Patents by Inventor Yoshinori Tomiya

Yoshinori Tomiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Microlens array and method of forming same and solid-state image pickup device and method of manufacturing same
    Patent number: 6163407
    Abstract: A resist having a three-dimensional shape of a microlens array and a material layer of the microlens array are simultaneously etched under a condition by which planar patterns transferred from the resist to the material layer are larger than planar patterns of the resist. The spacing between microlenses can be made narrower than the spacing between the planar patterns of the resist. Even when the planar shape of the microlens is an ellipse, the curvatures can be optimized in both the row and column directions by making the heights in these directions different from each other. It is possible to provide a microlens array having a small non-focusing region and a solid-state image pickup device having a high sensitivity and little smear.
    Type: Grant
    Filed: December 8, 1998
    Date of Patent: December 19, 2000
    Assignee: Sony Corporation
    Inventors: Yuichi Okazaki, Yoshinori Tomiya
  • Microlens array and method of forming same and solid-state image pickup device and method of manufacturing same
    Patent number: 5997756
    Abstract: A resist having a three-dimensional shape of a microlens array and a material layer of the microlens array are simultaneously etched under a condition by which planar patterns transferred from the resist to the material layer are larger than planar patterns of the resist. The spacing between microlenses can be made narrower than the spacing between the planar patterns of the resist. Even when the planar shape of the microlens is an ellipse, the curvatures can be optimized in both the row and column directions by making the heights in these directions different from each other. It is possible to provide a microlens array having a small non-focusing region and a solid-state image pickup device having a high sensitivity and little smear.
    Type: Grant
    Filed: January 19, 1999
    Date of Patent: December 7, 1999
    Assignee: Sony Corporation
    Inventors: Yuichi Okazaki, Yoshinori Tomiya
  • Microlens array and method of forming same and solid-state image pickup device and method of manufacturing same
    Patent number: 5948281
    Abstract: A resist having a three-dimensional shape of a microlens array and a material layer of the microlens array are simultaneously etched under a condition by which planar patterns transferred from the resist to the material layer are larger than planar patterns of the resist. The spacing between microlenses can be made narrower than the spacing between the planar patterns of the resist. Even when the planar shape of the microlens is an ellipse, the curvatures can be optimized in both the row and column directions by making the heights in these directions different from each other. It is possible to provide a microlens array having a small non-focusing region and a solid-state image pickup device having a high sensitivity and little smear.
    Type: Grant
    Filed: August 27, 1997
    Date of Patent: September 7, 1999
    Assignee: Sony Corporation
    Inventors: Yuichi Okazaki, Yoshinori Tomiya