Patents by Inventor Yoshiki Nakagawa

Yoshiki Nakagawa has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 6111022
    Abstract: The present invention is directed to a process of atom (or group) transfer radical polymerization for the synthesis of novel homopolymer or a block or graft copolymer, optionally containing at least one polar group, with well defined molecular architecture and narrow polydispersity index, in the presence of an initiating system comprising (i) an initiator having a radically transferrable atom or group, (ii) a transition metal compound, and (iii) a ligand; the present invention is also directed to the synthesis of a macromolecule having at least two halogen groups which can be used as a macroinitiator component (i) to subsequently form a block or graft copolymer by an atom or group transfer radical polymerization process; the present invention is also directed to a process of atom or group transfer radical polymerization for the synthesis of a branched or hyperbranched polymer; in addition, the present invention is directed to a process of atom or group transfer radical polymerization for the synthesis of a ma
    Type: Grant
    Filed: December 8, 1998
    Date of Patent: August 29, 2000
    Assignee: Carnegie-Mellon University
    Inventors: Krzysztof Matyjaszewski, Simion Coca, Scott G. Gaynor, Yoshiki Nakagawa, Seong Mu Jo
  • Patent number: 6080335
    Abstract: A conductive paste for forming via-holes in a ceramic substrate, which paste contains about 80-94 wt. % spherical or granular conductive metal powder having a particle size of about 0.1-50 .mu.m, 1-10 wt. % resin powder which swells in a solvent contained in the conductive paste and has a particle size of about 0.1-40 .mu.m, and about 5-19 wt. % an organic vehicle. The paste hardly generates cracks during firing to thereby attain excellent reliability in electric conduction and which can provide a via-hole or through hole having excellent solderability and platability. A method for producing a ceramic substrate making use of the paste is also disclosed.
    Type: Grant
    Filed: October 28, 1999
    Date of Patent: June 27, 2000
    Assignee: Murata Manufacturing Co., Ltd.
    Inventors: Kazuhito Ohshita, Yoshiki Nakagawa
  • Patent number: 6061105
    Abstract: The present invention provides a liquid crystal display device that can eliminate an electrostatic discharge problem resulting from a high dielectric constant filler that is appropriate for improved shape stability of a sealing material. More particularly, the present invention is directed to sealing material 40 disposed between an array substrate 10 and an opposing substrate 12 contains a resin material and an inorganic dielectric filler. The filler consists of talc, mica or alumina having a dielectric constant higher than that of the resin material, and has plate-like or variable shape. The array substrate 10 includes gate lines 26 and data lines 24 that are separated by an insulating layer 28. The gate lines 26 or the data lines 24 that lie on the surface of the insulating layer 28 on the side of the sealing material 40 (e.g.
    Type: Grant
    Filed: April 16, 1999
    Date of Patent: May 9, 2000
    Assignee: International Business Machines Corporation
    Inventor: Yoshiki Nakagawa
  • Patent number: 5945491
    Abstract: The present invention is directed to a process of atom (or group) transfer radical polymerization for the synthesis of novel homopolymer or a block or graft copolymer, optionally containing at least one polar group, with well defined molecular architecture and narrow polydispersity index, in the presence of an initiating system comprising (i) an initiator having a radically transferrable atom or group, (ii) a transition metal compound, and (iii) a ligand; the present invention is also directed to the synthesis of a macromolecule having at least two halogen groups which can be used as a macroinitiator component (i) to subsequently form a block or graft copolymer by an atom or group transfer radical polymerization process; the present invention is also directed to a process of atom or group transfer radical polymerization for the synthesis of a branched or hyperbranched polymer; in addition, the present invention is directed to a process of atom or group transfer radical polymerization for the synthesis of a ma
    Type: Grant
    Filed: September 30, 1997
    Date of Patent: August 31, 1999
    Assignee: Carnegie-Mellon University
    Inventors: Krzysztof Matyjaszewski, Simion Coca, Scott G. Gaynor, Yoshiki Nakagawa, Seong Mu Jo
  • Patent number: 5852129
    Abstract: A method for producing a hydroxyl-terminated (meth) acrylic polymer which comprises converting a halogen atom in a terminal structure of the general formula (1)--CH.sub.2 --C(R.sup.1)(CO.sub.2 R.sup.2)(X) (1)wherein R.sup.1 is hydrogen or methyl, R.sup.2 is alkyl containing 1 to 20 carbon atoms, aryl containing 6 to 20 carbon atoms or aralkyl containing 7 to 20 carbon atoms, and X is chlorine, bromine or iodine, of a (meth)acrylic polymer obtained by polymerizing a (meth)acrylic monomer using an organic halide or a halogenated sulfonyl compound as an initiator and, as a catalyst, a metal complex with a central metal selected from the elements belonging to the groups 8, 9, 10 and 11 in the periodic table, into a hydroxyl-containing substituent.The present invention can provide, in an easy and simple manner, a (meth)acrylic polymer which is hydroxyl-terminated at both ends in a high proportion and which has been difficult to produce in the prior art. It can give a cured product with good curing characteristics.
    Type: Grant
    Filed: November 28, 1997
    Date of Patent: December 22, 1998
    Assignee: Kaneka Corporation
    Inventors: Masato Kusakabe, Kenichi Kitano, Yoshiki Nakagawa
  • Patent number: 5808127
    Abstract: This invention provides a hydrosilylation method in which hydrosilyl groups are added to olefin using a metal catalyst, which comprises controlling the hydrosilylation reaction by allowing a compound selected from thiazoles and phosphines to coexist in the reaction system, and a process making use thereof for the production of a hydrosilyl group-containing organic curing agent. This invention gives a method for easy control of hydrosilylation reaction and a process making use thereof for the production of an organic compound modifying silicon compound having 2 or more hydrosilyl groups in the molecule. This compound is used as a curing agent of addition type curable compositions. As an accompanying effect, storage stability of the produced curing agent is improved when a catalyst and additives of this invention remain therein, in comparison with the case in which only the catalyst remains.
    Type: Grant
    Filed: May 16, 1997
    Date of Patent: September 15, 1998
    Assignee: Kanegafuchi Kagaku Kogyo Kabushiki Kaisha
    Inventors: Yoshiki Nakagawa, Masato Kusakabe
  • Patent number: 5789487
    Abstract: The present invention is directed to a process of atom (or group) transfer radical polymerization for the synthesis of novel homopolymer or a block or graft copolymer, optionally containing at least one polar group, with well defined molecular architecture and narrow polydispersity index, in the presence of an initiating system comprising (i) an initiator having a radically transferrable atom or group, (ii) a transition metal compound, and (iii) a ligand; the present invention is also directed to the synthesis of a macromolecule having at least two halogen groups which can be used as a macroinitiator component (i) to subsequently form a block or graft copolymer by an atom or group transfer radical polymerization process; the present invention is also directed to a process of atom or group transfer radical polymerization for the synthesis of a branched or hyperbranched polymer; in addition, the present invention is directed to a process of atom or group transfer radical polymerization for the synthesis of a ma
    Type: Grant
    Filed: July 10, 1996
    Date of Patent: August 4, 1998
    Assignee: Carnegie-Mellon University
    Inventors: Krzysztof Matyjaszewski, Simion Coca, Scott G. Gaynor, Yoshiki Nakagawa, Seong Mu Jo
  • Patent number: 5572993
    Abstract: An apparatus for assisting in ventilating the lungs of a patient comprises a respiratory gas source means; a breathing mask means; a conduit means for fluidly connecting the respiratory gas source means to the mask; a means fop regulating the pressure within the conduit means; a flow meter means for detecting the flow rate of the respiratory gas; and a pressure sensor means for detecting the pressure within the conduit adjacent to the breathing mask. The apparatus further comprises a means for calculating the flow impedance parameter of the flow system downstream the pressure sensing means; a means for storing the relationship between the operation of the pressure regulating means, the flow impedance parameter, and the pressure within the conduit means; a means for predicting the flow impedance parameter after a predetermined time interval; and a means for generating a target pressure to which the pressure regulating means regulates the pressure within the conduit.
    Type: Grant
    Filed: July 6, 1995
    Date of Patent: November 12, 1996
    Assignee: Teijin Limited
    Inventors: Kanji Kurome, Atsushi Asahina, Yoshihito Hashimoto, Yoshiki Nakagawa, Harutomo Wakou, Yoshitaka Oku
  • Patent number: 5412105
    Abstract: A thiophene-silole copolymer represented by the formula below and its method of manufacture are disclosed; ##STR1## wherein, R is a monofunctional hydrocarbon group having 1 to 20 carbon atoms or hydrogen, A and B are alkyl groups, aromatic groups, alkenyl groups, or represent an aliphatic group forming a ring wherein A is bonded to B, m and p are integers no less than 1, n is a natural number which can be 0, X is a hydrogen or halogen atom, and Y is a hydrogen atom, halogen atom or thiophene.
    Type: Grant
    Filed: March 16, 1993
    Date of Patent: May 2, 1995
    Assignee: Shin-Etsu Chemical Co., Ltd.
    Inventors: Yoshihiko Ito, Kohei Tamao, Shigehiro Yamaguchi, Yoshiki Nakagawa
  • Patent number: 4585486
    Abstract: A process for placing a cement composition having high strength is provided. The process comprises the steps of adding a viscosity increasing agent, vacuum de-bubbling under reduced pressure and allowing the de-bubbled cement composition to be hardened. At the vacuum de-bubbling step, relatively large foams present in the cement composition are removed and only fine bubbles are left in the composition. The strength of the cement composition is remarkably improved by the removal of large bubbles.
    Type: Grant
    Filed: July 10, 1984
    Date of Patent: April 29, 1986
    Assignee: Hazama-Gumi, Ltd.
    Inventors: Keiichi Fujita, Hiroshi Nakauchi, Tatsuo Kita, Yoshiki Nakagawa, Terunobu Maeda