Patents by Inventor Yoshihisa Kawamura

Yoshihisa Kawamura has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20240003253
    Abstract: A mining riser pipe is extended toward a water bottom, and a lower portion of an insertion pipe connected to a lower portion of the mining riser pipe is inserted into the water bottom. A liquid is supplied into the insertion pipe, and a rotation shaft extends inside both pipes and stirring blades attached to a lower portion of the rotation shaft are rotated inside the insertion pipe, thereby drilling and dissolving mud inside the insertion pipe into a slurry. Then, the mud S is raised to an upper portion of the insertion pipe by a stirring flow generated by the stirring blades, and the raised mud slurry is lifted above the water through the mining riser pipe 2, and a rotation speed of the stirring blades is lower in an initial process at an early stage of the drilling than in a subsequent process.
    Type: Application
    Filed: February 8, 2022
    Publication date: January 4, 2024
    Inventors: Tomohiro MORISAWA, Shinya OMORI, Yosuke TANAKA, Eigo MIYAZAKI, Keita AKIYAMA, Masanori KYO, Ikuo SAWADA, Yoshihisa KAWAMURA
  • Publication number: 20230292546
    Abstract: A light-emitting element includes a first electrode, a second electrode, and a light-emitting layer between the first electrode and the second electrode. The light-emitting element includes a transmittance-increasing layer with increasing transmittance in an optical path of light emitted from the light-emitting layer.
    Type: Application
    Filed: March 3, 2023
    Publication date: September 14, 2023
    Inventors: TETSUO TAKAHASHI, TAKAYUKI ITO, YOJIRO MATSUDA, YOSHIHISA KAWAMURA, YUTO NOZAKI, SATOSHI YOKOYAMA
  • Publication number: 20230112110
    Abstract: A method for recovering rare-earth mud including steps of: (A) penetrating a mud gathering pipe into a layer containing rare-earth mud under the seafloor, (B) preparing a slurry containing a rare earth by loosening rare-earth mud in the mud gathering pipe, and (C) transferring the slurry through a mud raising pipe. A rare-earth mud recovery system including: a mud gathering pipe configured to penetrate into a layer containing rare-earth mud under a seafloor; a stirring device configured to loosen rare-earth mud in the mud gathering pipe; and a mud raising pipe connected to the mud gathering pipe.
    Type: Application
    Filed: February 26, 2021
    Publication date: April 13, 2023
    Applicant: Japan Agency for Marine-Earth Science and Technology
    Inventors: Eigou MIYAZAKI, Yoshihisa KAWAMURA, Ikuo SAWADA, Masanori KYO, Mikito FURUICHI, Keita AKIYAMA, Yasuhiro NAMBA
  • Publication number: 20230077028
    Abstract: The present disclosure relates to an organic light-emitting device including an insulating layer, an organic light-emitting element disposed on the main surface of the insulating layer, and a color filter layer covering the organic light-emitting element and including a first color filter that passes light with a first wavelength and a second color filter that passes light with a second wavelength different from the first wavelength, wherein the concentration of an organic alkali having a nitrogen atom and a hydroxy group contained in the color filter layer is less than 108.2 ng/cm2.
    Type: Application
    Filed: September 8, 2022
    Publication date: March 9, 2023
    Inventors: Mariko Furuta, Yoshihisa Kawamura, Yuto Nozaki, Yuuki Kumagae, Kotaro Abukawa, Kunihito Ide, Jun Kamatani, Satoru Shiobara, Nobuhiko Sato
  • Patent number: 11332409
    Abstract: A curved surface constituting a convex surface or a concave surface of each of a plurality of lenses includes at least a silicon nitride layer and another silicon nitride layer. An interlayer having a composition different from a composition of the silicon nitride layer and a composition of the other silicon nitride layer is arranged between the silicon nitride layer and the other silicon nitride layer, and a thickness of the interlayer is less than a thickness of the silicon nitride layer and a thickness of the other silicon nitride layer.
    Type: Grant
    Filed: November 25, 2019
    Date of Patent: May 17, 2022
    Assignee: Canon Kabushiki Kaisha
    Inventors: Yoshihisa Kawamura, Hideki Ina, Ryo Yoshida, Yukinobu Suzuki, Koji Hara, Yoshiyuki Nakagawa
  • Publication number: 20210305324
    Abstract: A color filter array is provided. The array comprises a first color filter, a second color filter, and a third color filter that are arranged on a base member and respectively have different colors. The first color filter and the third color filter are arranged adjacent to each other, the second color filter includes a portion placed between an end portion of the third color filter and the base member, and the end portion of the third color filter and the portion of the second color filter are in contact with the first color filter.
    Type: Application
    Filed: March 18, 2021
    Publication date: September 30, 2021
    Inventors: Yoshihisa Kawamura, Hideki Ina, Yuto Nozaki, Yusuke Todo, Atsushi Kanome, Norihiko Nakata, Toru Eto
  • Patent number: 10915018
    Abstract: An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.
    Type: Grant
    Filed: August 22, 2018
    Date of Patent: February 9, 2021
    Assignee: Toshiba Memory Corporation
    Inventors: Takahito Nishimura, Yoshihisa Kawamura, Hironobu Tamura, Kiminori Yoshino, Suigen Kanda
  • Publication number: 20200172443
    Abstract: A curved surface constituting a convex surface or a concave surface of each of a plurality of lenses includes at least a silicon nitride layer and another silicon nitride layer. An interlayer having a composition different from a composition of the silicon nitride layer and a composition of the other silicon nitride layer is arranged between the silicon nitride layer and the other silicon nitride layer, and a thickness of the interlayer is less than a thickness of the silicon nitride layer and a thickness of the other silicon nitride layer.
    Type: Application
    Filed: November 25, 2019
    Publication date: June 4, 2020
    Inventors: Yoshihisa Kawamura, Hideki Ina, Ryo Yoshida, Yukinobu Suzuki, Koji Hara, Yoshiyuki Nakagawa
  • Publication number: 20190243236
    Abstract: An imprinting system according to an embodiment includes a first measuring device measuring an intensity of light reflected from an end of a shot area of a monitor substrate being an area on which imprinting has been performed, a dripping condition generating device generating a dripping condition of a resin-based mask material on the basis of the measured intensity of light, and an imprinting apparatus performing imprinting using the dripping condition. The imprinting apparatus includes a second measuring device measuring an intensity of light reflected from an end of a first shot area of a production substrate being an area on which imprinting has been performed, and a control unit adjusting arrangement of droplets of a resin-based mask material ejected on a second shot area of the production substrate being an area on which imprinting is to be performed on the basis of an intensity of light reflected from an end of the first shot area.
    Type: Application
    Filed: August 22, 2018
    Publication date: August 8, 2019
    Applicant: Toshiba Memory Corporation
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Hironobu TAMURA, Kiminori YOSHINO, Suigen KANDA
  • Patent number: 10241397
    Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.
    Type: Grant
    Filed: September 4, 2014
    Date of Patent: March 26, 2019
    Assignee: Toshiba Memory Corporation
    Inventors: Manabu Takakuwa, Yoshihisa Kawamura, Ikuo Yoneda
  • Patent number: 10192741
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Grant
    Filed: September 6, 2017
    Date of Patent: January 29, 2019
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Takahito Nishimura, Yoshihisa Kawamura, Kazuhiro Takahata, Ikuo Yoneda, Yoshiharu Ono
  • Patent number: 10118317
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Grant
    Filed: August 31, 2015
    Date of Patent: November 6, 2018
    Assignee: Toshiba Memory Corporation
    Inventors: Yoshihisa Kawamura, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Publication number: 20180275510
    Abstract: An imprinting apparatus includes a substrate holding unit having a first region configured to receive a substrate, and a second region positioned outside a periphery of a first region, the substrate holding unit including a resist removing mechanism including at least one of an exhaust mechanism and an air supply mechanism disposed in the second region. The apparatus further includes a template holding unit configured to hold a template defining recess patterns such that the recess patterns face the substrate holding unit, and such that the template can come into contact with a resist deposited onto the substrate, and one or more nozzles configured to discharge the resist onto the substrate.
    Type: Application
    Filed: September 5, 2017
    Publication date: September 27, 2018
    Applicant: TOSHIBA MEMORY CORPORATION
    Inventors: Yoshihisa KAWAMURA, Hiroshi TOKUE
  • Publication number: 20170365470
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Application
    Filed: September 6, 2017
    Publication date: December 21, 2017
    Applicant: Toshiba Memory Corporation
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Kazuhiro TAKAHATA, lkuo YONEDA, Yoshiharu ONO
  • Patent number: 9793120
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Grant
    Filed: January 29, 2016
    Date of Patent: October 17, 2017
    Assignee: TOSHIBA MEMORY CORPORATION
    Inventors: Takahito Nishimura, Yoshihisa Kawamura, Kazuhiro Takahata, Ikuo Yoneda, Yoshiharu Ono
  • Publication number: 20160372333
    Abstract: According to one embodiment, a device substrate includes a multilayer film that includes a film constituting a device element and is disposed on a substrate. A main face on which the device element is disposed includes a patterning region on which a resist is to be applied during an imprint process, and a bevel region provided as a region from a peripheral edge portion of the patterning region to an end portion of the device substrate. The bevel region includes a region where an upper surface of the bevel region becomes lower toward the end portion of the device substrate relative to an upper surface of the patterning region. The upper surface of the bevel region has an inclination angle of 10° or more and 90° or less with respect to the upper surface of the patterning region, at a boundary between the patterning region and the bevel region.
    Type: Application
    Filed: January 29, 2016
    Publication date: December 22, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Takahito NISHIMURA, Yoshihisa KAWAMURA, Kazuhiro TAKAHATA, Ikuo YONEDA, Yoshiharu ONO
  • Publication number: 20160346962
    Abstract: According to one embodiment, a template includes a template pattern and a liquid repellent pattern. The template pattern is formed on a substrate. The liquid repellent pattern has liquid repellency to a resist and are disposed on a periphery of a region for arrangement of the template pattern.
    Type: Application
    Filed: August 31, 2015
    Publication date: December 1, 2016
    Inventors: Yoshihisa KAWAMURA, Masayuki Hatano, Yohko Komatsu, Hiroyuki Kashiwagi
  • Publication number: 20160243753
    Abstract: In a pattern forming method of an embodiment, a template pattern formed on a front side of a template is brought into contact with resist placed on a substrate. Moreover, in the pattern forming method, rear pressure being an ambient pressure on a back side of the template is adjusted to a second pressure. Moreover, in the pattern forming method, the resist is filled in the template pattern under the second pressure to be cured.
    Type: Application
    Filed: September 3, 2015
    Publication date: August 25, 2016
    Inventors: Masayuki HATANO, Yoshihisa KAWAMURA
  • Publication number: 20160009020
    Abstract: According to one embodiment, an imprint apparatus including multiple types of imprint units and a conveyor to convey a substrate is provided. Each of the imprint units includes a suction mechanism configured to hold the substrate with multiple suction portions on a substrate holder, and a template having an imprint surface on which a concavo-convex pattern is formed on one face of a template substrate and having a recessed region in the other face, the recessed region corresponding to the imprint surface. The imprint units have different depths of the recessed regions in the templates and different arrangements of the suction portions in the suction mechanisms depending on the types.
    Type: Application
    Filed: September 4, 2014
    Publication date: January 14, 2016
    Applicant: Kabushiki Kaisha Toshiba
    Inventors: Manabu Takakuwa, Yoshihisa Kawamura, Ikuo Yoneda
  • Patent number: 8753803
    Abstract: According to one embodiment, a pattern forming method is disclosed. The method can include selectively providing a curing agent to a pattern in a template, contacting the template provided the curing agent to a substrate, irradiating the curing agent with light where the template and the substrate are contacted each other to harden the curing agent, demolding the template from the substrate to form a curing agent pattern on the substrate, and etching the substrate on a basis of the curing agent pattern.
    Type: Grant
    Filed: September 9, 2010
    Date of Patent: June 17, 2014
    Assignee: Kabushiki Kaisha Toshiba
    Inventors: Yoshihisa Kawamura, Eishi Shiobara, Shinichi Ito