Patents by Inventor Yoshiko Miya

Yoshiko Miya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20090207286
    Abstract: An object of the present invention is to provide a colored photosensitive composition capable of forming a color filter array having improved spectral characteristics. The colored photosensitive composition comprises a compound represented by the formula (I) or a salt thereof: wherein in the formula (I), Z1 and Z2 represent an oxygen or sulfur atom; R1 to R4 represents a hydrogen atom, a saturated aliphatic hydrocarbon group (which may be substituted with a hydroxyl group), an aryl group, an aralkyl group, or an acyl group; and R5 to R12 represents a hydrogen atom, a halogen atom, a (halogenated) saturated aliphatic hydrocarbon group, an alkoxyl group, a carboxyl group, a sulfo group, or an (N-substituted) sulfamoyl group, and at least one of R5 to R12 is an N-substituted sulfamoyl group.
    Type: Application
    Filed: January 23, 2009
    Publication date: August 20, 2009
    Inventors: Yoshiko Miya, Takuma Fujita, Taichi Natori, Kensaku Maeda
  • Publication number: 20090207287
    Abstract: An object of the present invention is to provide a colored photosensitive composition capable of forming a color filter array having improved spectral characteristics. The colored photosensitive composition comprises a compound represented by the formula (I) or a salt thereof: wherein in the formula (I), R1 to R4 represents a hydrogen atom, a C1-10 saturated aliphatic hydrocarbon group, or a carboxyl group; R5 to R12 represents a hydrogen atom, a halogen atom, a (halogenated) C1-10 saturated aliphatic hydrocarbon group, a C1-8 alkoxyl group, a carboxyl group, a sulfo group, or an (N-substituted) sulfamoyl group; at least one of R5 to R12 is an N-substituted sulfamoyl group; and R13 and R14 represent a hydrogen atom, a cyano group, or an (N-substituted) carbamoyl group.
    Type: Application
    Filed: January 23, 2009
    Publication date: August 20, 2009
    Inventors: Yoshiko Miya, Takuma Fujita, Kensaku Maeda, Taichi Natori
  • Publication number: 20080237554
    Abstract: A colored photosensitive resin composition comprises a compound represented by the formula (I) or a salt thereof: wherein R10, R11, R13 and R14 represent independently of each other a hydrogen atom or an alkyl group; R12 represents a sulfonic acid group, a carboxylic acid group, an ester thereof, or an amide represented by the formula (1) —SO2NHR15 , and ??(1) X? represents BF4?, PF6?, Y? or YO4? (in which Y represents a halogen atom), or a dye having a sulfonic acid group.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 2, 2008
    Inventors: Yoshiko Miya, Kensaku Maeda, Taichi Natori
  • Publication number: 20080237553
    Abstract: A colored photosensitive resin composition comprising an alkali-soluble resin, a photosensitive compound, a curing agent, a solvent and a colorant represented by the formula (I): The colored photosensitive resin composition can form a color filter array which shows good spectral characteristics.
    Type: Application
    Filed: March 28, 2008
    Publication date: October 2, 2008
    Inventors: Yoshiko Miya, Kensaku Maeda, Taichi Natori
  • Publication number: 20070287087
    Abstract: The present invention provides a colored photosensitive resin composition which causes a small change in exposure when a pattern is subjected to projection exposure. Disclosed is a colored photosensitive resin composition comprising a dye, a photo acid generator, a curing agent, an alkali-soluble resin, a solvent, and a compound represented by the formula (I): in the formula (I), R1 to R3 each independently represents a hydrogen atom, a linear alkyl group having 1 to 6 carbon atoms, a branched alkyl group having 3 to 12 carbon atoms, a cycloalkyl group having 3 to 6 carbon atoms or an aryl group having 6 to 12 carbon atoms, and a hydrogen atom on the linear alkyl group having 1 to 6 carbon atoms, a hydrogen atom on the branched alkyl group having 3 to 12 carbon atoms, a hydrogen atom on the cycloalkyl group and a hydrogen atom on the aryl group may be substituted with a hydroxyl group, provided that at least one of R1 to R3 represents a group other than a hydrogen atom.
    Type: Application
    Filed: May 24, 2007
    Publication date: December 13, 2007
    Inventors: Yoshiko Miya, Kensaku Maeda, Masanori Harasawa, Yoichi Ootsuka
  • Patent number: 7129014
    Abstract: The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
    Type: Grant
    Filed: April 2, 2003
    Date of Patent: October 31, 2006
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kouji Toishi, Yoshiko Miya, Yasunori Uetani
  • Patent number: 6893792
    Abstract: The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
    Type: Grant
    Filed: February 14, 2003
    Date of Patent: May 17, 2005
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshiko Miya, Kouji Toishi, Kazuhiko Hashimoto
  • Patent number: 6677102
    Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising; a resin having a polymerization unit derived from a monomer represented by the following formula (I): wherein R1 and R2 independently represent hydrogen or an alkyl group having 1 to 4 carbons, and R3 represents hydrogen or a methyl group, the resin being insoluble in alkali itself but becoming alkali-soluble due to the action of an acid; and an acid generating agent is provided.
    Type: Grant
    Filed: March 11, 2002
    Date of Patent: January 13, 2004
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Yoshiko Miya, Yasunori Uetani, Hiroaki Fujishima
  • Publication number: 20030236351
    Abstract: The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, an acid generator, and multifunctional epoxy compound, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
    Type: Application
    Filed: April 2, 2003
    Publication date: December 25, 2003
    Inventors: Kouji Toishi, Yoshiko Miya, Yasunori Uetani
  • Patent number: 6645693
    Abstract: A resist composition comprising a binder resin and a radiation-sensitive compound. The binder resin is an alkali-soluble resin or becomes alkali-soluble resin by the action of the radiation-sensitive compound after irradiation, and has a polymerization unit represented by the following formula (I): wherein, R1 represents a fluoroalkyl group having 1 to 12 carbon atoms and having at least one fluorine atom, and R2 represents hydrogen atom or an acyl group having 2 to 5 carbon atoms.
    Type: Grant
    Filed: June 27, 2001
    Date of Patent: November 11, 2003
    Assignee: Sumitomo Chemical Company, Limited
    Inventors: Kazuhiko Hashimoto, Yoshiko Miya
  • Publication number: 20030194639
    Abstract: The present invention provides a positive resist composition comprising a resin which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid, and an acid generator, wherein the content of halogen atoms in the resin is 40% by weight or more, at least one of structural units constituting the resin is a structural unit having an alicyclic hydrocarbon skeleton, and the structural unit having an alicyclic hydrocarbon skeleton contains therein at least one group rendering the resin soluble in an alkali aqueous solution by the action of an acid, and at least one halogen atom.
    Type: Application
    Filed: February 14, 2003
    Publication date: October 16, 2003
    Inventors: Yoshiko Miya, Kouji Toishi, Kazuhiko Hashimoto
  • Publication number: 20030175620
    Abstract: The present invention provides a chemical amplification type positive resist composition comprising a resin having structural units of the following general formulae (I) and (II) and insoluble or poorly soluble itself in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid; an acid generating agent; and a multifunctional epoxy compound: 1
    Type: Application
    Filed: December 24, 2002
    Publication date: September 18, 2003
    Inventors: Kouji Toishi, Yoshiko Miya, Yasunori Uetani
  • Patent number: 6579659
    Abstract: A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent.
    Type: Grant
    Filed: April 3, 2001
    Date of Patent: June 17, 2003
    Inventors: Yasunori Uetani, Airi Yamada, Yoshiko Miya, Yoshiyuki Takata
  • Publication number: 20030104312
    Abstract: A chemical amplification type positive resist composition showing a high transmittance at a wavelength of 157 nm and manifesting excellent balance of abilities is provided which comprises a resin having polymerization units of the general formulae (I) and (II) and insoluble or poorly soluble itself in an alkali aqueous solution but becoming soluble in an alkali aqueous solution by the action of an acid; and an acid generating agent: 1
    Type: Application
    Filed: September 26, 2002
    Publication date: June 5, 2003
    Inventors: Yoshiko Miya, Yasunori Uetani, Satoshi Yamaguchi, Isao Yoshida
  • Publication number: 20020168583
    Abstract: A chemical amplifying type positive resist composition, excellent in balance of performance of resolution and sensitivity, having high dry etching resistance and comprising;
    Type: Application
    Filed: March 11, 2002
    Publication date: November 14, 2002
    Inventors: Yoshiko Miya, Yasunori Uetani, Hiroaki Fujishima
  • Publication number: 20020155376
    Abstract: A positive resist composition comprising a binder resin and a radiation-sensitive compound, wherein the binder resin contains a polymerization unit of the following formula (I) and a polymerization unit of the following formula (II) and becomes alkali-soluble by the radiation-sensitive compound after irradiation with radioactive ray: 1
    Type: Application
    Filed: September 6, 2001
    Publication date: October 24, 2002
    Inventors: Kazuhiko Hashimoto, Yasunori Uetani, Yoshiko Miya
  • Publication number: 20020031718
    Abstract: A resist composition comprising a binder resin and a radiation-sensitive compound.
    Type: Application
    Filed: June 27, 2001
    Publication date: March 14, 2002
    Applicant: SUMITOMO CHEMICAL COMPANY, LIMITED
    Inventors: Kazuhiko Hashimoto, Yoshiko Miya
  • Publication number: 20010044070
    Abstract: A chemical amplification type positive resist composition excellent in balance of properties such as resolution, profile, sensitivity, dry etching resistance, adhesion and the like which comprises a resin which has the following polymeric units (A), (B) and (C); and an acid generating agent.
    Type: Application
    Filed: April 3, 2001
    Publication date: November 22, 2001
    Inventors: Yasunori Uetani, Airi Yamada, Yoshiko Miya, Yoshiyuki Takata