Patents by Inventor Yoshinori Wakamiya
Yoshinori Wakamiya has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10844259Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.Type: GrantFiled: April 5, 2017Date of Patent: November 24, 2020Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
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Patent number: 10730755Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.Type: GrantFiled: March 30, 2016Date of Patent: August 4, 2020Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
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Publication number: 20190153279Abstract: Disclosed is a silica-based composite fine particle dispersion including a silica-based composite fine particle which comprises a mother particle containing amorphous silica as a main component with a child particle containing crystalline ceria as a main component on a surface thereof. Features of the silica-based composite fine particle include a silica to ceria mass ratio of 100:11 to 316, and when subjected to X-ray diffraction, only the crystalline phase of ceria is detected, and when subjected to X-ray diffraction for measurement, the crystalline ceria has a crystallite diameter of 10 to 25 nm.Type: ApplicationFiled: April 5, 2017Publication date: May 23, 2019Inventors: Yuji Tawarazako, Michio Komatsu, Kazuhiro Nakayama, Yukihiro Iwasaki, Yoshinori Wakamiya, Shota Kawakami, Shinya Usuda
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Publication number: 20180105428Abstract: A subject of this invention is to provide a dispersion liquid of a silica-based composite particle, which can rapidly polish silica film, Si wafer or even hard-to-process material, can concurrently achieve high surface accuracy (less scratches, etc.), and can suitably be used for surface polishing of semiconductor devices including semiconductor substrate and wiring board, by virtue of its impurity-free nature. The subject is solved by a dispersion liquid of a silica-based composite particle that contains a silica-based composite particle that has a core particle mainly composed of amorphous silica, and bound thereto a ceria particle mainly composed of crystalline ceria, further has a silica film that covers them.Type: ApplicationFiled: March 30, 2016Publication date: April 19, 2018Inventors: Yuji Tawarazako, Yoshinori Wakamiya, Shingo Kashiwada, Kazuaki Inoue, Kazuhiro Nakayama, Michio Komatsu
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Patent number: 8957351Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: GrantFiled: March 30, 2012Date of Patent: February 17, 2015Assignees: SANYO Electric Co., Ltd., ULVAC, Inc.Inventors: Masaki Shima, Yoshinori Wakamiya, Shuji Osono, Satohiro Okayama, Hideyuki Ogata
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Patent number: 8585791Abstract: In producing nodular silica sol, a polymerized silicic acid solution with viscosity of silicic acid from 0.9 to 100 mPa·s is prepared by aging a silicic acid solution with pH from 1.0 to 7.0 and silica concentration from 0.05 to 3.0% by weight at a temperature from 1 to 98° C. Then, a seed liquid is prepared by adding an alkali to the polymerized solution to adjust the pH from 10 to 12.5 and heating the resultant mixture solution at a temperature from 50 to 150° C. According to necessity, an alkali is added to the obtained seed liquid to adjust the pH in from 9 to 12.5. Finally, a silicic acid solution or a highly purified silicic acid solution is dropped to the seed liquid at a temperature from 20 to 98° C. continuously or intermittently for building up.Type: GrantFiled: September 1, 2011Date of Patent: November 19, 2013Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Kazuhiro Nakayama, Akira Nakashima, Hiroyasu Nishida, Yoshinori Wakamiya
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Publication number: 20120190149Abstract: In a catalytic CVD equipment, a holder includes an antireflective structure for preventing reflection of a radiant ray that is ejected from the catalytic wire toward the side of the substrate.Type: ApplicationFiled: March 30, 2012Publication date: July 26, 2012Applicants: ULVAC, INC., SANYO ELECTRIC CO., LTD.Inventors: Masaki SHIMA, Yoshinori WAKAMIYA, Shuji OSONO, Satohiro OKAYAMA, Hideyuki OGATA
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Patent number: 8187351Abstract: The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.Type: GrantFiled: November 29, 2007Date of Patent: May 29, 2012Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Kazuhiro Nakayama, Mami Tokunaga, Akira Nakashima, Kazuaki Inoue, Osamu Yoshida, Yoshinori Wakamiya, Hiroyasu Nishida
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Patent number: 8118898Abstract: The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.Type: GrantFiled: October 11, 2007Date of Patent: February 21, 2012Assignee: JGC Catalysts and Chemicals Ltd.Inventors: Yoshinori Wakamiya, Hiroyasu Nishida, Yuji Tawarazako, Kazuaki Inoue, Osamu Yoshida, Akira Nakashima
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Publication number: 20110314745Abstract: A nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r?) converted to that of an equivalent sphere computed from an average specific surface area measured by means of the nitrogen absorption method (r/r?, referred to as “association ratio”) in a range from 1.2 to 10, the particle diameter (r?) in a range from 5 to 200 nm, and the specific surface area in a range from 13 to 550 m2/g. The nodular silica particles have heterogeneous forms, and contents of Ca and Mg contained in the nodular silica particles are below 1000 ppm against SiO2 respectively.Type: ApplicationFiled: September 1, 2011Publication date: December 29, 2011Applicant: JGC Catalysts and Chemicals Ltd.Inventors: Kazuhiro Nakayama, Akira Nakashima, Hiroyasu Nishida, Yoshinori Wakamiya
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Publication number: 20100146864Abstract: A novel nodular silica sol adapted to use as a polishing material for polishing, for instance, CMP. The nodular silica sol has a ratio of an average particle diameter (r) measured by the dynamic light scattering method versus a particle diameter (r?) converted to that of an equivalent sphere computed from an average specific surface area measured by means of the nitrogen absorption method (r/r?, referred to as “association ratio”) in a range from 1.2 to 10, the particle diameter (r?) in a range from 5 to 200 nm, and the specific surface area in a range from 13 to 550 m2/g. The nodular silica particles have heterogeneous forms, and contents of Ca and Mg contained in the nodular silica particles are below 1000 ppm against SiO2 respectively.Type: ApplicationFiled: August 1, 2006Publication date: June 17, 2010Applicant: Catalysts & Chemicals Industries Co., LtdInventors: Kazuhiro Nakayama, Akira Nakashima, Hiroyasu Nishida, Yoshinori Wakamiya
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Publication number: 20080131571Abstract: The present invention provides a sol of spinous inorganic oxide particles not containing coarse particles, in which particles having extremely homogeneous particles are dispersed in a solvent. An acidic silicic acid is added to a dispersion liquid of core particles to grow core particles, and then again the acidic silicic acid is added at the addition rate 1.2 to 1.8 higher than that in the previous step to prepare a sol of spinous inorganic oxide particles. Then the sol is subjected to centrifugation to remove coarse particles having the diameter of 800 nm or more, thus spinous inorganic oxide particles having peculiar form such as a spinous one being obtained.Type: ApplicationFiled: November 29, 2007Publication date: June 5, 2008Applicant: CATALYSTS& CHEMICALS INDUSTRIES CO., LTDInventors: Kazuhiro Nakayama, Mami Tokunaga, Akira Nakashima, Kazuaki Inoue, Osamu Yoshida, Yoshinori Wakamiya, Hiroyasu Nishida
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Publication number: 20080086951Abstract: The present invention provides a sol of spinous silica-based particles in which silica-based particles having peculiar forms, spinous forms are dispersed in a solvent. The spinous silica-based particles have verrucous projections formed on surfaces of spherical silica-based particles. In the spinous particles, a value of the surface roughness (SA1/SA2, SA1 indicating a specific surface area measured by the BET method or the Sears method and SA2 indicating a specific surface area converted from an average particle diameter (D2) measured by the image analysis method) is in the range from 1.7 to 10. Furthermore the average diameter (D2) measured by the image analysis method is in the range from 7 to 150 nm.Type: ApplicationFiled: October 11, 2007Publication date: April 17, 2008Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTDInventors: Yoshinori Wakamiya, Hiroyasu Nishida, Yuji Tawarazako, Kazuaki Inoue, Osamu Yoshida, Akira Nakashima
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Patent number: 6827639Abstract: In polishing particles each having a core-shell structure, a polishing rate can be controlled by adjusting a thickness and/or density of a shell portion. The polishing particles have the core-shell structure with an average diameter in the range from 5 to 300 nm, and the shell portion of the polishing particles includes silica with a thickness in the range from 1 to 50 nm. A density of the shell portion is in the from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.Type: GrantFiled: March 24, 2003Date of Patent: December 7, 2004Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Michio Komatsu
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Patent number: 6669748Abstract: The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.Type: GrantFiled: September 26, 2002Date of Patent: December 30, 2003Assignee: Catalysts & Chemicals Industries Co., Ltd.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Manabu Watanabe, Michio Komatsu
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Publication number: 20030186634Abstract: In the polishing particles each having a core-shell structure, the polishing rate can be controlled by adjusting the thickness and/or density of the shell portion. The polishing particles having the core-shell structure with the average diameter (D) in the range from 5 to 300 nm, and the shell portion of the polishing particles comprises silica with the thickness (ST) in the range from 1 to 50 nm, and the density of the shell portion is in the range from 1.6 to 2.2 g/cc, while the Na content of the shell portion is less than 10 ppm.Type: ApplicationFiled: March 24, 2003Publication date: October 2, 2003Applicant: CATALYSTS & CHEMICALS INDUSTRIES CO., LTD.Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Michio Komatsu
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Publication number: 20030068893Abstract: The present invention provides a dispersion liquid of silica particles for polishing with a low content of Na ions and also with a content of ions other than Na ions in a prespecified range. This dispersion liquid is a dispersion liquid of silica particles in which the silica particles having the average particle diameter in the range from 5 to 300 nm is dispersed, and a content of Na ions in the silica particle is less than 100 ppm, while a contents of ions other than Na ions is in the range from 300 ppm to 2 weight %.Type: ApplicationFiled: September 26, 2002Publication date: April 10, 2003Inventors: Hiroyasu Nishida, Yoshinori Wakamiya, Manabu Watanabe, Michio Komatsu
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Patent number: 6365431Abstract: This invention manufactures a photovoltaic device by the following process steps: a step to form a first electrode layer and a light-active semiconductor layer on an insulating surface of the substrate; a step to form a transparent conducting film over most of the insulating surface including the light-active semiconductor layer; a step to establish a patterned transparent protective layer on the transparent conducting film over power generating regions; and a step to irradiate ultraviolet laser light over most of the substrate to remove exposed portions of the transparent conducting film not masked by the pattered transparent protective layer and form a transparent conducting layer corresponding to the pattered transparent protective layer. The patterned transparent protective layer serves a dual purpose as masking material for removing the specified areas of the transparent conducting film by ultraviolet laser and as a transparent protective layer.Type: GrantFiled: November 28, 2000Date of Patent: April 2, 2002Assignee: Sanyo Electric Co., Ltd.Inventors: Nobuo Hanehira, Yoshinori Wakamiya, Hidekazu Shuto, Hiroyuki Mori, Masayoshi Ono, Wataru Shinohara, Yasuaki Yamamoto
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Patent number: 4709570Abstract: A method for setting a steel stock discharge temperature of a heating furnace in a hot rolling line in which both fuel unit consumption in the heating furnace and that in a rolling line are calculated to obtain a total fuel unit consumption in the entire line, and an optimum discharge temperature is calculated so as to satisfy a metallurgical discharge temperature restrictive condition and minimize the above total fuel unit consumption and the optimum discharge temperature is used as the steel stock discharge temperature.Type: GrantFiled: November 6, 1985Date of Patent: December 1, 1987Assignee: Mitsubishi Denki Kabushiki KaishaInventors: Yoshinori Wakamiya, Tomoko Sumino
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Patent number: 4672830Abstract: A method of controlling an edging opening in a rolling mill, comprising measuring a width distribution of a plate to be rolled at an inlet of an edging roll in the rolling mill, calculating beforehand a width deviation distribution and a length in the moving direction of the plate at an irregular deformation portion caused in a rolling process in accordance with a predetermined pass schedule and a target width deviation distribution of the rolled plate required at an outlet of the rolling mill, calculating an optimum edging opening variation distribution using a plate width adjustment efficiency calculated on the basis of the beforehand calculated value and supplying the optimum edging opening variation distribution to an edging opening setting unit for the feedforward control.Type: GrantFiled: May 30, 1985Date of Patent: June 16, 1987Assignees: Mitsubishi Jukogyo Kabushiki Kaisha, Mitsubishi Denki Kabushiki KaishaInventors: Hidehiko Tsukamoto, Eiji Kohmoto, Koichi Asada, deceased, Masakuni Yamasaki, Kenichi Matsumoto, Euji Nakazono, Yoshinori Wakamiya, Satoru Kuramoto