Abstract: A substrate processing apparatus includes a chamber, a supply pipe, a discharge pipe, a trap section, a heater, a buffer section, and a cooling pipe. The chamber houses a substrate. The supply pipe supplies a processing gas into the chamber. The discharge pipe discharges a gas produced in the chamber. The trap section is disposed in the discharge pipe. The heater heats the trap section. The buffer section is disposed downstream of the trap section in the discharge pipe. The cooling pipe cools the buffer section.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.

Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.

Abstract: According to one embodiment, a semiconductor device includes a stacked body, a semiconductor body, and a charge storage portion. The stacked body includes a plurality of electrode layers stacked with an insulator interposed. The semiconductor body extends through the stacked body in a stacking direction of the stacked body. The charge storage portion is provided between the semiconductor body and each of the electrode layers. At least one of the electrode layers is a tungsten film or a molybdenum film including a portion having different fluorine concentration along the stacking direction.

Abstract: A processing apparatus according to an embodiment includes an object placement unit, a source placement unit, a flow rectifying member, and a power supply. The object placement unit is configured to have an object placed thereon. The source placement unit is disposed apart from the object placement unit and configured to have a particle source capable of ejecting a particle toward the object placed thereon. The flow rectifying member is disposed between the object placement unit and the source placement unit in a first direction from the source placement unit to the object placement unit. The power supply is configured to apply, to the flow rectifying member, a voltage having the same polarity as that of an electric charge in the particle.

Abstract: According to one embodiment, a collimator includes peripheral openings that extend between a grid region and a peripheral frame, are larger in size than unit through-holes, and penetrate through the collimator in a first direction. The peripheral openings include first peripheral openings located between first end walls and the peripheral frame.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, a collimator, and a temperature adjusting unit. The object placement unit is configured to have an object arranged. The object placement unit is configured to have an object placed thereon. The source placement unit is arranged apart from the object placement unit and configured to have a particle source placed thereon, the particle source being capable of ejecting a particle toward the object. The collimator configured to be arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls and extending a direction from the object placement unit to the source placement unit. The temperature adjusting unit is configured to adjust a temperature of the collimator.

Abstract: A processing apparatus according to an embodiment includes a container, a workpiece placement unit, a collimator, and a magnetic field generation unit. The workpiece placement unit on which a workpiece is to be placed so that particles are stacked on the workpiece is provided inside the container. The collimator is provided inside the container, and includes a first surface, a second surface opposite to the first surface, and a through hole penetrating the first surface and the second surface. The magnetic field generation unit is provided inside the container and generates a magnetic field between the first surface and the second surface inside the through hole.

Abstract: A processing device according to one embodiment includes an object placement unit, a source placement unit, and a collimator. An object is placed on the object placement unit. The source placement unit is arranged apart from the object placement unit, and has a particle source placed thereon, the particle source being capable of ejecting particle toward the object. The collimator is arranged between the object placement unit and the source placement unit, includes walls, and is provided with through holes formed by the walls. The walls include a first inner surface facing the through hole. The first inner surface includes a first portion made of a first material capable of ejecting the particle, and a second portion made of a second material, and arranged with the first portion in the first direction and closer to the object placement unit than the first portion.

Abstract: A friction stir welding method of welding first and second members to each other by rotating and pressing a friction stir tool into butt surfaces of the first and second members and moving the friction stir tool while rotating the friction stir tool, includes: a butt process of abutting the first and second members on each other, and abutting a side surface of a third member on side surfaces of the first and second members; an offset process of making a rotation center of the friction stir tool coincide with a position offset from the butt surfaces, and moving the friction stir tool to reach an inside of the third member; and a welding process of making the rotation center coincide with the butt surfaces, and moving the friction stir tool to reach the inside of the third member.

Abstract: According to one embodiment, a processing device comprises a substance arrangement part, a generating source arrangement part, and a collimator. A substance is arranged on the substance arrangement part. The generating source arrangement part is arranged at a position separated away from the substance arrangement part. A particle generating source that is able to emit a particle to the substance is arranged on the generating source arrangement part. The collimator is configured to be arranged between the substance arrangement part and the generating source arrangement part. The collimator includes: a frame; and a first rectifying part that includes a plurality of first walls and a plurality of first through holes formed with the first walls and extending in a first direction from the generating source arrangement part toward the substance arrangement part, the collimator configured to be removably attached to the frame.

Abstract: A mobile terminal apparatus includes a detection unit that detects a temperature of the mobile terminal apparatus, a determination unit that determines whether or not the detected temperature is a predetermined value or more, an analysis unit that collects and analyzes usage histories of a function of the mobile terminal apparatus, and a setting unit that, when the detected temperature is the predetermined value or more, refers to an analysis result of the usage histories, and when the function tends to be used for a predetermined usage time period or more, sets an operation mode of the function to a first mode in which an action performed by the function is restricted, and when the function tends to be used for less than the predetermined usage time period, sets the operation mode to a second mode in which the action performed by the function is not restricted.

Abstract: A mobile terminal apparatus includes a detection unit that detects a temperature of the mobile terminal apparatus, a determination unit that determines whether or not the detected temperature is a predetermined value or more, an analysis unit that collects and analyzes usage histories of a function of the mobile terminal apparatus, and a setting unit that, when the detected temperature is the predetermined value or more, refers to an analysis result of the usage histories, and when the function tends to be used for a predetermined usage time period or more, sets an operation mode of the function to a first mode in which an action performed by the function is restricted, and when the function tends to be used for less than the predetermined usage time period, sets the operation mode to a second mode in which the action performed by the function is not restricted.

Abstract: A 300% modulus at 100° C. in the range of 1 mm in an radial direction from a surface of a tread member is set to be between 1.10 times and 2.0 times inclusive, more preferably, between 1.10 times and 1.5 times inclusive, larger than a 300% modulus at 100° C. in the range of 0.5 mm to 1.5 mm in the radial direction from a bottom part of the tread member.

Abstract: A 300% modulus at 100° C. in the range of 1 mm in an axial direction from a surface of a tread member is set to be between 1.10 times and 2.0 times inclusive, more preferably, between 1.10 times and 1.5 times inclusive, larger than a 300% modulus at 100° C. in the range of 0.5 mm to 1.5 mm in the axial direction from a bottom part of the tread member.

Abstract: According to one aspect of the invention, there is provided a mobile apparatus including: a display; an input module; a timer configured to output a first signal representing that a first time elapses since the input module is last operated, and to output a second signal representing that a second time elapses since the input module is last operated, the first time being different from the second time; a display control module configured to disable a display on the display when the first signal is received; and an input control module configured to disable an input at the input module when the second signal is received.