Patents by Inventor Yoshimasa Ohshima

Yoshimasa Ohshima has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8559000
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: August 23, 2012
    Date of Patent: October 15, 2013
    Assignees: Hitachi High-Technologies Corporation, Hitachi, Ltd.
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 8508727
    Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
    Type: Grant
    Filed: June 21, 2012
    Date of Patent: August 13, 2013
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Sachio Uto, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Akira Hamamatsu, Takahiro Jingu, Toshihiko Nakata, Masahiro Watanabe
  • Publication number: 20120312104
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: August 23, 2012
    Publication date: December 13, 2012
    Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Publication number: 20120262709
    Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
    Type: Application
    Filed: June 21, 2012
    Publication date: October 18, 2012
    Inventors: Sachio Uto, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Akira Hamamatsu, Takahiro Jingu, Toshihiko Nakata, Masahiro Watanabe
  • Patent number: 8289507
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: May 27, 2011
    Date of Patent: October 16, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Patent number: 8274651
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: September 16, 2011
    Date of Patent: September 25, 2012
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 8269959
    Abstract: The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
    Type: Grant
    Filed: January 10, 2012
    Date of Patent: September 18, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Takahiro Jingu, Sachio Uto
  • Patent number: 8228495
    Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
    Type: Grant
    Filed: August 31, 2011
    Date of Patent: July 24, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Sachio Uto, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Akira Hamamatsu, Takahiro Jingu, Toshihiko Nakata, Masahiro Watanabe
  • Publication number: 20120133929
    Abstract: The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
    Type: Application
    Filed: January 10, 2012
    Publication date: May 31, 2012
    Inventors: Akira HAMAMATSU, Minori NOGUCHI, Hidetoshi NISHIYAMA, Yoshimasa OHSHIMA, Takahiro JINGU, Sachio UTO
  • Publication number: 20120006131
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Application
    Filed: September 16, 2011
    Publication date: January 12, 2012
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Patent number: 8094295
    Abstract: The present invention provides an inspection apparatus and inspection method. The inspection apparatus includes a stage mechanism for supporting an object under inspection. A spatial filter is provided in the detection optical system to inspect the object. A printer is used to print the results of the spatial filter. The spatial filter can be provided in the form of a Fourier transformed image.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: January 10, 2012
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Takahiro Jingu, Sachio Uto
  • Publication number: 20110310382
    Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
    Type: Application
    Filed: August 31, 2011
    Publication date: December 22, 2011
    Inventors: Sachio UTO, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Akira Hamamatsu, Takahiro Jingu, Toshihiko Nakata, Masahiro Watanabe
  • Patent number: 8040503
    Abstract: A method and apparatus of inspecting a sample, in which the sample is inspected under a plurality of inspection conditions, and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions, are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
    Type: Grant
    Filed: January 5, 2010
    Date of Patent: October 18, 2011
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Kenji Oka, Takanori Ninomiya, Maki Tanaka, Kenji Watanabe, Tetsuya Watanabe, Yoshio Morishige
  • Publication number: 20110228258
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Application
    Filed: May 27, 2011
    Publication date: September 22, 2011
    Inventors: Akira HAMAMATSU, Minori NOGUCHI, Yoshimasa OHSHIMA, Sachio UTO, Taketo UENO, Hiroyuki NAKANO, Takahiro JINGU, Hisashi HATANO, Yukihisa MOHARA, Seiji OTANI, Takahiro TOGASHI
  • Patent number: 8013989
    Abstract: An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
    Type: Grant
    Filed: June 25, 2010
    Date of Patent: September 6, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Sachio Uto, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Akira Hamamatsu, Takahiro Jingu, Toshihiko Nakata, Masahiro Watanabe
  • Patent number: 7952700
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: October 19, 2010
    Date of Patent: May 31, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Patent number: 7940383
    Abstract: A method for detecting defects on an object includes an illumination optical unit which obliquely projects a laser focused onto a line on a surface of the object and white-color, a table unit which mounts the specimen and which is movable, a detection optical unit which detects with an image sensor an image of light formed by light reflected from the object and passed through a filter which blocks diffraction light resulting from patterns formed on the object, a signal processor which processes a signal outputted from the image sensor of the detection optical unit to extract defects of the object, and a display unit which displays information of defects extracted by the signal processor. The filter is adjustable.
    Type: Grant
    Filed: December 3, 2009
    Date of Patent: May 10, 2011
    Assignees: Hitachi, Ltd., Hitachi High-Technologies Corporation
    Inventors: Minori Noguchi, Yoshimasa Ohshima, Hidetoshi Nishiyama, Shunichi Matsumoto, Yukio Kembo, Ryouji Matsunaga, Keiji Sakai, Takanori Ninomiya, Tetsuyai Watanabe, Hisato Nakamura, Takahiro Jingu, Yoshio Morishige, Shuichi Chikamatsu
  • Patent number: 7903244
    Abstract: The present invention is an apparatus for inspecting foreign particles/defects, comprises an illumination optical system, a detection optical system, a shielding unit which is provided in said detection optical system to selectively shield diffracted light pattern coming from circuit pattern existing on an inspection object and an arithmetic processing system, wherein said shielding unit comprises a micro-mirror array device or a reflected type liquid crystal, or a transmission type liquid crystal, or an object which is transferred a shielding pattern to an optical transparent substrate, or a substrate or a film which is etched so as to leave shielding patterns, or an optical transparent substrate which can be changed in transmission by heating, sudden cold, or light illumination, or change of electric field or magnetic field, or a shielding plate of cylindrical shape or plate shape.
    Type: Grant
    Filed: September 8, 2009
    Date of Patent: March 8, 2011
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Hidetoshi Nishiyama, Yoshimasa Ohshima, Takahiro Jingu, Sachio Uto
  • Publication number: 20110032515
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Application
    Filed: October 19, 2010
    Publication date: February 10, 2011
    Inventors: Akira HAMAMATSU, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi
  • Patent number: 7817261
    Abstract: A method and apparatus of detecting a defect by inspecting a specimen in which a surface of a specimen on which plural patterns are formed is illuminated with an elongated shape light flux from one of plural directions which are different in elevation angle by switching an optical path of the light flux emitted from an illuminating light source in accordance with a kind of defect to be detected. Plural optical images of the specimen illuminated by the elongated shape light flux are captured with plural image sensors installed in different elevation angle directions by changing an enlarging magnification in accordance with a density of the pattern formed on the sample in an area irradiated with the illuminating elongated shape light flux. A defect on the specimen is detected by processing the images captured by the plural image sensors.
    Type: Grant
    Filed: May 2, 2008
    Date of Patent: October 19, 2010
    Assignee: Hitachi High-Technologies Corporation
    Inventors: Akira Hamamatsu, Minori Noguchi, Yoshimasa Ohshima, Sachio Uto, Taketo Ueno, Hiroyuki Nakano, Takahiro Jingu, Hisashi Hatano, Yukihisa Mohara, Seiji Otani, Takahiro Togashi