Patents by Inventor Yoshinobu Kadowaki
Yoshinobu Kadowaki has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10787597Abstract: A working fluid for heat cycle, wherein the global warming potential is less than 300; the product of the relative coefficient of performance and the relative refrigerating capacity is at least 0.820 relative to R410A in a standard refrigerating cycle under conditions of an evaporation temperature of 0° C., a condensing temperature of 40° C., a supercoiling degree of 5° C. and a degree of superheat of 5° C.; the relative compressor discharge gas pressure is at most 1.100; the lower limit of the combustion range by method A in High Pressure Gas Safety Act is at least 5 vol %; and the pressure will not exceed 2.00 MPaG in a combustion test by method A in High Pressure Gas Safety act under 0.98 MPaG at 250° C.Type: GrantFiled: October 5, 2018Date of Patent: September 29, 2020Assignee: AGC Inc.Inventors: Masato Fukushima, Hiroaki Mitsuoka, Mai Tasaka, Satoshi Kawaguchi, Katsuya Ueno, Toshiyuki Tanaka, Hidekazu Okamoto, Tetsuo Otsuka, Yoshinobu Kadowaki, Tatsuhiro Nogami, Daisuke Shirakawa, Hirokazu Takagi, Takeaki Arai
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Publication number: 20190031934Abstract: A working fluid for heat cycle, wherein the global warming potential is less than 300; the product of the relative coefficient of performance and the relative refrigerating capacity is at least 0.820 relative to R410A in a standard refrigerating cycle under conditions of an evaporation temperature of 0° C., a condensing temperature of 40° C., a supercoiling degree of 5° C. and a degree of superheat of 5° C.; the relative compressor discharge gas pressure is at most 1.100; the lower limit of the combustion range by method A in High Pressure Gas Safety Act is at least 5 vol %; and the pressure will not exceed 2.00 MPaG in a combustion test by method A in High Pressure Gas Safety act under 0.98 MPaG at 250° C.Type: ApplicationFiled: October 5, 2018Publication date: January 31, 2019Applicant: AGC Inc.Inventors: Masato FUKUSHIMA, Hiroaki MITSUOKA, Mai TASAKA, Satoshi KAWAGUCHI, Katsuya UENO, Toshiyuki TANAKA, Hidekazu OKAMOTO, Tetsuo OTSUKA, Yoshinobu KADOWAKI, Tatsuhiro NOGAMI, Daisuke SHIRAKAWA, Hirokazu TAKAGI, Takeaki ARAI
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Patent number: 10144856Abstract: A working fluid for heat cycle contains trifluoroethylene and 2,3,3,3-tetrafluoropropene. The proportion of the total amount of trifluoroethylene and 2,3,3,3-tetrafluoropropene based on the entire amount of the working fluid is higher than 90 mass % and at most 100 mass %. The proportion of trifluoroethylene based on the total amount of trifluoroethylene and 2,3,3,3-tetrafluoropropene is at least 21 mass % and at most 39 mass %. The working fluid has a low global warming potential and suppressed self-decomposition property. A composition for a heat cycle system contains the working fluid and a heat cycle system employs the composition.Type: GrantFiled: August 31, 2016Date of Patent: December 4, 2018Assignee: AGC Inc.Inventors: Masato Fukushima, Satoshi Kawaguchi, Katsuya Ueno, Toshiyuki Tanaka, Hidekazu Okamoto, Tetsuo Otsuka, Yoshinobu Kadowaki, Tatsuhiro Nogami
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Patent number: 10131828Abstract: To provide a working fluid for heat cycle which has a small temperature glide, a sufficiently low discharge temperature, high durability and less influence over global warming, and with which a heat cycle system excellent in the system maintenance properties and the cycle performance (capacity) is achieved, a composition for a heat cycle system, and a heat cycle system. A working fluid for heat cycle, which contains trifluoroethylene and difluoromethane, wherein the proportion of the total amount of trifluoroethylene and difluoromethane based on the entire amount of the working fluid for heat cycle is higher than 90 mass % and at most 100 mass %, and the mass ratio represented by trifluoroethylene/difluoromethane in the working fluid for heat cycle is from 41/59 to 59/41, a composition for a heat cycle system, and a heat cycle system employing the composition.Type: GrantFiled: August 9, 2016Date of Patent: November 20, 2018Assignee: AGC Inc.Inventors: Hidekazu Okamoto, Masato Fukushima, Satoshi Kawaguchi, Yoshinobu Kadowaki, Tetsuo Otsuka, Katsuya Ueno, Kazuyoshi Kurashima
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Patent number: 10131827Abstract: To provide a working fluid which has cycle performance sufficient as an alternative to R410A while the influence over global warming is sufficiently suppressed, which does not significantly increase the load to an apparatus as compared with a case where R410A is used, and which can be stably used continuously without any special measures, a composition for a heat cycle system contains the working fluid, and a heat cycle system employs the composition. A working fluid for heat cycle, wherein the global warming potential is less than 300; the product of the relative coefficient of performance and the relative refrigerating capacity is at least 0.820 relative to R410A in a standard refrigerating cycle under conditions of an evaporation temperature of 0° C., a condensing temperature of 40° C., a supercoiling degree of 5° C. and a degree of superheat of 5° C.; the relative compressor discharge gas pressure is at most 1.Type: GrantFiled: July 27, 2016Date of Patent: November 20, 2018Assignee: AGC INC.Inventors: Masato Fukushima, Hiroaki Mitsuoka, Mai Tasaka, Satoshi Kawaguchi, Katsuya Ueno, Toshiyuki Tanaka, Hidekazu Okamoto, Tetsuo Otsuka, Yoshinobu Kadowaki, Tatsuhiro Nogami, Daisuke Shirakawa, Hirokazu Takagi, Takeaki Arai
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Patent number: 9862660Abstract: To provide a method for purifying trifluoroethylene, by which from a fluid containing trifluoroethylene, a C1-5 alkane or alkene (excluding trifluoroethylene) in which at least one hydrogen atom may be substituted with a chlorine atom or a fluorine atom can be efficiently removed, and a method for producing trifluoroethylene by which trifluoroethylene can be efficiently produced. A fluid containing trifluoroethylene is brought into contact with at least one type of synthetic zeolite selected from synthetic zeolites 3A, 4A and 5A.Type: GrantFiled: August 11, 2016Date of Patent: January 9, 2018Assignee: Asahi Glass Company, LimitedInventors: Masato Fukushima, Satoshi Kawaguchi, Maki Shigematsu, Yoshinobu Kadowaki, Yukio Tanaami
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Publication number: 20160369145Abstract: A working fluid for heat cycle which has a low global warming potential and which has self-decomposition property suppressed, a composition for a heat cycle system comprising it, and a heat cycle system employing the composition. A working fluid for heat cycle, which contains trifluoroethylene and 2,3,3,3-tetrafluoropropene, wherein the proportion of the total amount of trifluoroethylene and 2,3,3,3-tetrafluoropropene based on the entire amount of the working fluid is higher than 90 mass % and at most 100 mass %, and the proportion of trifluoroethylene based on the total amount of trifluoroethylene and 2,3,3,3-tetrafluoropropene is at least 21 mass % and at most 39 mass %, a composition for a heat cycle system, which comprises the working fluid for heat cycle, and a heat cycle system, which employs the composition.Type: ApplicationFiled: August 31, 2016Publication date: December 22, 2016Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Masato FUKUSHIMA, Satoshi KAWAGUCHI, Katsuya UENO, Toshiyuki TANAKA, Hidekazu OKAMOTO, Tetsuo OTSUKA, Yoshinobu KADOWAKI, Tatsuhiro NOGAMI
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Publication number: 20160347693Abstract: To provide a method for purifying trifluoroethylene, by which from a fluid containing trifluoroethylene, a C1-5 alkane or alkene (excluding trifluoroethylene) in which at least one hydrogen atom may be substituted with a chlorine atom or a fluorine atom can be efficiently removed, and a method for producing trifluoroethylene by which trifluoroethylene can be efficiently produced. A fluid containing trifluoroethylene is brought into contact with at least one type of synthetic zeolite selected from synthetic zeolites 3A, 4A and 5A.Type: ApplicationFiled: August 11, 2016Publication date: December 1, 2016Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Masato FUKUSHIMA, Satoshi KAWAGUCHI, Maki SHIGEMATSU, Yoshinobu KADOWAKI, Yukio TANAAMI
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Publication number: 20160347979Abstract: To provide a working fluid for heat cycle which has a small temperature glide, a sufficiently low discharge temperature, high durability and less influence over global warming, and with which a heat cycle system excellent in the system maintenance properties and the cycle performance (capacity) is achieved, a composition for a heat cycle system, and a heat cycle system. A working fluid for heat cycle, which contains trifluoroethylene and difluoromethane, wherein the proportion of the total amount of trifluoroethylene and difluoromethane based on the entire amount of the working fluid for heat cycle is higher than 90 mass % and at most 100 mass %, and the mass ratio represented by trifluoroethylene/difluoromethane in the working fluid for heat cycle is from 41/59 to 59/41, a composition for a heat cycle system, and a heat cycle system employing the composition.Type: ApplicationFiled: August 9, 2016Publication date: December 1, 2016Applicant: Asahi Glass Company, LimitedInventors: Hidekazu OKAMOTO, Masato Fukushima, Satoshi Kawaguchi, Yoshinobu Kadowaki, Tetsuo Otsuka, Katsuya Ueno, Kazuyoshi Kurashima
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Publication number: 20160333243Abstract: To provide a working fluid which has cycle performance sufficient as an alternative to R410A while the influence over global warming is sufficiently suppressed, which does not significantly increase the load to an apparatus as compared with a case where R410A is used, and which can be stably used continuously without any special measures, a composition for a heat cycle system comprising the working fluid, and a heat cycle system employing the composition. A working fluid for heat cycle, wherein the global warming potential is less than 300; the product of the relative coefficient of performance and the relative refrigerating capacity is at least 0.820 relative to R410A in a standard refrigerating cycle under conditions of an evaporation temperature of 0° C., a condensing temperature of 40° C., a supercoiling degree of 5° C. and a degree of superheat of 5° C.; the relative compressor discharge gas pressure is at most 1.Type: ApplicationFiled: July 27, 2016Publication date: November 17, 2016Applicant: Asahi Glass Company, LimitedInventors: Masato FUKUSHIMA, Hiroaki MITSUOKA, Mai TASAKA, Satoshi KAWAGUCHI, Katsuya UENO, Toshiyuki TANAKA, Hidekazu OKAMOTO, Tetsuo OTSUKA, Yoshinobu KADOWAKI, Tatsuhiro NOGAMI, Daisuke SHIRAKAWA, Hirokazu TAKAGI, Takeaki ARAI
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Patent number: 8748505Abstract: To provide a curable resin composition for forming a seal part, which is capable of easily forming a continuous seal part and which is capable of maintaining the shape of the seal part during a period of from immediately after the formation of an uncured seal part until a liquid material is supplied to a region enclosed by the seal part and the seal part is cured, and a laminate which has minimal defects and whereby a resin layer interposed between first and second plates can be made thick. One having a viscosity of from 500 to 3,000 Pa·s at 25° C. is used as the curable resin composition for forming a seal part to form an uncured seal part 12 enclosing the periphery of a liquid material (curable resin composition 14 for forming a resin layer) interposed between a first plate (display device 50) and a second plate (transparent plate 10).Type: GrantFiled: July 24, 2013Date of Patent: June 10, 2014Assignee: Asahi Glass Company, LimitedInventors: Satoshi Niiyama, Hiroshige Ito, Naoko Aoki, Yoshinobu Kadowaki, Yukio Tsuge
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Publication number: 20130306236Abstract: To provide a curable resin composition for forming a seal part, which is capable of easily forming a continuous seal part and which is capable of maintaining the shape of the seal part during a period of from immediately after the formation of an uncured seal part until a liquid material is supplied to a region enclosed by the seal part and the seal part is cured, and a laminate which has minimal defects and whereby a resin layer interposed between first and second plates can be made thick. One having a viscosity of from 500 to 3,000 Pa·s at 25° C. is used as the curable resin composition for forming a seal part to form an uncured seal part 12 enclosing the periphery of a liquid material (curable resin composition 14 for forming a resin layer) interposed between a first plate (display device 50) and a second plate (transparent plate 10).Type: ApplicationFiled: July 24, 2013Publication date: November 21, 2013Applicant: Asahi Glass Company, LimitedInventors: Satoshi NIIYAMA, Hiroshige Ito, Naoko Aoki, Yoshinobu Kadowaki, Yukio Tsuge
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Patent number: 8524839Abstract: A transparent laminate having good transparency and good adhesion to transparent substrates, and containing a cured resin layer having excellent tear resistance. A process of producing a transparent laminate by interposing a curable resin composition containing an unsaturated urethane oligomer (A) which is a reaction product of a polyol component (A1) containing a polyol (a1) having from 2 to 3 hydroxy groups, a hydroxy value of 15 to 30 mgKOH/g and an oxyethylene group content of 8 to 50 mass %, a polyisocyanate (A2) and an unsaturated hydroxy compound (A3) or a reaction product of a polyol component (A1) and an unsaturated isocyanate (A4), and a monomer (B) represented by CH2?C(R)C(O)O—R2 (wherein R is a hydrogen atom or a methyl group, and R2 is a C3-4 hydroxyalkyl group having 1 to 2 hydroxy groups), between a pair of transparent substrates, and curing the curable resin composition.Type: GrantFiled: November 7, 2011Date of Patent: September 3, 2013Assignee: Asahi Glass Company, LimitedInventors: Yoshinobu Kadowaki, Satoshi Niiyama, Naoko Aoki
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Publication number: 20120211080Abstract: To provide a curable resin composition for forming a seal part, which is capable of easily forming a continuous seal part and which is capable of maintaining the shape of the seal part during a period of from immediately after the formation of an uncured seal part until a liquid material is supplied to a region enclosed by the seal part and the seal part is cured, and a laminate which has minimal defects and whereby a resin layer interposed between first and second plates can be made thick. One having a viscosity of from 500 to 3,000 Pa·s at 25° C. is used as the curable resin composition for forming a seal part to form an uncured seal part 12 enclosing the periphery of a liquid material (curable resin composition 14 for forming a resin layer) interposed between a first plate (display device 50) and a second plate (transparent plate 10).Type: ApplicationFiled: April 27, 2012Publication date: August 23, 2012Applicant: Asahi Glass Company, LimitedInventors: Satoshi NIIYAMA, Hiroshige ITO, Naoko AOKI, Yoshinobu KADOWAKI, Yukio TSUGE
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Publication number: 20120121914Abstract: A transparent laminate having good transparency and good adhesion to transparent substrates, and containing a cured resin layer having excellent tear resistance. A process of producing a transparent laminate by interposing a curable resin composition containing an unsaturated urethane oligomer (A) which is a reaction product of a polyol component (A1) containing a polyol (a1) having from 2 to 3 hydroxy groups, a hydroxy value of 15 to 30 mgKOH/g and an oxyethylene group content of 8 to 50 mass %, a polyisocyanate (A2) and an unsaturated hydroxy compound (A3) or a reaction product of a polyol component (A1) and an unsaturated isocyanate (A4), and a monomer (B) represented by CH2?C(R)C(O)O—R2 (wherein R is a hydrogen atom or a methyl group, and R2 is a C3-4 hydroxyalkyl group having 1 to 2 hydroxy groups), between a pair of transparent substrates, and curing the curable resin composition.Type: ApplicationFiled: November 7, 2011Publication date: May 17, 2012Applicant: Asahi Glass Company, LimitedInventors: Yoshinobu Kadowaki, Satoshi Niiyama, Naoko Aoki
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Publication number: 20100041864Abstract: To provide a process for producing, simply and with high reproducibility, a double metal cyanide complex catalyst having an organic ligand, which has a high catalytic activity, a small particle size and a high particle size uniformity. A process for producing a double metal cyanide complex catalyst having an organic ligand, comprising (a) a step of contacting an aqueous metal halide compound solution and an aqueous transition metal cyanide compound solution in a laminar flow state to obtain a liquid containing a double metal cyanide complex, and (b) a step of mixing the liquid containing a double metal cyanide complex, and an organic ligand, to obtain a dispersion containing a double metal cyanide complex catalyst having an organic ligand.Type: ApplicationFiled: October 8, 2009Publication date: February 18, 2010Applicant: ASAHI GLASS COMPANY, LIMITEDInventors: Yoshinobu KADOWAKI, Shigeru Ikai, Yasuyuki Sasao, Kazuhiko Yamada, Kenji Yamada
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Patent number: 5057805Abstract: A microwave semiconductor device includes a lead frame including a die pad and pairs of ground leads formed integrally with the die pad, a microwave semiconductor element mounted on the die pad, and a signal lead disposed between and spaced by a predetermined distance from the pair of ground leads. The signal lead is coplanar with the pair of ground leads to form a coplanar high frequency transmission path.Type: GrantFiled: August 29, 1990Date of Patent: October 15, 1991Assignee: Mitsubishi Denki Kabushiki KaishaInventor: Yoshinobu Kadowaki
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Patent number: 4985689Abstract: A microwave transmit-receive switch for switching between transmission and reception of a microwave signal, includes a directional coupler, an antenna terminal connected with an input terminal of the directional coupler, a transmission terminal connected to the isolation terminal of the directional coupler, two switches connected between the respective output terminals of the directional coupler and ground, respectively, a quarter wavelength phase delay element connecting one output terminal to a reception terminal and a transmission line having no phase delay connecting the other output terminal to the reception terminal of the switching.Type: GrantFiled: September 27, 1989Date of Patent: January 15, 1991Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yoshinobu Kadowaki, Yutaka Yoshii