Abstract: A heating device includes: a base containing ceramics, in which a resistance heating body is embedded; gas flow passages formed in an inside of the base; and adjustment members which vary flow rates of gas in the gas flow passages.

Abstract: A heating device comprises a substrate having a heating surface, a heating element buried in the substrate, a cylindrical member joined to the substrate, and lead wires for supplying current to the heating element. In addition, the thermal conductivity of the substrate is about 1.0 to about 2.0 times the thermal conductivity of the cylindrical member.

Abstract: A member provided around a susceptor for mounting a semiconductor in a chamber of a semiconductor production system. The member has a face opposing the susceptor and a center line average surface roughness of the face opposing the susceptor is 0.5 ?m or less. Alternatively, the face opposing the susceptor has a thermal emissivity ? of 0.5 or lower. The member can also be a liner [4] having a supported face [4] whose area is not more than 20 percent of that of the face [4] opposing the susceptor.

Abstract: The power-supplying member comprises: a first rod-shaped member connected to power-supplied object; a second rod-shaped member connected to power supply; and a thermal-function member, which is disposed between the first rod-shaped member and the second rod-shaped member, and which has a smaller axial cross section area and a larger surface area as compared to the first and second rod-shaped members.

Abstract: An object of the present invention is to provide a heating system having a ceramic heater and a supporting member supporting the back face of the heater, so that the cost of the supporting member can be reduced, the design change of the heater is made easier and excellent flatness of the heating face on use can be maintained. The heating system has a ceramic substrate 1 having a heating face 1a and a back face 1b, a heating means 4 for generating heat from the heating face 1a of the substrate 1, a metal supporting member 6 supporting the back face 1b of the substrate 1, and a heat insulating plate 5 provided between the back face 1b of the substrate 1 and the supporting member 6.

Abstract: A power-supplying member comprises: a first rod-shaped member connected to power-supplied object; a second rod-shaped member connected to power supply; and a thermal-expansion absorbing member, which is disposed between the first rod-shaped member and the second rod-shaped member, and which shrinks in a longitudinal direction in response to changes in shape of the first rod-shaped member and the second rod-shaped member in the longitudinal direction due to thermal expansion.

Abstract: A heater is provided, including an insulating substrate and a heating resistance, wherein the temperature on the heating face is easily controlled without providing a separate temperature controlling member. The heating resistance includes at least one parallel-connected portion which includes a plurality of heat generating parts connected in parallel. At least one of the heat generating portions has a resistance adjusting means.

Abstract: An object of the present invention is to provide a heating system having a ceramic heater and a supporting member supporting the back face of the heater, so that the cost of the supporting member can be reduced, the design change of the heater is made easier and excellent flatness of the heating face on use can be maintained. The heating system has a ceramic substrate 1 having a heating face 1a and a back face 1b, a heating means 4 for generating heat from the heating face 1a of the substrate 1, a metal supporting member 6 supporting The back face 1b of the substrate 1, and a heat insulating plate 5 provided between the back face 1b of the substrate 1 and the supporting member 6.

Abstract: A ceramic heater includes a ceramic substrate having a heating face, a resista nce heating element embedded in the substrate and a terminal electrically connected with the resistance heating element. The resistance heating element includes first and second coiled windings. The first winding has a coil diameter that is larger than the coil diameter of the second winding. A non-wound wire may also be used instead of the second winding.

Abstract: A heating system 1 has a ceramic substrate 2 having a mounting face 2a for mounting an object W, a back face 2b and a side face 2c; a heating means 3 for generating heat from the mounting face 2a of the ceramic substrate 2; and a plate-shaped supporting metal member 4 for supporting the back face 2b of the ceramic substrate 2. According to the system, the thermal deformation of the mounting face upon heating over time may be reduced and the flatness of the object may be maintained at a low value. It is further possible to impart a mechanical strength to the heater sufficient for its handling and to reduce the production cost.

Abstract: A support structure for supporting a ceramic susceptor in a chamber is provided. The support structure includes a supporting portion joined with a back face of the ceramic susceptor. The supporting portion includes an inner space that is separated from the atmosphere of the chamber. A cooling system is provided below the supporting portion 6. At least one thermal control portion is provided between the cooling system and the supporting portion for reducing thermal conduction from the susceptor to the cooling system.

Abstract: A supporting structure is provided, including a ceramic susceptor to be heated and having a mounting face and a back face. A ceramic supporting member is joined with the back face of the susceptor. The ceramic supporting member has an outer wall surface, a joining face joined with the susceptor and an end face opposing the joining face. A curved part is formed between the outer wall surface and back face, and has a radius of curvature R in a range of 4 mm to 25 mm in the longitudinal direction of the ceramic supporting member.

Abstract: A susceptor supporting construction has a susceptor for heating a member to be processed and a supporting member, in which an inner space is arranged, connected to the susceptor. A chamber having an opening is connected to the supporting member, the opening of the chamber is communicated with the inner space of the supporting member, and the inner space of the supporting member is sealed in an airtight manner with respect to an inner space of the chamber. The supporting member further has a tubular main portion, a diameter extending portion arranged at an end portion thereof to which the susceptor is faced, and one or more continuous round portions arranged between the main portion and the diameter extending portion, when viewed by an outer profile of a longitudinal section of the supporting member.

Abstract: A substrate heating apparatus, comprises a base group including a plurality of bases, which are arranged into substantially a plate with a gap interposed between the bases and form a substrate mounting surface, and a resistance heating element provided for at least one of the bases.

Abstract: A supporting structure of a ceramic susceptor is provided, including a ceramic susceptor to be heated having a mounting face and a back face, and a ceramic supporting member joined with the back face of the susceptor. The supporting member has an outer wall surface, and a continuous and integral curved part formed between the outer wall surface and the back face of the susceptor. The curved part has a radius of curvature “R” in a range of 4 mm to 25 mm in the longitudinal direction of the supporting member, and a minimum wall thickness “t” in a range of 1 mm to 15 mm.

Abstract: A substrate heating device comprises a ceramic base plate having a heating surface on which a substrate is placed, resistance heating elements buried in the ceramic base plate for respective zones into which the heating surface is divided, terminals connected to the resistance heating elements respectively, and lead wires connected to the terminals respectively and wired on an outer surface of the ceramic base plate other than the heating surface.

Abstract: A manufacturing method for a substrate heating device comprises forming a base plate having a substrate heating surface in which a resistance heating element is buried, forming a tubular member, joining the tubular member to the base plate, measuring temperature distribution in the substrate heating surface by supplying power to the resistance heating element, and grinding the tubular member according to a grinding condition based on a measurement result of the temperature distribution.

Abstract: A heating device comprises a substrate having a heating surface, a heating element buried in the substrate, a cylindrical member joined to the substrate, and lead wires for supplying current to the heating element. In addition, the thermal conductivity of the substrate is about 1.0 to about 2.0 times the thermal conductivity of the cylindrical member.

Abstract: A heating resistance 1 comprises a shaped body of a band made of a conductive material obtained by bending the band in a shape of a wave. The heating resistance 1 is fixed to a substrate made of an insulating material to obtain a heater. Alternatively, the heating resistance comprises a wound body of a band made of a conductive material. According to the present invention, the heating value per a unit length can be easily designed and changed, and the reliability can be improved and abnormal heat generation can be prevented at the interface where the heating value per a unit length is changed.

Abstract: A wafer heating system 1 has a substrate portion 2a having a mounting face 2c for mounting and heating a wafer “W” and a side wall portion 2b surrounding the side edge of the wafer “W”. The height “D” of the side wall portion 2b from the mounting face 2c is not smaller than the thickness “C” of the wafer “W”.