Patents by Inventor Yoshimi Kinoshita

Yoshimi Kinoshita has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11969149
    Abstract: An endoscope includes: a lens barrel having an opening of a through hole on an outer surface of the lens barrel; a lens inserted into the through hole and having a distal end surface which is disposed in a protruding manner from the outer surface; a first resin disposed between a wall surface of the through hole and a side surface of the lens; and a second resin disposed on a surface of the first resin, a portion of the lens barrel around the opening and an entire circumference of an outer peripheral portion of the distal end surface of the lens, the second resin containing rubber and light blocking particles and having an elastic modulus smaller than an elastic modulus of the first resin.
    Type: Grant
    Filed: November 30, 2020
    Date of Patent: April 30, 2024
    Assignee: OLYMPUS CORPORATION
    Inventors: Eita Iyoshi, Yoshimi Konno, Hiroaki Kinoshita
  • Patent number: 6593921
    Abstract: With the prior art image-adjusting system for a liquid crystal display, flicker is adjusted by operator's visual examination and so human factors vary the potential-adjusting value applied to the common electrode. The invention provides an image-adjusting system and method free of this problem. The image-adjusting method starts with placing optical sensors opposite to a given location on a liquid crystal display. The output waveform from the optical sensors is observed on an oscilloscope in synchronism with the vertical synchronizing signal that is synchronized to odd frames or even frames. The potential applied to the common electrode of the liquid crystal display is shifted upward from the optimum potential to observe a first waveform. The potential on the common electrode is shifted downward from the optimum potential to observe a second waveform.
    Type: Grant
    Filed: January 16, 2001
    Date of Patent: July 15, 2003
    Assignees: Kabushiki Kaisha Advanced Display, Mitsubishi Denki Kabushiki Kaisha
    Inventors: Kunifumi Nakanishi, Shuji Nishizaki, Akitoshi Miyaoka, Yoshimi Kinoshita, Yoshikazu Ikuta
  • Patent number: 6461465
    Abstract: An apparatus for manufacturing a liquid crystal panel in which two substrates are faced to each other with spacers interposed therebetween, applied with heat pressure in an overlapped condition, and adhesive arranged between the two substrates is cured for fixing, characterized in that at least of a pair of pressurizing plates for applying pressure to the two substrates is a graphite plate and in that upper and lower pressurizing plates are made to be of different rigidity. The graphite plate of low rigidity is made to stick to the substrate, and shifts between substrate can be prevented while securing uniformity in gap between substrates.
    Type: Grant
    Filed: January 23, 2001
    Date of Patent: October 8, 2002
    Assignees: Advanced Display Inc., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masahiko Tada, Kohei Adachi, Hiroki Toyoshima, Susumu Kono, Kazuo Yoshida, Yoshihiro Kashiba, Yoshimi Kinoshita
  • Publication number: 20010018948
    Abstract: An apparatus for manufacturing a liquid crystal panel in which two substrates are faced to each other with spacers interposed therebetween, applied with heat and pressure in an overlapped condition, and adhesive arranged between the two substrates is cured for fixing, characterized in that at least one of a pair of pressurizing plates for applying pressure to the two substrates is a graphite plate and in that upper and lower pressurizing plates are made to be of different rigidity. The graphite plate of low rigidity is made to stick to the substrate, and shifts between substrates can be prevented while securing uniformity in gaps between substrates.
    Type: Application
    Filed: January 23, 2001
    Publication date: September 6, 2001
    Applicant: ADVANCED DISPLAY INC.
    Inventors: Masahiko Tada, Kohei Adachi, Hiroki Toyoshima, Susumu Kono, Kazuo Yoshida, Yoshihiro Kashiba, Yoshimi Kinoshita
  • Publication number: 20010015725
    Abstract: With the prior art image-adjusting system for a liquid crystal display, flicker is adjusted by operator's visual examination and so human factors vary the potential-adjusting value applied to the common electrode. The invention provides an image-adjusting system and method free of this problem. The image-adjusting method starts with placing optical sensors opposite to a given location on a liquid crystal display. The output waveform from the optical sensors is observed on an oscilloscope in synchronism with the vertical synchronizing signal that is synchronized to odd frames or even frames. The potential applied to the common electrode of the liquid crystal display is shifted upward from the optimum potential to observe a first waveform. The potential on the common electrode is shifted downward from the optimum potential to observe a second waveform.
    Type: Application
    Filed: January 16, 2001
    Publication date: August 23, 2001
    Inventors: Kunifumi Nakanishi, Shuji Nishizaki, Akitoshi Miyaoka, Yoshimi Kinoshita, Yoshikazu Ikuta
  • Patent number: 6266123
    Abstract: A liquid crystal display device comprising a liquid crystal display panel and a light guide plate arranged in a rear side of the liquid crystal display panel. The liquid crystal display panel is of a substantially spherical shape, and the liquid crystal display panel is fitted at a front side of the light guide plate such that a proximity of a central portion of the liquid crystal display panel is outwardly bulged. There can be prevented display deficiencies (paddling) owing to interference between the liquid crystal display panel and the backlighting unit or between the former and the casing. Moreover, since no interference exists between the liquid crystal display panel and the backlighting unit or between the former and the casing, sheets such as the diffusing sheet will not be wrinkled, and the brightness of the backlighting unit can be maintained to be uniform.
    Type: Grant
    Filed: June 23, 1999
    Date of Patent: July 24, 2001
    Assignees: Advanced Display Inc., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Taro Maejima, Isao Sakata, Ikuo Ogo, Kazuo Yoshida, Yoshimi Kinoshita
  • Patent number: 6190488
    Abstract: An apparatus for manufacturing a liquid crystal panel in which two substrates are faced to each other with spacers interposed therebetween, applied with heat and pressure in an overlapped condition, and adhesive arranged between two substrates is cured for fixing, characterized in that at least one of a pair of pressurizing plates for applying pressure to the two substrates is a graphite plate and in that upper and lower pressurizing plates are made to be of different rigidity. The graphite plate of low rigidity is made to stick to the substrate, and shifts between substrates can be prevented while securing uniformity in gaps between substrates.
    Type: Grant
    Filed: April 29, 1999
    Date of Patent: February 20, 2001
    Assignees: Advanced Display Inc., Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masahiko Tada, Kohei Adachi, Hiroki Toyoshima, Susumu Kono, Kazuo Yoshida, Yoshihiro Kashiba, Yoshimi Kinoshita
  • Patent number: 5976260
    Abstract: It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer (1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.
    Type: Grant
    Filed: March 7, 1996
    Date of Patent: November 2, 1999
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi, Kenichiro Yamanishi, Shigeo Sasaki, Hideki Komori, Taizo Eshima, Kouichirou Tsutahara, Toshihiko Noguchi, Toru Takahama, Yoshihiko Kusakabe, Takeshi Iwamoto, Nobuyuki Kosaka
  • Patent number: 5534073
    Abstract: It is an object of the present invention to obtain a vacuum chucking which can vacuum suck a wafer even if dusts attach thereon. The main body of vacuum chuck (101) has a plurality of block grooves (125) on the surface on which the wafer (1) is sucked and fixed, in which vacuum evacuation paths (105) each for vacuum evacuating each block groove (125) are provided for each block groove (125). When the wafer(1) is sucked and fixed under low pressure, even if the degree of vacuum in one of the block grooves (125) decreases due to attachment of dusts on part of the suction surface, or the like, the wafer (1) can surely be sucked and held.
    Type: Grant
    Filed: September 7, 1993
    Date of Patent: July 9, 1996
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yoshimi Kinoshita, Tomoyuki Kanda, Katsuhisa Kitano, Kazuo Yoshida, Hiroshi Ohnishi, Kenichiro Yamanishi, Shigeo Sasaki, Hideki Komori, Taizo Eshima, Kouichirou Tsutahara, Toshihiko Noguchi, Toru Takahama, Yoshihiko Kusakabe, Takeshi Iwamoto, Nobuyuki Kosaka
  • Patent number: 5393255
    Abstract: An inspection method and an inspection apparatus for the component members of the cathode-ray tube are disclosed. An inspection apparatus composed of normal members other than an object of inspection is prepared at the time of inspecting the phosphor screen of the screen panel, the electron gun or the shadow-mask constituting the cathode-ray tube. In advanced to assembling the cathode-ray tube, the object of inspection is mounted on the inspection apparatus, so that the conformance or rejection of the object of inspection is decided from the illuminated condition of the phosphor screen by irradiating electron beams thereon.
    Type: Grant
    Filed: February 28, 1994
    Date of Patent: February 28, 1995
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Yasushi Hisaoka, Yoshio Yamane, Hidenobu Murakami, Yoshimi Kinoshita, Hiroaki Tobuse, Kazuo Yoshida, Takashi Ishii, Hiroshi Koizumi
  • Patent number: 5252132
    Abstract: A semiconductor film production apparatus includes a reaction vessel for containing a substrate and including a gas supply port for supplying a reaction gas to the vessel, a gas discharge port for discharging the reaction gas from the vessel after reaction, and a light-transmitting glass window; a light source disposed outside the reaction vessel for irradiating a substrate in the reaction vessel through the light-transmitting glass window to heat the substrate; a cylindrical substrate holder disposed in the reaction vessel for holding the substrate with a first surface facing the light source and a second surface, opposed to the first surface, exposed to the reaction gas; a ring plate having a central opening with an area smaller than the substrate and an outside diameter dividing the reaction vessel into two compartments, the ring plate contacting the first surface of the substrate; a carrier gas supply port for introducing a carrier gas between the substrate and the light-transmitting glass window; and a r
    Type: Grant
    Filed: November 22, 1991
    Date of Patent: October 12, 1993
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Yoshiyuki Goto, Toyomi Osige, Tatsuya Iwasa, Yoshimi Kinoshita, Katsuhisa Kitano, Kazuo Yoshida
  • Patent number: 5024182
    Abstract: An apparatus for forming a thin film on a substrate by bringing a first gas and a second gas into reaction with each other in a reaction chamber near the surface of the substrate in the reaction chamber. The apparatus has a plasma generating chamber disposed adjacent to the reaction chamber for generating a plasma of the first gas in a predetermined direction. A first gas inlet is provided at the boundary between the plasma generating chamber and the reaction chamber and formed to extend in the predetermined direction, while a second gas inlet is provided in the vicinity of the first gas inlet and extended in the predetermined direction.
    Type: Grant
    Filed: July 6, 1989
    Date of Patent: June 18, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Toshiyuki Kobayashi, Masao Koshinaka, Yoshimi Kinoshita, Masao Oda, Kenji Yoshizawa
  • Patent number: 5010842
    Abstract: Apparatus for forming a thin film on a substrate surface by a CVD (Chemical Vapor Deposition) method which includes diffusing pipes for diffusing and supplying a first reactive gas, and uniformizing plates for supplying uniformly an active species formed through excitation of a second reactive gas. The first reactive gas and the active species are mixed uniformly with each other, and the resultant uniform mixture is supplied uniformly to the substrate surface, whereby a uniform film deposition rate is obtained in a reaction zone in which the thin film is formed, and a uniform thin film is formed over the entire substrate surface even when the area of the substrate surface is large.
    Type: Grant
    Filed: June 7, 1989
    Date of Patent: April 30, 1991
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Yoshimi Kinoshita, Masahiro Hayama
  • Patent number: 4919077
    Abstract: A semiconductor producing apparatus for use in photochemical vapor deposition for forming various types of film on a substrate at a low temperature as a first reaction gas excited and decomposed by a laser beam and a second reaction gas converted into a plasma state by a plasma generator react with each other in a reaction chamber in which a substrate is mounted. Two kinds of electrodes are provided in upper and lower positions in the reaction chamber opposing each other. The upper electrode is connected to a high-frequency power source and the lower electrode is used as a common electrode on which the substrate is mounted to control film forming speed, while an ultraviolet light source for irradiating the interior of the reaction chamber with ultraviolet rays is provided to obtain a dense film.
    Type: Grant
    Filed: August 23, 1988
    Date of Patent: April 24, 1990
    Assignee: Mitsubishi Denki Kabushiki Kaisha
    Inventors: Masao Oda, Toshiyuki Kobayashi, Yoshimi Kinoshita