Abstract: A method for separating a fluorocarbon, the method including separating a fluorocarbon having n carbon atoms from a mixture including the fluorocarbon having n carbon atoms and a fluorocarbon having n+m or more carbon atoms, where the fluorocarbon having n carbon atoms is separated by bringing the mixture and an adsorbent into contact with each other, n is an integer of 1 or more; and m is an integer of 1 or more.

Abstract: According to one embodiment, a pattern forming method includes forming a first film on an object to be processed, forming a first opening pattern and a second opening pattern in the first film, forming a second film, forming a third opening pattern and a fourth opening pattern in the second film, and processing the object to be processed. The second opening pattern is provided in a position where the second opening pattern does not overlap the first opening pattern in plan view. The third opening pattern is provided in a position where the third opening pattern partly overlaps the first opening pattern and does not overlap the second opening pattern in plan view. The fourth opening pattern is provided in a position where the fourth opening pattern does not overlap the first opening pattern, the second opening pattern, and the third opening pattern.

Abstract: A drawing device includes a device configured to generate a beam of charged particles, a group of optical elements disposed in a path of the beam, the group of optical elements being controlled so that the beam irradiates each of a plurality of divided regions of a target drawing region on which a pattern is to be drawn with the beam, and a control computer configured to divide the target drawing region into the divided regions based on a density of the pattern, and to execute first to n-th irradiations (n is an integer of 2 or more) selectively on the divided regions so that a total irradiation amount of the beam on each of the divided regions reaches a required irradiation amount therefor.

Abstract: In one embodiment, a drawing apparatus includes a drawer configured to draw a pattern on a plurality of regions with a beam, an operator configured to transfer a data for irradiating the plurality of regions with the beam, and a controller configured to control the drawing on the plurality of regions with the drawer, based on the data for the plurality of regions transferred from the operator. When performing the drawing on a first region and then the drawing on a second region, the controller corrects a state of the drawer between completion of drawing on the first region and completion of transfer of the data for the second region or the controller delays the completion of drawing on the first region to shorten time from the completion of drawing on the first region to the completion of transfer of the data for the second region.

Abstract: According to one embodiment, a proximity effect correcting method includes acquiring drawing information for drawing a pattern on a substrate with irradiation of an electron beam. The method further includes acquiring surface profile information related to a surface profile of the substrate. The method further includes calculating an energy distribution of a backscattered beam to be produced by backscattering of the electron beam in the substrate on a basis of the acquired drawing information and surface profile information. The method further includes calculating a required energy amount of the electron beam on a basis of the calculated energy distribution.

Abstract: According to one embodiment, a pattern drawing method includes correcting a drawing parameter for a pattern to be drawn on a resist film on a surface of a substrate. The correction being based on drawing information, height information, and dimensional difference information. The drawing information is design data for drawing the pattern on the resist film by irradiating the resist film with an electron beam. The height information indicates changes in surface height of the substrate. The dimensional difference information includes differences between a dimension of a pattern as indicated in the design data and a dimension of a pattern formed on the substrate by processing the substrate using a resist film patterned according to the drawing information as a mask. The correction of the drawing parameter reduces a dimensional difference between design data and a pattern formed on a target portion on the surface of the substrate.

Abstract: According to one embodiment, a drawing method includes acquiring a first arrangement information indicating an arrangement state of a stepped portion on a substrate. The method further includes acquiring a height information indicating a height of the stepped portion. The method further includes measuring a height of the substrate. The method further includes calculating a focus map indicating a distribution of beam focus values of an electron beam according to a drawing location on the substrate on a basis of the acquired first arrangement information and the height information, and the measured height of the substrate. The method further includes drawing a pattern on the substrate by an electron beam with a beam focus value determined on a basis of the calculated focus map.

Abstract: According to one embodiment, a proximity effect correcting method includes acquiring drawing information for drawing a pattern on a substrate with irradiation of an electron beam. The method further includes acquiring surface profile information related to a surface profile of the substrate. The method further includes calculating an energy distribution of a backscattered beam to be produced by backscattering of the electron beam in the substrate on a basis of the acquired drawing information and surface profile information. The method further includes calculating a required energy amount of the electron beam on a basis of the calculated energy distribution.

Abstract: According to one embodiment, a pattern forming method includes forming a first film on an object to be processed, forming a first opening pattern and a second opening pattern in the first film, forming a second film, forming a third opening pattern and a fourth opening pattern in the second film, and processing the object to be processed. The second opening pattern is provided in a position where the second opening pattern does not overlap the first opening pattern in plan view. The third opening pattern is provided in a position where the third opening pattern partly overlaps the first opening pattern and does not overlap the second opening pattern in plan view. The fourth opening pattern is provided in a position where the fourth opening pattern does not overlap the first opening pattern, the second opening pattern, and the third opening pattern.

Abstract: A cross-flow fan includes a disc-shaped or circular annular support plate, plural blades extending in a lengthwise direction from the support plate, and an auxiliary ring. The auxiliary ring has a ring portion that is positioned on a lengthwise direction intermediate section of the plural blades and is disposed on an outside of outer ends of the plural blades, and plural connection portions that extend from the ring portion as far as spaces between adjacent blades of the plural blades and are joined to the blades in the spaces between adjacent blades.

Abstract: A cross-flow fan includes a disc-shaped or circular annular support plate, plural blades extending in a lengthwise direction from the support plate, and an auxiliary ring. The auxiliary ring has a ring portion that is positioned on a lengthwise direction intermediate section of the plural blades and is disposed on an outside of outer ends of the plural blades, and plural connection portions that extend from the ring portion as far as spaces between adjacent blades of the plural blades and are joined to the blades in the spaces between adjacent blades.

Abstract: A stator includes a core and an insulator. The core has a plurality of annularly arranged tooth portions. The insulator is disposed on an end portion of the core, and has an annular wall portion extending in a direction departing from the core. A protrusion protrudes radially outward across an entire circumference of the wall portion, and the protrusion is provided on an outer circumferential surface of the wall portion.

Abstract: A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.

Abstract: The present invention provides a novel antitumor agent that acts through a novel mechanism. The novel antitumor agent contains as an active ingredient a substance capable of inhibiting a cell cycle-dependent Rho GTPase activating protein (RhoGAP). The RhoGAP is cell cycle-dependent and plays an important role in a process through which cancer cells acquire invasive capacity and/or metastatic capacity. The invasion and/or metastasis of cancer cells can be controlled by targeting the RhoGAP. Examples of the substance capable of inhibiting a cell cycle-dependent RhoGAP include an antisense oligonucleotide against a gene encoding the RhoGAP and an oligonucleotide that induces RNA interference of the gene. As the oligonucleotide, one containing an artificial nucleic acid such as BNA is preferred because of its excellent stability. The present invention also provides a screening method including selecting an antitumor agent capable of suppressing cancer cell invasion and/or metastasis through a novel mechanism.

Abstract: A charged particle beam drawing apparatus according to one embodiment of the present invention comprises a load lock chamber provided for introducing a target object from the outside and capable of switching an atmosphere state and a vacuum state, a transfer chamber arranged so as to be able to communicate with the load lock chamber and transferring the target object, a soaking chamber arranged so as to be able to communicate with the transfer chamber and having a temperature adjustment container for housing the target object therein and controlling a temperature of the target object with radiation and a temperature adjustment part for controlling a temperature of the temperature adjustment container, and a drawing chamber arranged so as to be able to communicate with the transfer chamber and drawing on the target object at a constant temperature.

Abstract: A charged particle beam writing apparatus according to one aspect of the present invention includes a substrate cover attachment/detachment unit to attach or detach a substrate cover that covers a whole periphery of a substrate being a writing target from an upper part, to/from the substrate, a writing unit to write a pattern on the substrate, in a state where the substrate cover is attached to the substrate, by a charged particle beam, a position measurement unit, before and after writing by the writing unit, to measure a position of the substrate cover in a state attached to the substrate, at a predetermined measurement position, and a correction unit, with respect to a position of the substrate to which the substrate cover is attached, to correct a positional deviation amount between a position of the substrate cover measured after writing and a position of the substrate cover measured before writing.

Abstract: An impeller of a blower is disposed with circular support plates that are made of a resin and rotate about an axis of rotation and a plurality of blades that are made of a resin. The blades are disposed on outer peripheral portions of the circular support plates so as to be parallel to an axis of rotation, and serrated shapes are formed on the blades by cutting out blade tips at plural places. Additionally, a step is formed in a blade face of each of the blades at a position a predetermined distance from the blade tip where the serrated shape is formed.

Abstract: A stator includes a core and an insulator. The core has a plurality of annularly arranged tooth portions. The insulator is disposed on an end portion of the core, and has an annular wall portion extending in a direction departing from the core. A protrusion protrudes radially outward across an entire circumference of the wall portion, and the protrusion is provided on an outer circumferential surface of the wall portion.

Abstract: An impeller of a blower is disposed with circular support plates that are made of a resin and rotate about an axis of rotation and a plurality of blades that are made of a resin. The blades are disposed on outer peripheral portions of the circular support plates so as to be parallel to an axis of rotation, and serrated shapes are formed on the blades by cutting out blade tips at plural places. Additionally, a step is formed in a blade face of each of the blades at a position a predetermined distance from the blade tip where the serrated shape is formed.