Patents by Inventor Yoshinori ISONO

Yoshinori ISONO has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Substrate processing apparatus and method for detecting abnormality of substrate
    Patent number: 10903101
    Abstract: A substrate processing apparatus having a detecting unit that can detect an abnormality of a substrate such as a crack of the substrate or chipping of the substrate is disclosed. The substrate processing apparatus includes a polishing unit configured to polish a substrate, a cleaning unit configured to clean the polished substrate, a substrate abnormality detection unit configured to detect an abnormality of the substrate, and a substrate transporting mechanism configured to transport the substrate in the order of the polishing unit, the substrate abnormality detection unit, and the cleaning unit. The substrate abnormality detection unit includes an imaging device configured to image the substrate, and an output monitoring unit configured to determine a status of the substrate by comparing a signal obtained from the imaging device with a predetermined threshold.
    Type: Grant
    Filed: April 19, 2016
    Date of Patent: January 26, 2021
    Assignee: EBARA CORPORATION
    Inventors: Mitsunori Komatsu, Toru Maruyama, Yoshinori Isono, Hiroaki Yanagi
  • SUBSTRATE PROCESSING APPARATUS AND METHOD FOR DETECTING ABNORMALITY OF SUBSTRATE
    Publication number: 20160315002
    Abstract: A substrate processing apparatus having a detecting unit that can detect an abnormality of a substrate such as a crack of the substrate or chipping of the substrate is disclosed. The substrate processing apparatus includes a polishing unit configured to polish a substrate, a cleaning unit configured to clean the polished substrate, a substrate abnormality detection unit configured to detect an abnormality of the substrate, and a substrate transporting mechanism configured to transport the substrate in the order of the polishing unit, the substrate abnormality detection unit, and the cleaning unit. The substrate abnormality detection unit includes an imaging device configured to image the substrate, and an output monitoring unit configured to determine a status of the substrate by comparing a signal obtained from the imaging device with a predetermined threshold.
    Type: Application
    Filed: April 19, 2016
    Publication date: October 27, 2016
    Inventors: Mitsunori KOMATSU, Toru MARUYAMA, Yoshinori ISONO, Hiroaki YANAGI