Patents by Inventor Yoshiko Inaba

Yoshiko Inaba has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Antimicrobial polymer, contact lens and contact lens-care articles
    Patent number: 5520910
    Abstract: An antimicrobial polymer obtained by homo- or copolymerizing a phosphonium salt type vinyl monomer, such as 2-(methacrylic acid) ethyltri-n-octylphosphonium chloride, and a contact lens and an article for its care mainly comprising an antimicrobial resin obtained by copolymerizing a polymerizable monomer and a phosphonium salt type vinyl monomer are disclosed. The antimicrobial polymer has a broad antimicrobial spectrum and produces a sufficient antimicrobial effect after a short contact time. The contact lens and article for its care are hardly effected by contamination with microorganisms while retaining excellent optical performance and processability.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: May 28, 1996
    Assignees: Nippon Chemical Industrial, Seiko Epson Corporation
    Inventors: Kazukichi Hashimoto, Yoshiko Inaba, Seiji Shimura, Takao Mogami, Tadao Kojima, Yoichi Ushiyama