Patents by Inventor Yoshihisa Sudo

Yoshihisa Sudo has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090134028
    Abstract: A method of predicting an effect of a test chemical on living organisms, which comprises: a step of administering a plurality of chemicals whose effects on living organisms are known, to respective chemical dosed groups, administering a test chemical to a test chemical dosed group, collecting proteins from each group after a definite period of time, separating the proteins by two-dimensional gel electrophoresis, measuring the signal intensities of spots of the proteins and modified proteins formed therefrom, and calculating a signal intensity ratio of at least two spots, and a step of comparing the signal intensity ratio of test chemical dosed group with the signal intensity ratio of each chemical dosed group.
    Type: Application
    Filed: September 22, 2006
    Publication date: May 28, 2009
    Applicants: Chemicals Evaluation and Research Institute, Sumitomo Chemical Co., Ltd., Mitsubishi Chemical Safety Institute Ltd.
    Inventors: Hidenori Yamanaka, Yoshikuni Yakabe, Yoshihisa Sudo, Kayo Sumida, Koji Nakayama
  • Patent number: 6264246
    Abstract: A purge system has a purge gas piping system for substituting inert gas for process gas when a device connected in a process gas piping system is detached therefrom. In the purge system, a purge joint for connecting two pipes in the purge gas piping system is provided with an opening formed in alignment with the position where the two pipes are connected in the purge joint.
    Type: Grant
    Filed: February 29, 2000
    Date of Patent: July 24, 2001
    Assignee: CKD Corporation
    Inventors: Kenichi Goshima, Yoshihisa Sudo
  • Patent number: 6050287
    Abstract: A purge system has a purge gas piping system for substituting inert gas for process gas when a device connected in a process gas piping system is detached therefrom. In the purge system, a purge joint for connecting two pipes in the purge gas piping system is provided with an opening formed in alignment with the position where the two pipes are connected in the purge joint.
    Type: Grant
    Filed: June 23, 1998
    Date of Patent: April 18, 2000
    Assignee: CKD Corporation
    Inventors: Kenichi Goshima, Yoshihisa Sudo
  • Patent number: 5394755
    Abstract: In a flow quantity test system for a mass flow controller, a gas source for measurement is provided to supply gas for measurement. A cutoff valve for start of measurement is connected at its inlet port to the gas source for measurement and is connected at its outlet port to an inlet port of the mass flow controller. The cutoff valve for start of measurement is opened to flow the gas for measurement therethrough and closed to block the flow of the gas for measurement therethrough. A pressure gauge is provided to detect pressure of the gas for measurement appearing at the outlet port side of the cutoff valve for start of measurement. A microcomputer is provided to close the process gas cutoff valve and open the cutoff valve for start of measurement to change pressure detected by the pressure gauge.
    Type: Grant
    Filed: September 29, 1993
    Date of Patent: March 7, 1995
    Assignee: CKD Corporation
    Inventors: Yoshihisa Sudo, Minoru Ito
  • Patent number: 5368062
    Abstract: A gas supplying system for supplying a corrosive gas or the like to a semiconductor manufacturing apparatus or the like. A plurality of kinds of component gases are introduced into a chamber and mixed therein to form a desired supply gas. After supplying the desired supply gas, the chamber is evacuated and an inert gas is charged into the chamber to substitute a residual supply gas remaining in the chamber by the inert gas. The evacuation of the chamber and the charging of the inert gas into the chamber are repeated two or more times. Accordingly, the residual supply gas can be efficiently removed from the chamber and substituted by the inert gas.
    Type: Grant
    Filed: January 28, 1993
    Date of Patent: November 29, 1994
    Assignees: Kabushiki Kaisha Toshiba, CKD Corporation
    Inventors: Katsuya Okumura, Yoshihisa Sudo, Kenichi Goshima, Hiroshi Itafuji, Akihiro Kojima
  • Patent number: 5134110
    Abstract: Packing materials for use in liquid chromatographs are prepared by reacting silica gel or porous glass having silanol groups on the surface thereof with a chemical modifier to chemically attach the chemical modifier to silanol groups on the silica gel or porous glass, and reacting the chemically modified silica gel or porous glass with an end-capping agent in gas phase at 250.degree.-500.degree. C. to chemically attach the end-capping agent to the residual silanol groups on the silica gel or porous glass.
    Type: Grant
    Filed: February 21, 1991
    Date of Patent: July 28, 1992
    Assignee: Chemical Inspection & Testing Institute, Japan
    Inventors: Yoshihisa Sudo, Yasuyo Takahata