Patents by Inventor Yoshihisa Kawamura

Yoshihisa Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20200172443
    Abstract: A curved surface constituting a convex surface or a concave surface of each of a plurality of lenses includes at least a silicon nitride layer and another silicon nitride layer. An interlayer having a composition different from a composition of the silicon nitride layer and a composition of the other silicon nitride layer is arranged between the silicon nitride layer and the other silicon nitride layer, and a thickness of the interlayer is less than a thickness of the silicon nitride layer and a thickness of the other silicon nitride layer.
    Type: Application
    Filed: November 25, 2019
    Publication date: June 4, 2020
    Inventors: Yoshihisa Kawamura, Hideki Ina, Ryo Yoshida, Yukinobu Suzuki, Koji Hara, Yoshiyuki Nakagawa
  • Publication number: 20190243236
    Abstract: An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.
    Type: Application
    Filed: August 22, 2018
    Publication date: August 8, 2019
    Applicant: Toshiba Memory Corporation
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Hironobu TAMURA, Kiminori YOSHINO, Suigen KANDA
  • Patent number: 10241397
    Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: March 26, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Manabu Takakuwa, Yoshihisa Kawamura, Ikuo Yoneda
  • Patent number: 10192741
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: January 29, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Takahito Nishimura, Yoshihisa Kawamura, Kazuhiro Takahata, Ikuo Yoneda, Yoshiharu Ono
  • Patent number: 10118317
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Publication number: 20180275510
    Abstract: An imprinting apparatus includes a substrate holding unit having a first region configured to receive a substrate, and a second region positioned outside a periphery of a first region, the substrate holding unit including a resist removing mechanism including at least one of an exhaust mechanism and an air supply mechanism disposed in the second region. The apparatus further includes a template holding unit configured to hold a template defining recess patterns such that the recess patterns face the substrate holding unit, and such that the template can come into contact with a resist deposited onto the substrate, and one or more nozzles configured to discharge the resist onto the substrate.
    Type: Application
    Filed: September 5, 2017
    Publication date: September 27, 2018
    Applicant: TOSHIBA MEMORY CORPORATION
    Inventors: Yoshihisa KAWAMURA, Hiroshi TOKUE
  • Publication number: 20170365470
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Application
    Filed: September 6, 2017
    Publication date: December 21, 2017
    Applicant: Toshiba Memory Corporation
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Kazuhiro TAKAHATA, lkuo YONEDA, Yoshiharu ONO
  • Patent number: 9793120
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: October 17, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Takahito Nishimura, Yoshihisa Kawamura, Kazuhiro Takahata, Ikuo Yoneda, Yoshiharu Ono
  • Publication number: 20160372333
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Application
    Filed: January 29, 2016
    Publication date: December 22, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Kazuhiro TAKAHATA, Ikuo YONEDA, Yoshiharu ONO
  • Publication number: 20160346962
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Application
    Filed: August 31, 2015
    Publication date: December 1, 2016
    Inventors: Yoshihisa KAWAMURA, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Publication number: 20160243753
    Abstract: In a pattern forming method of an embodiment, a template pattern formed on a front side of a template is brought into contact with resist placed on a substrate. Moreover, in the pattern forming method, rear pressure being an ambient pressure on a back side of the template is adjusted to a second pressure. Moreover, in the pattern forming method, the resist is filled in the template pattern under the second pressure to be cured.
    Type: Application
    Filed: September 3, 2015
    Publication date: August 25, 2016
    Inventors: Masayuki HATANO, Yoshihisa KAWAMURA
  • Publication number: 20160009020
    Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.
    Type: Application
    Filed: September 4, 2014
    Publication date: January 14, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Manabu Takakuwa, Yoshihisa Kawamura, Ikuo Yoneda
  • Patent number: 8753803
    Abstract: According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: June 17, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshihisa Kawamura, Eishi Shiobara, Shinichi Ito
  • Patent number: 8747682
    Abstract: According to one embodiment, a pattern formation method is disclosed. The method includes forming a plurality of regions on a foundation and the plurality of the regions correspond to different pattern sizes. The method includes separating each of a plurality of block copolymers from another one of the plurality of the block copolymers and segregating the each of the plurality of the block copolymers into a corresponding one of the regions. The method includes performing a phase separation of the each of the block copolymers of each of the regions. The method includes selectively removing a designated phase of each of the phase-separated block copolymers to form a pattern of the each of the block copolymers and the pattern has a different pattern size for the each of the regions.
    Type: Grant
    Filed: August 3, 2010
    Date of Patent: June 10, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Kentaro Matsunaga, Tomoya Oori, Eishi Shiobara, Yukiko Sato, Yoshihisa Kawamura
  • Patent number: 8597873
    Abstract: According to one embodiment, a method for pattern formation comprises forming a first pattern on a first region of a processed film, forming a reverse material film, having a photosensitive compound, on the processed film so that the reverse material film covers the first pattern, exposing and developing the reverse material film and processing the reverse material film into a second pattern in a second region different from the first region on the processed film, applying etch-back, after exposing and developing the reverse material film, to the reverse material film to expose an upper surface of the first pattern and processing the reverse material film into a third pattern in the first region, and etching the processed film using the second pattern and the third pattern as masks.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: December 3, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventor: Yoshihisa Kawamura
  • Publication number: 20130275893
    Abstract: A screen creation system for creating a screen to be displayed at a graphical user interface of a programmable display includes: a registering unit that registers setting items that are set as a template regarding a configuration of a plurality of parts that makes the screen as elements that constitute the screen. When a new registration of the template is instructed regarding parts that are selected from the graphical user interface, the registering unit for registering the template is configured to: group and present setting items for each one of the selected parts based on properties thereof; and accept selection of the setting items to be included in the template.
    Type: Application
    Filed: December 24, 2010
    Publication date: October 17, 2013
    Applicant: MITSUBISHI ELECTRIC CORPORATION
    Inventors: Yoshihisa Kawamura, Masaru Nakamura
  • Publication number: 20130137268
    Abstract: According to one embodiment, a method for pattern formation comprises forming a first pattern on a first region of a processed film, forming a reverse material film, having a photosensitive compound, on the processed film so that the reverse material film covers the first pattern, exposing and developing the reverse material film and processing the reverse material film into a second pattern in a second region different from the first region on the processed film, applying etch-back, after exposing and developing the reverse material film, to the reverse material film to expose an upper surface of the first pattern and processing the reverse material film into a third pattern in the first region, and etching the processed film using the second pattern and the third pattern as masks.
    Type: Application
    Filed: August 23, 2012
    Publication date: May 30, 2013
    Inventor: Yoshihisa KAWAMURA
  • Patent number: 8419995
    Abstract: An imprint method includes applying a light curable resin on a substrate to be processed, the substrate including first and second regions on which the light curable resin is applied, contacting an imprint mold with the light curable resin, curing the light curable resin by irradiating the light curable resin with light passing through the imprint mold, generating gas by performing a predetermined process to the light curable resin applied on a region of the substrate, the region including at least the first region, wherein an amount of gas generated from the light curable resin applied on the first region is larger than an amount of gas generated from the light curable resin of the second region, and forming a pattern by separating the imprint mold from the light curable resin after the gas being generated.
    Type: Grant
    Filed: September 21, 2009
    Date of Patent: April 16, 2013
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Ikuo Yoneda, Kentaro Matsunaga, Yukiko Kikuchi, Yoshihisa Kawamura, Eishi Shiobara, Shinichi Ito, Tetsuro Nakasugi, Hirokazu Kato
  • Publication number: 20120248065
    Abstract: According to one embodiment, a pattern forming methoo is disclosed. A film is formed on a substrate to be processed. A gaps is formed in a surface of the film. A photo-curable imprinting agent is supplied on the film surface in which the gaps are formed. The agent is contacted with a template including a concave pattern. The contacting is configured to fill the concave pattern with the agent. Light is applied to the agent while the agent is contacted with the template, wherein the agent is cured by the light. The template is separated from the substrate, wherein a pattern of the cured agent is formed on the substrate.
    Type: Application
    Filed: March 20, 2012
    Publication date: October 4, 2012
    Inventors: Yoshihisa KAWAMURA, Shinichi Ito
  • Publication number: 20120241409
    Abstract: In accordance with an embodiment, a pattern formation method includes: forming, on a first substrate, a fabrication target film having first and second regions; selectively applying, onto the first region a self-assembly material of a plurality of components that are phase-separable by a thermal treatment; baking the self-assembly material to phase-separate the self-assembly material into the components; removing any one of the components to form a first pattern; applying a curable resin onto the second region of the fabrication target film; bringing a dented second substrate corresponding to an arbitrary pattern closer to and into contact with the curable resin so that the second substrate faces the curable resin; curing the curable resin; detaching the second substrate from the curable resin to form a second pattern in the curable resin; and using the first and the second patterns as masks to fabricate the fabrication target film.
    Type: Application
    Filed: March 6, 2012
    Publication date: September 27, 2012
    Inventors: Katsutoshi KOBAYASHI, Yoshihisa Kawamura, Yuriko Seino