Abstract: A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Abstract: A digital-to-analog converter (DAC)/amplifier testing system for use in an electron-beam (e-beam) mask writer, the e-beam mask writer including a plurality of DAC/amplifier circuits to output analog voltage signals, each DAC/amplifier circuit having a first output terminal and a second output terminal, the first output terminals of the plurality of DAC/amplifier circuits being respectively coupled to deflection plates of the e-beam mask writer to provide the output analog voltages as deflection voltages, is provided. The testing system including a summation circuit to sum voltage signals and to output a summation signal indicating the sum of the received analog voltage signals and an analyzer circuit to digitize the summation signal and to detect to compare the digitized summation signal with an error tolerance range to detect whether at least one of the DAC/amplifier circuits is experiencing an operating error.

Abstract: A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.

Abstract: A charged particle beam apparatus includes a plurality of digital-analog (DA) converter units configured to input digital signals, convert the digital signals into analog values, and amplify the analog values to output the analog values, a deflector configured to input at least one analog value of the plurality of analog values output from the plurality of DA converter units to deflect a charged particle beam, and a judging unit configured to judge that at least one of the plurality of DA converter units is abnormal by using the plurality of analog values output from the plurality of DA converter units.

Abstract: A charged particle beam apparatus includes a plurality of digital-analog (DA) converter units configured to input digital signals, convert the digital signals into analog values, and amplify the analog values to output the analog values, a deflector configured to input at least one analog value of the plurality of analog values output from the plurality of DA converter units to deflect a charged particle beam, and a judging unit configured to judge that at least one of the plurality of DA converter units is abnormal by using the plurality of analog values output from the plurality of DA converter units.

Abstract: A deflector for an equipment of electron beam lithography, the deflector including a plurality of control electrodes arranged symmetrically relative to the center axis of an irradiated electron beam, the electrodes configured to control the electron beam by applying voltages respectively, a plurality of molding substrates arranged symmetrically relative to the center axis of the electron beam configured to face outer peripheral surfaces of the plurality of control electrodes and a plurality of earth electrodes arranged respectively at the plurality of molding substrates. The deflector can suppress generation of cross talks with an improved accuracy of controlling an electron beam.