Abstract: A pattern formation method includes discharging a functional liquid substance having a functional material to an object, and irradiating the functional liquid substance with light emitted from a light source thereby to form a pattern of a functional film on the object. In this method, when the thickness of the functional liquid substance on an optical axis of the light is L and the absorption coefficient of the functional liquid substance for the light is ?, the thickness and the absorption coefficient are set so as to satisfy an equation (1): 0.1??·L?0.

Abstract: In a film formation method, a droplet discharge unit discharges droplets of a functional liquid material on a substrate as the droplet discharge unit is moved with respect to the substrate to form a liquid film on the substrate. The film formation method includes discharging a plurality of first droplets onto a plurality of first positions on the substrate with the first positions being arranged so that the first droplets do not touch each other on the substrate, discharging a plurality of second droplets onto a plurality of second positions on the substrate with the second positions being disposed between the first droplets that were discharged on the substrate; and causing the second droplets to touch a plurality of adjacent ones of the first droplets to form the liquid film.