pattern region in the absorption layer. In addition, the method can include forming a light blocking region surrounding the pattern region in the absorption layer and the reflection layer. The forming the light blocking region includes etching-processing the reflection layer using a gas containing chlorine and oxygen.

Abstract: A plasma processing apparatus includes: a processing container capable of maintaining an atmosphere having a pressure lower than atmospheric pressure; an evacuation unit reducing a pressure of an interior of the processing container; a gas introduction unit introducing a process gas to the interior of the processing container; a microwave introduction unit introducing a microwave to the interior of the processing container; and a lifter pin ascendably and descendably inserted through a placement platform provided in the interior of the processing container, an end surface of the lifter pin supporting an object to be processed, the object to be processed being supported by the lifter pin at a first position proximal to an upper surface of the placement platform when the microwave is introduced and plasma is ignited, the object to be processed being supported by the lifter pin at a second position after the plasma ignition, the second position being more distal to the placement platform than the first position.