Patents by Inventor Yoshinari Kato

Yoshinari Kato has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 12103132
    Abstract: To detect whether barrel lids are fixed. A centrifugal barrel polishing machine (A) includes: a plurality of rotary tanks (50) that rotate planetarily; barrel lids (26) that are attachable to and detachable from the rotary tanks (50); and a plurality of clamp shafts (32) that are provided individually in the plurality of rotary tanks (50) so as to be rotatable integrally with the rotary tanks (50). Each of the clamp shafts (32) is displaceable between in a fixing form for fixing the barrel lid (26) to the rotary tank (50) and in a releasing form for releasing the fixation of the barrel lid (26). It is detected by a first detection means (40) whether the rotary tank (50) is positioned in a detection area (D) on a revolution path of the rotary tank (50), and it is detected by a second detection means (43) whether the clamp shaft (32) of the rotary tank (50) positioned in the detection area (D) is displaced to the fixing form.
    Type: Grant
    Filed: June 4, 2019
    Date of Patent: October 1, 2024
    Assignee: TIPTON CORP.
    Inventors: Yoshiyuki Kato, Yoshinari Sawada
  • Patent number: 12080612
    Abstract: A semiconductor device includes: an insulated circuit substrate; a power semiconductor element mounted on the insulated circuit substrate; a first terminal having a plate-like shape having a first main surface and electrically connected to the power semiconductor element; a second terminal having a second main surface opposed to the first main surface of the first terminal and electrically connected to the power semiconductor element; an insulating sheet interposed between the first main surface and the second main surface; and a conductive film provided on at least one of the first main surface side and the second main surface side of the insulating sheet.
    Type: Grant
    Filed: August 24, 2022
    Date of Patent: September 3, 2024
    Assignee: FUJI ELECTRIC CO., LTD.
    Inventors: Katsumi Taniguchi, Yoshinari Ikeda, Ryoichi Kato, Yuma Murata, Akito Nakagome
  • Patent number: 12072155
    Abstract: A cooling device includes a body having a flow passage for a heating medium that passes through the body, a first header made of a resin that has an inlet and covers a first end, and a second header made of a resin that has an outlet and covers a second end. The body has a front face, a back face, a first side face, and a second side face. The body and the first header are bonded to a first bonding face, a second bonding face, a third bonding face, and a fourth bonding face. The third bonding face is a curved surface that protrudes toward a +Y side. The fourth bonding face is a curved surface that protrudes toward a ?Y side.
    Type: Grant
    Filed: September 10, 2021
    Date of Patent: August 27, 2024
    Assignees: NIPPON LIGHT METAL COMPANY, LTD., FUJI ELECTRIC CO., LTD., KOJIN CO., LTD.
    Inventors: Akihito Aoki, Eiji Anzai, Yoshinari Ikeda, Hiromichi Gohara, Ryoichi Kato, Michihiro Inaba, Tetsuya Sunago
  • Publication number: 20160052819
    Abstract: The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 ?m, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 ?m, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point +200° C.) to the (annealing point +50° C.) is controlled to the range of from 300 to 2,500° C./min.
    Type: Application
    Filed: October 9, 2015
    Publication date: February 25, 2016
    Inventors: Takahiro KAWAGUCHI, Katsutoshi FUJIWARA, Yoshinari KATO, Hisatoshi AIBA
  • Patent number: 9199869
    Abstract: The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 ?m, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 ?m, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point+200° C.) to the (annealing point+50° C.) is controlled to the range of from 300 to 2,500° C./min.
    Type: Grant
    Filed: March 22, 2011
    Date of Patent: December 1, 2015
    Assignee: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Takahiro Kawaguchi, Katsutoshi Fujiwara, Yoshinari Kato, Hisatoshi Aiba
  • Patent number: 9061933
    Abstract: Provided is a method of producing a tempered glass sheet, comprising applying tempering treatment to a glass sheet by increasing the content of SiO2 in terms of mass in a surface region of a glass sheet through application of thermal treatment to the glass sheet to 1.03 or more times that in an interior region positioned at a depth of 1 ?m from a surface of the glass sheet.
    Type: Grant
    Filed: August 21, 2012
    Date of Patent: June 23, 2015
    Assignee: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Hiroshi Komori, Masahiro Tomamoto, Yoshinari Kato
  • Publication number: 20150166405
    Abstract: A manufacturing method for a tempered glass substrate of the present invention includes: melting glass raw materials to obtain molten glass; forming the molten glass into a sheet shape to obtain a glass substrate having a long side dimension of 1,000 mm or more and a short side dimension of 500 mm or more; and performing ion exchange treatment in a state in which the glass substrate is tilted to form a compressive stress layer in a surface of the glass substrate.
    Type: Application
    Filed: February 2, 2015
    Publication date: June 18, 2015
    Inventors: Takashi MURATA, Yoshinari KATO
  • Patent number: 8419421
    Abstract: An injection flame burner in which temperature of the generated flame itself can be sustained around the flame. A plurality of double structure injection nozzles each consisting of an outer tube and an inner tube provided coaxially with the outer tube, are arranged such that hydrogen gas is ejected from one of the outer tubes and the inner tubes and oxygen gas is ejected from the other tubes, and the injection port of each injection nozzle is located on the injection surface. Each injection nozzle includes at least one main injection nozzle having an inner tube formed to spread toward the injection surface side, and another sub-injection nozzle arranged around the main injection nozzle, wherein gas is injected from the inner tube of the main injection nozzle under a higher pressure state as compared with gas injected from the sub-injection nozzle.
    Type: Grant
    Filed: December 13, 2006
    Date of Patent: April 16, 2013
    Inventors: Osamu Hirota, Yoshinari Kato, Toshihiko Ando
  • Publication number: 20130071666
    Abstract: Provided is a method of producing a tempered glass sheet, comprising applying tempering treatment to a glass sheet by increasing the content of SiO2 in terms of mass in a surface region of a glass sheet through application of thermal treatment to the glass sheet to 1.03 or more times that in an interior region positioned at a depth of 1 ?m from a surface of the glass sheet.
    Type: Application
    Filed: August 21, 2012
    Publication date: March 21, 2013
    Inventors: Hiroshi KOMORI, Masahiro Tomamoto, Yoshinari Kato
  • Publication number: 20130017366
    Abstract: The present invention is aimed to provide a method for producing a glass substrate with a thickness of not more than 200 ?m, which is satisfied with the quality required for a substrate on which a thin-film electric circuit is formed, and a sheet glass substrate obtained according to this method. The present invention is concerned with a method for producing a glass substrate having a sheet thickness of from 10 to 200 ?m, including a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, wherein an average cooling rate in a temperature range of from the (annealing point+200° C.) to the (annealing point+50° C.) is controlled to the range of from 300 to 2,500° C./min.
    Type: Application
    Filed: March 22, 2011
    Publication date: January 17, 2013
    Applicant: Nippon Electric Glass Co., Ltd.
    Inventors: Takahiro Kawaguchi, Katsutoshi Fujiwara, Yoshinari Kato, Hisatoshi Aiba
  • Patent number: 8281618
    Abstract: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.
    Type: Grant
    Filed: December 15, 2006
    Date of Patent: October 9, 2012
    Assignee: Nippon Electric Glass Co., Ltd.
    Inventors: Yoshinari Kato, Tatsuya Takaya
  • Publication number: 20120178613
    Abstract: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.
    Type: Application
    Filed: February 22, 2012
    Publication date: July 12, 2012
    Applicant: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Yoshinari KATO, Tatsuya Takaya
  • Patent number: 8136371
    Abstract: Provided are a process for producing a glass substrate usable for low-temperature p-SiTFT substrates directly in accordance with a down draw method, and the glass substrate obtained by the process. The process for producing a glass substrate includes a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, in which, in the annealing step, an average cooling rate from the annealing point to the (annealing point ?50° C.) is lower than an average cooling rate from the (annealing point +100° C.) to the annealing point.
    Type: Grant
    Filed: January 29, 2009
    Date of Patent: March 20, 2012
    Assignee: Nippon Electric Glass Co., Ltd.
    Inventors: Yoshinari Kato, Eiji Matsuki
  • Publication number: 20110177287
    Abstract: Provided are a process for producing a glass substrate usable for low-temperature p-SiTFT substrates directly in accordance with a down draw method, and the glass substrate obtained by the process. The process for producing a glass substrate includes a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, in which, in the annealing step, an average cooling rate from the annealing point to the (annealing point?50° C.) is lower than an average cooling rate from the (annealing point+100° C.) to the annealing point.
    Type: Application
    Filed: March 30, 2011
    Publication date: July 21, 2011
    Applicant: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Yoshinari KATO, Eiji Matsuki
  • Publication number: 20100154789
    Abstract: An injection flame burner in which temperature of the generated flame itself can be sustained around the flame. A plurality of double structure injection nozzles each consisting of an outer tube and an inner tube provided coaxially with the outer tube, are arranged such that hydrogen gas is ejected from one of the outer tubes and the inner tubes and oxygen gas is ejected from the other tubes, and the injection port of each injection nozzle is located on the injection surface. Each injection nozzle includes at least one main injection nozzle having an inner tube formed to spread toward the injection surface side, another sub-injection nozzle arranged around the main injection nozzle, wherein gas is injected from the inner tube of the main injection nozzle under a higher pressure state as compared with gas injected from the sub-injection nozzle.
    Type: Application
    Filed: December 13, 2006
    Publication date: June 24, 2010
    Applicant: OSAMU HIROTA
    Inventors: Osamu Hirota, Yoshinari Kato, Toshihiko Ando
  • Publication number: 20090226733
    Abstract: Provided are a process for producing a glass substrate usable for low-temperature p-SiTFT substrates directly in accordance with a down draw method, and the glass substrate obtained by the process. The process for producing a glass substrate includes a forming step of forming a molten glass into a ribbon shape in accordance with a down draw method, an annealing step of annealing the glass ribbon, and a cutting step of cutting the glass ribbon to give a glass substrate, in which, in the annealing step, an average cooling rate from the annealing point to the (annealing point ?50° C.) is lower than an average cooling rate from the (annealing point +100° C.) to the annealing point.
    Type: Application
    Filed: January 29, 2009
    Publication date: September 10, 2009
    Applicant: NIPPON ELECTRIC GLASS CO.,LTD.
    Inventors: Yoshinari KATO, Eiji MATSUKI
  • Publication number: 20090170684
    Abstract: The invention provides an alkali-free glass substrate small in the variation of the thermal shrinkage and a process for producing the same. An alkali-free glass substrate of the invention has an absolute value of a thermal shrinkage of 50 ppm or more when the alkali-free glass substrate is heated at a rate of 10° C./min from a room temperature, kept at a holding temperature of 450° C. for 10 hr and then cooled at a rate of 10° C./min.
    Type: Application
    Filed: December 15, 2006
    Publication date: July 2, 2009
    Applicant: NIPPON ELECTRIC GLASS CO., LTD.
    Inventors: Yoshinari Kato, Tatsuya Takaya
  • Patent number: 7172695
    Abstract: A liquid treating apparatus includes a treating tank having at least two walls formed with a liquid inlet and a liquid outlet through each of which a liquid to be treated flows, respectively, and a filtering layer unit including an antibacterial filtering layer, an adsorptive filtering layer and a filtering layer, the filtering layer unit being disposed between the liquid inlet and outlet.
    Type: Grant
    Filed: March 19, 2004
    Date of Patent: February 6, 2007
    Assignee: Akechi Ceramics Kabushiki Kaisha
    Inventors: Yoshinari Kato, Satoshi Kameshima, Mitsuro Hyakumachi, Yoshihiro Taguchi, Hideki Watanabe, Hayato Horinouchi
  • Patent number: 7060656
    Abstract: An antibacterial rockwool growth medium for hydroponics is used for hydroponic growth of rice, flowers and ornamental plants, fruitage, etc. The medium includes a rockwool base used as a culture medium for hydroponics, and an inorganic antibacterial agent is dispersed substantially uniformly onto an overall surface of the rockwool base or a part of the surface of the rockwool base.
    Type: Grant
    Filed: December 17, 2003
    Date of Patent: June 13, 2006
    Assignee: Akechi Ceramics Kabushiki Kaisha
    Inventors: Yoshinari Kato, Satoshi Kameshima
  • Publication number: 20040188338
    Abstract: A liquid treating apparatus includes a treating tank having at least two walls formed with a liquid inlet and a liquid outlet through each of which a liquid to be treated flows, respectively, and a filtering layer unit including an antibacterial filtering layer, an adsorptive filtering layer and a filtering layer, the filtering layer unit being disposed between the liquid inlet and outlet.
    Type: Application
    Filed: March 19, 2004
    Publication date: September 30, 2004
    Applicant: Akechi Ceramics Kabushiki Kaisha
    Inventors: Yoshinari Kato, Satoshi Kameshima, Mitsuro Hyakumachi, Yoshihiro Taguchi, Hideki Watanabe, Hayato Horinouchi