Abstract: This gasification melting facility includes: a fluidized bed gasification furnace that generates pyrolysis gas by thermally decomposing waste and discharges incombustibles; a vertical cyclone melting furnace that includes a pyrolysis gas duct through which the pyrolysis gas is introduced; a pyrolysis gas passage that connects the fluidized bed gasification furnace with the pyrolysis gas duct of the vertical cyclone melting furnace; pulverizer that pulverize the incombustibles into pulverized incombustibles so that the particle size of the incombustibles becomes fine; and airflow transporter that puts the pulverized incombustibles in the pyrolysis gas passage, and separating metal contained in the pulverized incombustibles by a difference in specific gravity while conveying the pulverized incombustibles together with airflow. The pyrolysis gas and the pulverized incombustibles are melted in the vertical cyclone melting furnace.

Abstract: The melting equipment has a melting furnace that combusts and melts ash, a secondary combustion chamber disposed above the melting furnace, a slag extraction chute that guides slag generated in the melting furnace downward, a bypass channel (20) that connects the slag extraction chute and the secondary combustion chamber, an ejector (22) that is provided between the bypass channel (20), has a contraction portion (23) at which the channel cross sections are narrowed, and suctions the combustion exhaust gas (G) into the bypass channel (20), and an adhesion-prevention unit (31) (41) that prevent an incorporated substance that incorporates into the combustion exhaust gas (G) from attaching to the inner wall surface (21a) of the ejector (22).

Abstract: An electrophotographic apparatus and a process cartridge include an electrophotographic photosensitive member; a developing unit; and a cleaning unit, wherein depressed portions separated from each other and satisfying conditions below are formed in the surface of the electrophotographic photosensitive member at a density of 10 or more per unit area of 1 cm2: a depth of the depressed portions is defined as Rdv [?m], a minor-axis diameter of the depressed portions is defined as Lpc [?m], a major-axis diameter of the depressed portions is defined as Rpc [?m], and an angle formed between a direction of a major-axis of each of the depressed portions and a direction of movement of the surface of the electrophotographic photosensitive member is defined as ?[°]. 5[°]??[°]?85[°] 0.3×P [?m]?Rdv [?m]?0.5×P [?m] 1.1×P [?m]?Lpc [?m]?1.

Abstract: An electrophotographic photosensitive member is provide which inhibits recovered toner from leaking out of the edge portion at the time of long-term use, and has good durability. Each of at least both edge portions of the surface layer of the electrophotographic photosensitive member has a region in which independent depressed portions are formed at a density of ten or more portions per 100 ?m square. An average depth Rdv-A, an average short axis diameter Lpc-A, and an average long axis diameter Rpc-A, of the depressed portions are respectively in specific ranges. When an angle formed between the circumferential direction of the electrophotographic photosensitive member and the long axis of each of the depressed portions is represented by ?, the depressed portions are formed so that the angle ? satisfies the relationship of 90°<?<180° toward the center of the electrophotographic photosensitive member.

Abstract: An electrophotographic photosensitive member is provide which inhibits recovered toner from leaking out of the edge portion at the time of long-term use, and has good durability. Each of at least both edge portions of the surface layer of the electrophotographic photosensitive member has a region in which independent depressed portions are formed at a density of ten or more portions per 100 ?m square. An average depth Rdv-A, an average short axis diameter Lpc-A, and an average long axis diameter Rpc-A, of the depressed portions are respectively in specific ranges. When an angle formed between the circumferential direction of the electrophotographic photosensitive member and the long axis of each of the depressed portions is represented by ?, the depressed portions are formed so that the angle ? satisfies the relationship of 90°<?<180° toward the center of the electrophotographic photosensitive member.

Abstract: A process cartridge is disclosed which includes an electrophotographic photosensitive member having a photosensitive layer and a charging means. The charging means has a charging member which is provided in contact with the electrophotographic photosensitive member to charge the photosensitive member electrostatically by applying a voltage formed by superimposing an alternating-current voltage on a direct-current voltage. The photosensitive member has a surface layer which contains at least one of a polyarylate resin having a weight-average molecular weight of 7.5×103 to 3.7×104 and having a specific structural unit of Formula (1) and a polycarbonate resin having a weight-average molecular weight of 7.5×103 to 3.7×104 and having a specific structural unit of Formula (2). The photosensitive member further contains fluorine-containing resin particles. Also, an electrophotographic apparatus having the photosensitive member is disclosed.

Abstract: A process cartridge is disclosed which includes an electrophotographic photosensitive member having a photosensitive layer and a charging means. The charging means has a charging member which is provided in contact with the electrophotographic photosensitive member to charge the photosensitive member electrostatically by applying a voltage formed by superimposing an alternating-current voltage on a direct-current voltage. The photosensitive member has a surface layer which contains at least one of a polyarylate resin having a weight-average molecular weight of 7.5×103 to 3.7×104 and having a specific structural unit of Formula (1) and a polycarbonate resin having a weight-average molecular weight of 7.5×103 to 3.7×104 and having a specific structural unit of Formula (2). The photosensitive member further contains fluorine-containing resin particles. Also, an electrophotographic apparatus having the photosensitive member is disclosed.

Abstract: A method is provided for decomposition of chlorofluorocarbon to be decomposed and then disposed of. The process includes the following the steps of. A mixture of liquid chlorofluorocarbon substances to be decomposed (and then disposed of) and a liquid member are heated to a temperature of from about 500° C. to about 700° C. in order to produce a superheated vapor. The liquids member may be water, methanol, hydrogen peroxide, or mixtures thereof. The superheated vapor is maintained in a reactor for a sufficient reacting time in order to achieve decomposition of the chlorofluorocarbon in the mixture before passing through the reactor to a discharge outlet open to the environment.

Abstract: This invention relates to equipment for treating the aforesaid waste plastics directly with supercritical water, and an object thereof is to provide a method for the anticorrosive treatment of waste plastics treating equipment which makes it possible to use inexpensive stainless steel. Waste plastics treating equipment made of stainless steel is charged with a predetermined amount of an aqueous solution containing at least one alkali metal salt, and this aqueous solution is deaerated until its dissolved oxygen content is reduced to 0.5 mg/L or less. After the temperature and pressure of the equipment are raised until supercritical conditions are established, these temperature and pressure are maintained for a predetermined period of time.

Abstract: Disclosed is an economical process for treating a large amount of plastics waste in which thermoplastics, crosslinked plastics, thermosetting plastics or a mixture thereof can be continuously and rapidly degraded and converted into oil without sorting various types of plastics waste. According to this process, powdered plastics obtained by grinding thermoplastics, crosslinked plastics, thermosetting plastics or a mixture thereof is mixed with water to form a slurry, and a dispersing agent such as a water-absorbing resin, a water-soluble polymer or a surface-active agent is added thereto. The resulting mixed slurry is fed to a tubular continuous reactor where the powdered plastics is degraded under reaction conditions causing the water to be in or near its supercritical region. Finally, oil is recovered from the reaction product.

Abstract: A safe and efficient hydrothermal reaction apparatus for converting waste plastic into oil is described herein. The apparatus comprises a receiver tank for containing therein a mixture of plastic and water; a high-pressure injection pump in communication with the receiver tank through a flow passage change-over valve, the flow passage change-over valve being in communication with a water injection passage; a reactor device including a curved piping in communication with the injection pump, the curved piping being provided with a heating means; and an effluent tank in communication with the reactor device through a pressure reducing valve. The flow rate of the mixture injected into the reaction device may be controlled by regulating the pressure reducing valve.

Abstract: A safe and efficient hydrothermal reaction apparatus is described herein. Decomposition or synthesis of object material is performed by the continuous passing of the material through a flow passage of multi-staged reactor units under turbulent flow conditions. The flow passage is formed by a curved or spiral piping. In each reactor unit, a hot plate block is included as a heating unit. The hot plate block and the curved piping are placed in an appropriate thermal contact relationship. A portion of the curved piping is freely supported, so as to accommodate stress caused in the piping under high-temperature/high-pressure conditions. A tank is provided for regulating or controlling the pressure fluctuation within the flow passage which may be caused by solids or powder present or occurring in the flow passage during high-pressure treatment.

Abstract: A process for producing a 2-cephem or 3-cephem derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.4 represents hydrogen or a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and the dotted line indicates the alternate bond structure providing 3-cephem or 2-cephem, which comprises:reacting a halogenated derivative selected from the group consisting of a halogenated penam derivative having the formula: ##STR2## a halogenated cepham derivative of the formula: ##STR3## wherein X represents a halogen atom, R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and R.sub.1 is as defined above, or mixtures thereof with a dehydrohalogenoic acid reagent.

Abstract: New antimicrobial azetidinone derivatives and their salt of the formula: ##STR1## wherein R.sub.1 amino or acylamino, and A is selected from a variety of groups.

Abstract: A process for producing a 2-cephem or 3-cephem derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.4 represents hydrogen or a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and the dotted line indicates the alternate bond structure providing 3-cephem or 2-cephem, which comprises:reacting a halogenated derivative selected from the group consisting of a halogenated penam derivative having the formula: ##STR2## a halogenated cephem derivative of the formula: ##STR3## wherein X represents a halogen atom, R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and R.sub.1 is as defined above, or mixtures thereof with a dehydrohalogenoic acid reagent.

Abstract: An oxoazetidine derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and --SR.sub.2 is a residue of a thiophilic sulphur nucleophile.

Abstract: The present invention relates to new substituted-phenyl substituted-alkyl ethers and pharmaceutically acceptable salts thereof, which have hypolipidemic activity, and to processes for the preparation thereof, the compound having the following formula ##STR1## wherein R.sub.1 is lower alkyl, cycloalkyl, aryl, ar(lower)alkyl, a heterocyclic group or a group represented by the formula: ##STR2## wherein R.sub.3 and R.sub.4 are each hydrogen or lower alkyl,R.sub.5 is carboxy, esterified carboxy or hydroxymethyl and A is lower alkylene;R.sub.2 is hydrogen, lower alkyl, cycloalkyl, aryl, ar(lower)alkyl, a heterocyclic group or a group represented by the formula: ##STR3## and R.sub.6 is hydrogen, hydroxy or lower alkoxy; in which the aryl or the ar(lower)alkyl for R.sub.1 and R.sub.2 may be substituted with halogen, hydroxy or lower alkoxy, and when R.sub.1 and R.sub.2 are both lower alkyl, R.sub.1 and R.sub.2 may be linked together.

Abstract: New antimicrobial azetidinone derivatives and their salt of the formula: ##STR1## wherein R.sub.1 is amino or acylamino, and A is selected from a variety of groups.

Abstract: An oxazetidine derivative compound of the formula: ##STR1## wherein R.sub.1 represents a substituted or unsubstituted amino radical and R.sub.3 represents a radical selected from the group consisting of carboxy, protected carboxy, ester, acid amide, acid anhydride, acid halide, acid azide and carboxy salt, and --SR.sub.2 is a residue of a thiophilic sulphur nucleophile.

Abstract: A penam derivative having the formula: ##STR1## wherein X represents a halogen atom, and wherein R.sub.1 represents an amino or acylamino, and R.sub.3 represents a radical selected from the group consisting of carboxy, ester, acid amide, acid anhydride, acid halide, and acid azide.