Patents by Inventor Yoshimi HAMANO

Yoshimi HAMANO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • PHOTOSENSITIVE RESIN COMPOSITION, PERMANENT RESIST, METHOD FOR FORMING PERMANENT RESIST, AND METHOD FOR INSPECTING PERMANENT RESIST CURED FILM
    Publication number: 20230324789
    Abstract: An aspect of the present disclosure relates to a method for forming a permanent resist, the method including a step of coating a photosensitive resin composition, which contains a base polymer and a compound having an absorption peak at 360 to 500 nm and emitting light by light irradiation, to a part or the entire surface of a substrate and drying the photosensitive resin composition to form a resin film, a step of exposing at least a part of the resin film, a step of developing the exposed resin film to form a patterned resin film, and a step of heating the patterned resin film.
    Type: Application
    Filed: July 5, 2021
    Publication date: October 12, 2023
    Inventors: Yu AOKI, Yoshimi HAMANO, Teruaki SUZUKI
  • PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERNED CURED FILM, PATTERNED CURED FILM AND SEMICONDUCTOR ELEMENT
    Publication number: 20230236508
    Abstract: The present disclosure relates a photosensitive resin composition containing (A) an alkali-soluble resin having an imide bond and a phenolic hydroxyl group and (B) a compound that generates acid by light, a patterned cured film using the photosensitive resin composition, a method for producing a patterned cured film, and a semiconductor element.
    Type: Application
    Filed: June 21, 2021
    Publication date: July 27, 2023
    Inventors: Yu AOKI, Yoshimi HAMANO, Teruaki SUZUKI, Masahiro HASHIMOTO