Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.

Abstract: In one embodiment, a method for manufacturing a tantalum sputtering target includes a first knead forging step, a first heating step, a second knead forging step, a cold rolling step, and a second heating step. In the first knead forging step, a tantalum material is subjected to two sets or more of knead forging, each of the sets being cold forging in directions parallel to and perpendicular to a thickness direction. In the second knead forging step, one set or more of knead forging is performed after the first heating step, each of the steps being cold forging in the directions parallel to and perpendicular to the thickness direction.

Abstract: A flat panel display device, in which a getter layer employed has a region including a striped discontinuous portion in an image display region, and the discontinuous portion is formed by forming the getter layer on an underlayer formed with microstructures on its surface, or the phosphor screen includes a two-dimensional array of pixels each including a red-emitting phosphor element, a green-emitting phosphor element, and a blue-emitting phosphor element that are arrayed at predetermined intervals to form one unit, and the interval of the pixels is larger than the interval of R, G, and B phosphor elements.