Abstract: A spacer, which is an atmospheric pressure resistant structure for a vacuum container, can be easily assembled, and the manufacturing costs that accompany the installation of the spacer are reduced. A rear plate, which includes a substrate on which electron-emitting devices are mounted, is located opposite a face plate that is irradiated by electrons emitted by the electron-emitting devices, so that together these two units constitute one part of the vacuum container. A spacer is positioned as an atmospheric pressure resistant structure in the vacuum container. Blocks are bonded to both ends of the spacer, and with these blocks, the spacer is self-supported. Both ends of the spacer are tapered, and are used to reduce the stress that is imposed on the bottoms of the spacer and the blocks by the rear plate and the face plate while air is discharged from the vacuum container.

Abstract: An image forming apparatus such as an image display apparatus has spacers the charging of the surface of which can be reduced as well as the occurrence of discharge. The image forming apparatus includes an envelope, an electron source disposed within the envelope, an image forming member for forming an image by irradiation with electrons emitting by the electron source, and a spacer disposed between electrodes to which mutually different voltages are applied within the envelope. The spacer has conductivity and is electrically connected to the electrodes via conductive layers, and each of the conductive layers has an end portion defining a shape which is a combination of a linear portion and a curved portion or a combination of a linear portion and an obtuse-angle portion.

Abstract: An image forming apparatus using an electron source which has matrix-wired electron-emitting devices connected with wiring electrodes of conductive material, and a fluorescent member as an image forming member with an accelerating electrode on its inner surface side, opposite to the electron-emitting devices. The wiring electrodes includes a wiring electrode where a semiconductive support member (spacer) is provided via a conductive connection member and a wiring electrode where the semiconductive support member is not provided. The height of the upper surface of the conductive connection member on which the semiconductive support member is provided and that of the upper surface of the wiring electrode where the semiconductive support member is not provided are the same, to prevent shift of electron-beam trajectories around the semiconductive support member, due to disturbance of electric-field distribution.

Abstract: In an image-forming apparatus which includes, on a substrate, an electron beam source comprises plurality of electron-emitting devices, and image-forming members for forming an image upon irradiation of electron beams emitted from the electron-emitting devices, the image-forming members are stripe-shaped members, and the plurality of electron-emitting devices each comprise a negative electrode, an electron-emitting region and a positive electrode which are arranged on the substrate surface side by side in a direction vertical to the direction in which the stripe-shaped members are extending. With the present apparatus, deterioration of image quality is prevented even when the positional relationship between the electron-emitting devices such as cold cathode devices and the image-forming members such as fluorescent substances is deviated from predetermined one during assembly.

Abstract: An image forming apparatus using an electron source which has matrix-wired electron-emitting devices connected with wiring electrodes of conductive material, and a fluorescent member as an image forming member with an accelerating electrode on its inner surface side, opposite to the electron-emitting devices. The wiring electrodes include a wiring electrode where a semiconductive support member (spacer) is provided via a conductive connection member and a wiring electrode where the semiconductive support member is not provided. The height of the upper surface of the conductive connection member on which the semiconductive support member is provided and that of the upper surface of the wiring electrode where the semiconductive support member is not provided are the same, to prevent shift of electron-beam trajectories around the semiconductive support member, due to disturbance of electric-field distribution.