Patents by Inventor Yoshikatsu Suto

Yoshikatsu Suto has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • SEMICONDUCTOR SUBSTRATE AND METHOD OF MANUFACTURE THEREOF
    Publication number: 20080242067
    Abstract: A semiconductor substrate is disclosed, which comprises a lightly doped substrate that contains impurities at a low concentration, a heavily doped diffusion layer which is formed over a top of the lightly doped substrate and is higher in impurity concentration than the lightly doped substrate, and an epitaxial layer which is formed over a top of the heavily doped diffusion layer and contains impurities at a lower concentration than the heavily doped diffusion layer.
    Type: Application
    Filed: April 29, 2008
    Publication date: October 2, 2008
    Inventors: Masanobu OGINO, Yoshikatsu Suto, Yoshiro Baba
  • Semiconductor substrate and method of manufacture thereof
    Publication number: 20040124445
    Abstract: A semiconductor substrate is disclosed, which comprises a lightly doped substrate that contains impurities at a low concentration, a heavily doped diffusion layer which is formed over a top of the lightly doped substrate and is higher in impurity concentration than the lightly doped substrate, and an epitaxial layer which is formed over a top of the heavily doped diffusion layer and contains impurities at a lower concentration than the heavily doped diffusion layer.
    Type: Application
    Filed: November 17, 2003
    Publication date: July 1, 2004
    Inventors: Masanobu Ogino, Yoshikatsu Suto, Yoshiro Baba