Patents by Inventor Yoshinori Tadokoro

Yoshinori Tadokoro has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 10539872
    Abstract: A photosensitive composition having excellent sensitivity, an insulating film formed using the composition, a color filter formed using the composition, a display device provided with the insulating film or color filter, and a compound suitable for incorporation as a photopolymerization initiator into the composition. This photosensitive composition includes a photopolymerizable compound and a photopolymerization initiator. The photopolymerization initiator contains a compound represented by formula (1) below in which R1 is a hydrogen atom, a nitro group, or a monovalent organic group; R2 and R3 are each an optionally substituted linear alkyl group, an optionally substituted cyclic organic group, or a hydrogen atom, and R2 and R3 may be bonded to one another to form a ring; R4 is a monovalent organic group; R5 is a hydrogen atom, an optionally substituted C1-11 alkyl group, or an optionally substituted aryl group; n is an integer from 0 to 4; and m is 0 or 1.
    Type: Grant
    Filed: July 14, 2015
    Date of Patent: January 21, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshinori Tadokoro, Dai Shiota
  • Patent number: 10527940
    Abstract: A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.
    Type: Grant
    Filed: September 8, 2017
    Date of Patent: January 7, 2020
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshinori Tadokoro, Dai Shiota
  • Publication number: 20190332012
    Abstract: A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.
    Type: Application
    Filed: September 8, 2017
    Publication date: October 31, 2019
    Inventors: Yoshinori TADOKORO, Dai SHIOTA
  • Patent number: 10239989
    Abstract: A curable composition that can be cured at low temperature in a short time regardless of the type of epoxy compound that is mixed therewith, and has a long pot life; an adhesive comprising said curable composition; a method for producing a fiber-reinforced composite material that uses the curable composition; and a fiber-reinforced composite material containing a matrix comprising the curable composition. A curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. An epoxy compound (A) and an imidazole compound (B) are blended in with the curable composition. In addition, the imidazole compound (B) and at least one type of crosslinking agent (C) are blended in with the curing agent mixture composition.
    Type: Grant
    Filed: December 8, 2015
    Date of Patent: March 26, 2019
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Kunihiro Noda, Hiroki Chisaka, Yoshinori Tadokoro, Dai Shiota
  • Publication number: 20180107114
    Abstract: A photosensitive resin composition capable of forming a cured film with satisfactory adhesion to substrates and excellent transparency, a polyamide resin which is used in the photosensitive resin composition, a method for producing the polyamide resin, a compound which is used as a raw material of the polyamide resin, a method for producing the compound, a method for producing a cured film using the photosensitive resin composition, and a cured film which is obtained by curing the photosensitive resin composition. The photosensitive resin composition including a resin and a photopolymerization initiator. The resin is a polyamide resin including a structural unit, which includes a specific saturated alicyclic skeleton, and at least one carboxy group esterified by a unit containing a polymerizable group of a predetermined structure.
    Type: Application
    Filed: September 8, 2017
    Publication date: April 19, 2018
    Inventors: Yoshinori TADOKORO, Dai SHIOTA
  • Publication number: 20170327631
    Abstract: A curable composition that can be cured at low temperature in a short time regardless of the type of epoxy compound that is mixed therewith, and has a long pot life; an adhesive comprising said curable composition; a method for producing a fiber-reinforced composite material that uses the curable composition; and a fiber-reinforced composite material containing a matrix comprising the curable composition. A curing agent mixture composition that can be cured at low temperature and in a short time, and provides the curable composition with a long pot life. An epoxy compound (A) and an imidazole compound (B) are blended in with the curable composition. In addition, the imidazole compound (B) and at least one type of crosslinking agent (C) are blended in with the curing agent mixture composition.
    Type: Application
    Filed: December 8, 2015
    Publication date: November 16, 2017
    Inventors: Kunihiro NODA, Hiroki CHISAKA, Yoshinori TADOKORO, Dai SHIOTA
  • Patent number: 9683150
    Abstract: A curable composition obtained by blending a polymerizable compound (A) having predetermined types of polymerizable functional groups, a reactive compound (B) having predetermined types of reactive functional groups, a compound (C) which is an imidazolyl group-containing compound having a predetermined structure, and a compound (D) which is an oxime compound or an oxime ester compound having a predetermined structure.
    Type: Grant
    Filed: March 3, 2015
    Date of Patent: June 20, 2017
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Yoshinori Tadokoro, Hiroki Chisaka, Kunihiro Noda, Dai Shiota
  • Publication number: 20170160636
    Abstract: The purpose of the present invention is to provide a photosensitive composition having excellent sensitivity, an insulating film formed using said photosensitive composition, a color filter formed using said photosensitive composition, a display device provided with said insulating film or said color filter, and a compound suitable for incorporation as a photopolymerization initiator into said photosensitive composition. This photosensitive composition includes (A) a photopolymerizable compound and (B) a photopolymerization initiator, wherein the photopolymerization initiator (B) contains a compound represented by formula (1).
    Type: Application
    Filed: July 14, 2015
    Publication date: June 8, 2017
    Inventors: Yoshinori TADOKORO, Dai SHIOTA
  • Publication number: 20160170302
    Abstract: A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R1 and R2 each independently represents a hydrogen atom or an organic group, but at least one represents an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 represents a single bond or an organic group. R4 to R9 each independently represents a hydrogen atom, an organic group, etc., but R6 and R7 are not hydroxyl groups. R10 represents a hydrogen atom or an organic group.
    Type: Application
    Filed: February 25, 2016
    Publication date: June 16, 2016
    Inventors: Dai SHIOTA, Mayumi KUROKO, Kunihiro NODA, Yoshinori TADOKORO, Yasuyuki AKAI, Hideyuki TAKAI
  • Patent number: 9244346
    Abstract: A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
    Type: Grant
    Filed: June 15, 2012
    Date of Patent: January 26, 2016
    Assignee: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Mayumi Kuroko, Kunihiro Noda, Yoshinori Tadokoro
  • Publication number: 20150252229
    Abstract: A curable composition obtained by blending a polymerizable compound (A) having predetermined types of polymerizable functional groups, a reactive compound (B) having predetermined types of reactive functional groups, a compound (C) which is an imidazolyl group-containing compound having a predetermined structure, and a compound (D) which is an oxime compound or an oxime ester compound having a predetermined structure.
    Type: Application
    Filed: March 3, 2015
    Publication date: September 10, 2015
    Inventors: Yoshinori Tadokoro, Hiroki Chisaka, Kunihiro Noda, Dai Shiota
  • Publication number: 20140231729
    Abstract: A negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure; a pattern forming method using the resin composition; a cured film, an insulating film, a color filter formed using resin composition; and a display device provided with the cured film, insulating film, or color filter. The resin composition contains a compound represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
    Type: Application
    Filed: June 15, 2012
    Publication date: August 21, 2014
    Applicant: TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Mayumi Kuroko, Kunihiro Noda, Yoshinori Tadokoro
  • Publication number: 20140221649
    Abstract: A novel compound suitable for obtaining a negative-type photosensitive resin composition capable of forming a pattern having favorable adhesiveness at a low light exposure. The compound is represented by the following formula (1). In the formula, R1 and R2 each independently indicate a hydrogen atom or an organic group, but at least one indicates an organic group. R1 and R2 may be bonded to form a ring structure and may contain a hetero atom bond. R3 indicates a single bond or an organic group. R4 to R9 each independently indicate a hydrogen atom, an organic group, etc., but R6 and R7 are never hydroxyl groups. R10 indicates a hydrogen atom or an organic group.
    Type: Application
    Filed: June 15, 2012
    Publication date: August 7, 2014
    Applicants: DAICEL CORPORATION, TOKYO OHKA KOGYO CO., LTD.
    Inventors: Dai Shiota, Mayumi Kuroko, Kunihiro Noda, Yoshinori Tadokoro, Yasuyuki Akai, Hideyuki Takai