Patents by Inventor Yoshikathu Nakao

Yoshikathu Nakao has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method for forming relief pattern
    Patent number: 4002478
    Abstract: A method for forming a relief pattern on a substrate which comprises the steps of: (I) allowing a photosensitive sheet to adhere on said substrate, said photosensitive sheet containing a photo-impervious ink layer, releasing layer, pattern forming layer and photosensitive resin layer; (II) radiating actinic rays on said photosensitive sheet to cure an irradiated portion of said photosensitive resin layer; (III) peeling off the upper layers of said photosensitive sheet; and (IV) washing away the un-cured portion of said photosensitive resin layer to produce a fine and decorative relief pattern.
    Type: Grant
    Filed: January 2, 1976
    Date of Patent: January 11, 1977
    Assignee: Kansai Paint Company, Ltd.
    Inventors: Tomoo Kokawa, Yoshikathu Nakao, Kunio Akiyama