Patents by Inventor Yoshiki Kida
Yoshiki Kida has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240078174Abstract: An information storage device includes a storage unit, a control unit, an allocation information storage unit, a QoS parameter storage unit, and a monitoring result storage unit. The control unit creates and manages a logical storage area using the storage area of the storage unit when a storage area allocation request is received. The allocation information storage unit stores allocation information related to logical storage areas. The QoS parameter storage unit stores quality requests expected to be satisfied for a communication for using the logical storage area. The control unit monitors the operating state and characteristics of the storage unit and the communication status, and stores the results in the monitoring result storage unit. The control unit derives internal QoS parameters to be set in the information storage device from the information stored in the allocation information storage unit, the QoS parameter storage unit, and the monitoring result storage unit.Type: ApplicationFiled: September 5, 2023Publication date: March 7, 2024Inventors: Takeshi ISHIHARA, Yohei HASEGAWA, Kenta YASUFUKU, Shohei ONISHI, Yoshiki SAITO, Junpei KIDA
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Publication number: 20160124317Abstract: A method, for determining an exposure condition for exposing a substrate held on a holder by irradiating the substrate with exposure light via an immersion liquid, includes: moving an object held on the holder relative to a liquid immersion area formed under a projection system under a movement condition and an immersion condition; obtaining information on a leakage of the immersion liquid which may be caused when moving the object held on the holder under the movement condition; and determining the exposure condition for exposing the substrate based on the obtained information.Type: ApplicationFiled: December 23, 2015Publication date: May 5, 2016Applicant: NIKON CORPORATIONInventors: Yoshiki Kida, Hiroyuki Nagasaka
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Patent number: 9239524Abstract: The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based on the detection results.Type: GrantFiled: March 30, 2006Date of Patent: January 19, 2016Assignee: NIKON CORPORATIONInventors: Yoshiki Kida, Hiroyuki Nagasaka
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Patent number: 9025126Abstract: An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.Type: GrantFiled: July 28, 2008Date of Patent: May 5, 2015Assignee: Nikon CorporationInventors: Yosuke Shirata, Yoshiki Kida
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Patent number: 8913224Abstract: An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.Type: GrantFiled: September 2, 2011Date of Patent: December 16, 2014Assignee: Nixon CorporationInventor: Yoshiki Kida
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Publication number: 20120026475Abstract: An exposure apparatus EX is provided with a measuring unit 60 which measures at least one of property and components of a liquid LQ in a state that a liquid immersion area LR is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.Type: ApplicationFiled: September 2, 2011Publication date: February 2, 2012Applicant: NIKON CORPORATIONInventor: Yoshiki Kida
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Patent number: 8035799Abstract: An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.Type: GrantFiled: December 9, 2005Date of Patent: October 11, 2011Assignee: Nikon CorporationInventor: Yoshiki Kida
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Patent number: 7872476Abstract: An NMR probe is offered which enables a 1H/19F compatibility mode having a sample coil, a hollow tubular body, and two rod electrodes disposed inside the tubular body substantially in a parallel relationship to each other. The tubular body is formed by a conductive wall at ground potential. An RF input-output portion corresponding to the resonant frequency of 1H nucleus is connected with the one end of the coil via a tuning and matching device. Another RF input-output port corresponding to the resonant frequency of 19F nucleus is connected with an end of the coil via another tuning and matching device.Type: GrantFiled: April 14, 2009Date of Patent: January 18, 2011Assignee: JEOL Ltd.Inventors: Hiroshi Ikeda, Yoshiki Kida, Hiroto Suematsu
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Patent number: 7714579Abstract: An NMR probe permits measurements to be made with its inner coil without replacing the probe. The NMR probe has three coils disposed to surround a sample tube. An inner coil can resonate with the HF and LF. An intermediate coil can resonate with the HF and LF, and produces an RF magnetic field perpendicular to the RF field produced by the inner coil. An outermost coil can resonate at least at a lock frequency. The outermost coil produces an RF magnetic field which is perpendicular to the RF field produced by the intermediate coil but which is coincident in direction with the RF field produced by the inner coil.Type: GrantFiled: May 29, 2008Date of Patent: May 11, 2010Assignee: Jeol Ltd.Inventors: Hiroto Suematsu, Yoshiki Kida, Yoshiaki Yamakoshi, Hiroshi Ikeda, Tetsuo Miyamoto, Ryoji Tanaka
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Publication number: 20100002206Abstract: The situation of a liquid immersion region (LR) formed on the surface of a substrate (P) is detected while changing at least one of the movement condition of the substrate (P) and the liquid immersion condition when forming the liquid immersion region (LR), and an exposure condition is determined based on the detection results.Type: ApplicationFiled: March 30, 2006Publication date: January 7, 2010Inventors: Yoshiki Kida, Hiroyuki Nagasaka
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Publication number: 20090279059Abstract: An adjusting method that adjusts an immersion exposure apparatus that comprises a first holder, which holds a substrate, and a second holder, which holds the substrate before the substrate is held by the first holder, and that exposes the substrate, which is held by the first holder, through a liquid. The adjusting method comprises: holding a thermometer with the first holder; holding the thermometer with the second holder; and adjusting the temperature of at least one of the first holder and the second holder based on the detection result of the thermometer held by the first holder and the detection result of the thermometer held by the second holder.Type: ApplicationFiled: July 28, 2008Publication date: November 12, 2009Applicant: NIKON CORPORATIONInventors: Yosuke Shirata, Yoshiki Kida
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Publication number: 20090261829Abstract: An NMR probe is offered which enables a 1H/19F compatibility mode having a sample coil, a hollow tubular body, and two rod electrodes disposed inside the tubular body substantially in a parallel relationship to each other. The tubular body is formed by a conductive wall at ground potential. An RF input-output portion corresponding to the resonant frequency of 1H nucleus is connected with the one end of the coil via a tuning and matching device. Another RF input-output port corresponding to the resonant frequency of 19F nucleus is connected with an end of the coil via another tuning and matching device.Type: ApplicationFiled: April 14, 2009Publication date: October 22, 2009Applicant: JEOL LTD.Inventors: Hiroshi Ikeda, Yoshiki Kida, Hiroto Suematsu
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Publication number: 20090135382Abstract: An exposure method includes a first step filling a liquid in a predetermined optical path space for exposure light (EL) in an optical system (PL), or for exchanging the liquid (LQ) filled in the space; a second step for successively exposing a predetermined number of substrates (P) through the liquid (LQ) filled in the optical path space or through the exchanged liquid; and a third step for judging, after the completion of the second step and based on an elapsed time elapsed after the first step, whether or not to exchange the liquid (LQ) filled in the optical path space. Exposure processing and measurement processing can be satisfactorily performed by making the liquid filled in the optical path space held in a desired state.Type: ApplicationFiled: April 27, 2006Publication date: May 28, 2009Applicant: Nikon CorporationInventor: Yoshiki Kida
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Publication number: 20080297156Abstract: An NMR probe permits measurements to be made with its inner coil without replacing the probe. The NMR probe has three coils disposed to surround a sample tube. An inner coil can resonate with the HF and LF. An intermediate coil can resonate with the HF and LF, and produces an RF magnetic field perpendicular to the RF field produced by the inner coil. An outermost coil can resonate at least at a lock frequency. The outermost coil produces an RF magnetic field which is perpendicular to the RF field produced by the intermediate coil but which is coincident in direction with the RF field produced by the inner coil.Type: ApplicationFiled: May 29, 2008Publication date: December 4, 2008Applicant: JEOL LTD.Inventors: Hiroto Suematsu, Yoshiki Kida, Yoshiaki Yamakoshi, Hiroshi Ikeda, Tetsuo Miyamoto, Ryoji Tanaka
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Publication number: 20070252960Abstract: An exposure apparatus is provided with a measuring unit which measures at least one of property and components of a liquid in a state that a liquid immersion area is formed on an object different from a substrate P to be exposed. There is provided an exposure apparatus which can accurately perform exposure process and measurement process through the liquid by judging the state of the liquid in advance and by performing a procedure as appropriate.Type: ApplicationFiled: December 9, 2005Publication date: November 1, 2007Applicant: NIKON CORPORATIONInventor: Yoshiki Kida
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Patent number: 6900880Abstract: The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the main control unit changes the control factor of the exposure system contributing to the throughput, in accordance with the minimum line width of the pattern. The control factor is changed so that the state (or the value) moves into a state where more priority is put on throughput, only when reduction in exposure accuracy is allowed. This makes it possible to improve the throughput while maintaining the exposure accuracy, compared with the case when the exposure system is controlled based on the same value at all times.Type: GrantFiled: August 27, 2003Date of Patent: May 31, 2005Assignee: Nikon CorporationInventors: Yoshiki Kida, Tsuneo Miyai
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Publication number: 20040036849Abstract: The exposure apparatus comprises a projection optical system that has an image field capable of exposing a shot area in a scanning exposure apparatus in one shot. This allows a 1 in 1 exposure, with the shot area being the maximum exposable range of the scanning exposure apparatus. In addition, the main control unit changes the control factor of the exposure system contributing to the throughput, in accordance with the minimum line width of the pattern. The control factor is changed so that the state (or the value) moves into a state where more priority is put on throughput, only when reduction in exposure accuracy is allowed. This makes it possible to improve the throughput while maintaining the exposure accuracy, compared with the case when the exposure system is controlled based on the same value at all times.Type: ApplicationFiled: August 27, 2003Publication date: February 26, 2004Applicant: Nikon CorporationInventors: Yoshiki Kida, Tsuneo Miyai
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Patent number: 6680611Abstract: A local signal supply device for an NMR spectrometer comprises a local signal generator, the output of which is divided into the same number of portions as there are local signal-selecting switches. The local signal-selecting switches independently select necessary local signals and supply them to corresponding resonance frequency signal generators.Type: GrantFiled: January 18, 2002Date of Patent: January 20, 2004Assignee: JEOL Ltd.Inventor: Yoshiki Kida
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Patent number: 6577382Abstract: An object of the invention is to provide a substrate transport apparatus which enables prompt transfer of a substrate, and a substrate processing apparatus incorporating this. A substrate transport apparatus of the invention comprises a transport arm (45, 46, 145, 146) for supporting a peripheral portion of a substrate (W) at at least two places on the peripheral portion, and transporting the substrate to a stage (7).Type: GrantFiled: February 1, 2002Date of Patent: June 10, 2003Assignee: Nikon CorporationInventors: Yoshiki Kida, Kenji Nishi
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Publication number: 20020109502Abstract: A local signal-supplying device for NMR spectrometer comprises a reduced number of local signal generators. A local signal delivered from one local signal generator is divided into the same number of portions as there are local signal-selecting means by a local signal-distributing means corresponding to that local signal generator. The signal portions are then supplied to local signal-selecting means, respectively. Similarly, local signals produced by other local signal generators are divided into the same number of portions as there are local signal-selecting means by local signal-distributing means corresponding to these local signal generators. The signal portions are then supplied to these local signal-selecting means, respectively. The local signal-selecting means independently select necessary local signals and supply them to corresponding resonance frequency signal generators.Type: ApplicationFiled: January 18, 2002Publication date: August 15, 2002Applicant: JEOL Ltd.Inventor: Yoshiki Kida