Abstract: An optical detection unit according to one embodiment of the present disclosure includes: a first photoelectric converter that photoelectrically converts a wavelength component in a visible light region; a second photoelectric converter that photoelectrically converts a wavelength component in a near-infrared region, the second photoelectric converter being stacked on the first photoelectric converter; and a first wiring layer provided between the first photoelectric converter and the second photoelectric converter, the first wiring layer including one or a plurality of wirings formed with use of a material that transmits a wavelength component in a longer wavelength region than the visible light region, the one or the plurality of wirings being used for reading out charges generated through photoelectric conversion in the first photoelectric converter.

Abstract: A photodetector that makes it possible to attempt to improve optical characteristics in terms of oblique incidence of light at angle-of-view ends is provided. A photodetector includes multiple pixels arranged in a matrix on a semiconductor substrate. Each of the multiple pixels includes a photoelectric converting section that photo-electrically converts incident light, and a deflecting section that is arranged on a light-incidence-surface side of the photoelectric converting section, and has multiple pillars with different thicknesses, pitches, or shapes in the pixel. The pillars guide an incident principal ray that is incident at a different angle for each image height to the photoelectric converting section at a prism angle at which light is bent relative to the principal ray differently for each pixel.

Abstract: A first photodetector according to an embodiment of the present disclosure includes: a substrate having a first surface that serves as a light-receiving surface and a second surface opposed to the first surface, and including an uneven structure provided on the first surface and a light-receiving section that performs photoelectric conversion to generate electric charge corresponding to an amount of light reception for each pixel; a passivation film stacked on the first surface of the substrate; and a reflectance adjustment layer including a plurality of protrusions configuring the uneven structure and the passivation film embedded in a plurality of recesses configuring the uneven structure, and having a refractive index between the substrate and the passivation film.

Abstract: There is provided a light detecting device that can suppress corrosion of optical elements while suppressing upper layer color mixing. The light detecting device includes: a substrate on which a plurality of photoelectric conversion units are formed; a plurality of optical elements that are disposed on a rear surface side of the substrate; and a microlens array that is disposed on a rear surface side of the plurality of optical elements, and includes a plurality of microlenses. Furthermore, the optical element contains a metal material, and a surface on an optical element side of the microlens array is formed in contact with the rear surfaces of the optical elements so as to cover the rear surfaces and also serve as a protection film that suppresses corrosion of the metal material of the optical elements.

Abstract: Improvement of pixel characteristics is achieved. A light detecting device includes a semiconductor layer and first and second separation areas disposed in the semiconductor layer. The first separation area includes an insulating film that fills a first dug part extending in a thickness direction of the semiconductor layer and of which a refractive index is lower than that of the semiconductor layer, and the second separation area includes a conductive film filling a second dug part extending in the thickness direction of the semiconductor layer.

Abstract: Disclosed is a light receiving element including an on-chip lens, a wiring layer, and a semiconductor layer disposed between the on-chip lens and the wiring layer. The semiconductor layer includes a photodiode, a first transfer transistor that transfers electric charge generated in the photodiode to a first charge storage portion, a second transfer transistor that transfers electric charge generated in the photodiode to a second charge storage portion, and an interpixel separation portion that separates the semiconductor layers of adjacent pixels from each other, for at least part of the semiconductor layer in the depth direction. The wiring layer has at least one layer including a light blocking member. The light blocking member is disposed to overlap with the photodiode in a plan view.

Abstract: A light deflecting device and a distance measuring device in which spread of emission light is suppressed and an effective opening for light reception is enlarged are provided. A light deflecting device including a plurality of waveguides that extends in a first direction in parallel to each other and is provided in a semiconductor layer, and is capable of emitting light to an external space of the semiconductor layer and receiving light from the external space, and an optical system that is provided on a substrate including the semiconductor layer and converts light deflected and emitted from the plurality of waveguides in the first direction into a light beam substantially parallel to a second direction orthogonal to the first direction.

Abstract: A distance measurement accuracy is improved. A solid-state imaging device according to an embodiment includes a pixel array part in which a plurality of pixels is arranged in a matrix, in which each of the pixels includes a plurality of photoelectric conversion units that each photoelectrically converts incident light to generate a charge, a floating diffusion region that accumulates the charge, a plurality of transfer circuits that transfer the charge generated in each of the plurality of photoelectric conversion units to the floating diffusion region, and a first transistor that causes a pixel signal of a voltage value corresponding to a charge amount of the charge accumulated in the floating diffusion region to appear in a signal line.

Abstract: The present technology relates to an imaging element and an electronic device that enable provision of an imaging element that enables pixels to be reduced in size without increasing a thickness of an Si layer and efficiently absorbs light with a long wavelength. Photoelectric conversion regions and a region including a plurality of recessed portions on a light-receiving surface side of the photoelectric conversion regions are included, and the recessed portions are in a shape with no intersecting parts in a plan view. The recessed portions are configured of first recessed portions having a linear shape in a first direction and second recessed portions having a linear shape in a second direction, the first recessed portions and the second recessed portions are provided in a shape with no intersecting parts. The present technology can be applied to an imaging element that receives light with a long wavelength, for example.

Abstract: There is provided a solid-state imaging device that is capable of suppression of color mixing caused by a pixel for near-infrared light and securement of a saturation charge amount of a pixel for visible light where the pixels are formed in a same substrate. The solid-state imaging device includes: a substrate; first to third photoelectric conversion units; infrared absorbing filters; first to third color filters; a first element isolation unit between the first and second photoelectric conversion units; and a second element isolation unit disposed between the second and third photoelectric conversion units, in which a cross-sectional area of the first element isolation unit along a direction in which the first and second photoelectric conversion units are aligned is larger than a cross-sectional area of the second element isolation unit along a direction in which the second and third photoelectric conversion units are aligned.

Abstract: In a light receiving device, a light receiving element includes a first photoelectric conversion unit (PD) that converts light into electric charges, a first electric charge storage unit (MEM) to which the electric charges are transferred from the first photoelectric conversion unit, a first distribution gate, a second electric charge storage unit (MEM) to which the electric charges are transferred from the first photoelectric conversion unit, and a second distribution gate, in which the first and second distribution gates are provided at positions axially symmetric to each other with respect to a first center axis extending so as to pass through the center of the first photoelectric conversion unit, in a direction intersecting the column direction at a predetermined angle, when viewed from above the semiconductor substrate.

Abstract: A solid-state imaging device according to an embodiment includes: a plurality of pixels, each of the plurality of pixels including a substrate having a first surface serving as a light incident surface, a photoelectric conversion unit located inside the substrate, a light shielding unit provided on a first surface side, the light shielding unit having a hole portion configured to allow light to be incident on the photoelectric conversion unit, and a first lens made of silicon, the first lens being provided on the light shielding unit and condensing incident light toward the hole portion.

Abstract: A sensor device according to the present technology includes a pixel that includes: a photoelectric conversion element that performs photoelectric conversion; a first charge holding unit and a second charge holding unit that hold charges accumulated in the photoelectric conversion element; a first transfer transistor that transfers the charges to the first charge holding unit; and a second transfer transistor that transfers the charges to the second charge holding unit.

Abstract: Disclosed is a light receiving element including an on-chip lens, a wiring layer, and a semiconductor layer disposed between the on-chip lens and the wiring layer. The semiconductor layer includes a photodiode, a first transfer transistor that transfers electric charge generated in the photodiode to a first charge storage portion, a second transfer transistor that transfers electric charge generated in the photodiode to a second charge storage portion, and an interpixel separation portion that separates the semiconductor layers of adjacent pixels from each other, for at least part of the semiconductor layer in the depth direction. The wiring layer has at least one layer including a light blocking member. The light blocking member is disposed to overlap with the photodiode in a plan view.

Abstract: A sensor device according to the present technology includes a pixel that includes: a photoelectric conversion element that performs photoelectric conversion; a first charge holding unit and a second charge holding unit that hold charges accumulated in the photoelectric conversion element; a first transfer transistor that transfers the charges to the first charge holding unit; and a second transfer transistor that transfers the charges to the second charge holding unit.

Abstract: A first photodetector according to an embodiment of the present disclosure includes: a substrate having a first surface that serves as a light-receiving surface and a second surface opposed to the first surface, and including an uneven structure provided on the first surface and a light-receiving section that performs photoelectric conversion to generate electric charge corresponding to an amount of light reception for each pixel; a passivation film stacked on the first surface of the substrate; and a reflectance adjustment layer including a plurality of protrusions configuring the uneven structure and the passivation film embedded in a plurality of recesses configuring the uneven structure, and having a refractive index between the substrate and the passivation film.

Abstract: Disclosed is a light receiving element including an on-chip lens, a wiring layer, and a semiconductor layer disposed between the on-chip lens and the wiring layer. The semiconductor layer includes a photodiode, a first transfer transistor that transfers electric charge generated in the photodiode to a first charge storage portion, a second transfer transistor that transfers electric charge generated in the photodiode to a second charge storage portion, and an interpixel separation portion that separates the semiconductor layers of adjacent pixels from each other, for at least part of the semiconductor layer in the depth direction. The wiring layer has at least one layer including a light blocking member. The light blocking member is disposed to overlap with the photodiode in a plan view.

Abstract: The present technique relates to a light-receiving element that enables a dark current to be suppressed while improving quantum efficiency using Ge or SiGe, a method of manufacturing the light-receiving element, and an electronic device. The light-receiving element includes: a pixel array region where pixels in which at least a photoelectric conversion region is formed of a SiGe region or a Ge region are arrayed in a matrix pattern; and an AD converting portion provided in pixel units of one or more pixels. The present technique can be applied to, for example, a ranging module that measures a distance to a subject, and the like.

Abstract: To provide a ranging device having improved quantum efficiency and resolution. The present disclosure provides a ranging device including: a semiconductor layer having a first surface and a second surface opposite to the first surface; a lens on the second surface side; first and second charge storage sections in the semiconductor layer on the first surface side; a photoelectric conversion section that is in contact with the semiconductor layer on the first surface side, the photoelectric conversion section including a material different from a material of the semiconductor layer; first and second voltage application sections that apply a voltage to the semiconductor layer between the first and second charge storage sections and the photoelectric conversion section; and a waveguide provided in the semiconductor layer so as to extend from the second surface to the photoelectric conversion section, the waveguide including a material different from the material of the semiconductor layer.

Abstract: The present disclosure relates to a solid-state imaging device, a method for manufacturing the same, and an electronic apparatus capable of improving sensitivity while suppressing degradation of color mixture. The solid-state imaging device includes an anti-reflection portion having a moth-eye structure provided on a boundary surface on a light-receiving surface side of a photoelectric conversion region of each pixel arranged two-dimensionally, and an inter-pixel light-blocking portion provided below the boundary surface of the anti-reflection portion to block incident light. In addition, the photoelectric conversion region is a semiconductor region, and the inter-pixel light-blocking portion has a trench structure obtained by digging the semiconductor region in a depth direction at a pixel boundary. The techniques according to the present disclosure can be applied to, for example, a solid-state imaging device of a rear surface irradiation type.