Patents by Inventor Yoshio Imai

Yoshio Imai has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5578649
    Abstract: Disclosed herein are a process for producing an epoxy adhesive auxiliary which is a liquid reclaimed from rigid polyurethane foam and an epoxy adhesive which contains the auxiliary. The epoxy adhesive auxiliary can be produced, without requiring any special apparatus for purification, by incorporating rigid polyurethane foam (200 g) in powder form (5-10 mm in size) with glycol such as polyethylene glycol (100 g) and amino alcohol such as 2-aminoethanol (5 g), and heating them at 150.degree.-280.degree. C., thereby chemically decomposing the rigid polyurethane foam into a viscous liquid. This reclaimed liquid (50-300 g) is incorporated as such into an epoxy resin adhesive base such as bisphenol A-type epoxy resin (100 g), containing optional diethylamine (6-8 g). The resulting epoxy resin adhesive is superior in tensile shear bond strength.
    Type: Grant
    Filed: March 13, 1995
    Date of Patent: November 26, 1996
    Assignee: INOAC Corporation
    Inventors: Yoshio Imai, He Fei-Feng, Xue Shu-Chang, Takao Hidai
  • Patent number: 5451339
    Abstract: The present invention is to provide a liquid crystal monomeric compound where a liquid crystal phase readily appears, which is excellent in alignment control, film-formability, durability, heat-stability and compatibility, and is able to be applied to electro-optical liquid crystal elements and recording elements; and a side-chain liquid crystal polymer compound modified with such a monomeric compound.The liquid crystal monomeric compound is represented by the following formula:CH.sub.2 .dbd.CH--(CH.sub.2).sub.m --R [1]wherein m is an integer of 2 to 20 and R is a group selected from the group consisting of ##STR1## wherein p is 1 or 2, Rf is CF.sub.3 or CF.sub.2 F.sub.5, R.sup.1 is an alkyl group having 3-18 carbon atoms, * means an optically active carbon atom, (A) and (B) each is a group independently selected from the group consisting of ##STR2## which may be substituted with one or more halogen atoms, and X is --O--, --COO--or a direct linkage, and ##STR3## wherein p, Rf, R.sup.
    Type: Grant
    Filed: May 19, 1993
    Date of Patent: September 19, 1995
    Assignee: Showa Shell Sekiyu Kabushiki Kaisha
    Inventors: Yoshiichi Suzuki, Yoshio Imai, Masaaki Kakimoto
  • Patent number: 5342895
    Abstract: Disclosed is a polyamide/polybutadiene/acrylonitrile block copolymer useful in a wide variety of applications, such as an adhesive film, which comprises a polycondensate comprising a polybutadiene/acrylonitrile copolymer having a carboxyl group at each terminal thereof and a polyamide having an aminoaryl group at each terminal, and which is represented by general formula (I) ##STR1## wherein R is a divalent organic group, Ar is a divalent aromatic group, x, y, z, m and n each: represent mean degree of polymerization and are integers in the ranges of x=3 to 7, y=1 to 4, z=5 to 15, n=1 to 30, and nm=2 to 20, respectively.
    Type: Grant
    Filed: January 28, 1993
    Date of Patent: August 30, 1994
    Assignee: Tomoegawa Paper Co., Ltd.
    Inventors: Toshio Tagami, Yoshio Imai, Masaaki Kakimoto, Osamu Kiyohara, Hitoshi Narushima
  • Patent number: 5282113
    Abstract: A memory card having a printed circuit board mounted with semiconductor elements and provided with terminal portions along one side thereof and a card basic board formed with a broad recess on the lower surface thereof for receiving said printed circuit board therein. Void contact spaces are provided along one side thereof. The card basic board is formed with upper openings for communicating with the contact spaces on the upper surface of the card basic board and with inserting ports for communicating with the contact spaces on a side surface of the card basic board. Upper beams are provided between the upper openings and the corresponding inserting ports, and lower beams are provided near the inserting ports.
    Type: Grant
    Filed: November 2, 1992
    Date of Patent: January 25, 1994
    Assignee: Hitachi Maxell, Ltd.
    Inventors: Kyoichi Kohama, Yoshio Imai, Tomotaka Ozeki
  • Patent number: 5218081
    Abstract: An aromatic polythiazole is produced from a salt of an aromatic diaminodithiol compound and a dicarboxylic acid derivative, by a method comprising the steps of: (a) reacting the aromatic diaminodithiol compound salt with an alkyl halide having a substituted or unsubstituted alkyl group in an alkaline aqueous solvent, so that hydrogen atoms in thiol groups of the aromatic diaminodithiol compound are substituted with the alkyl groups; (b) polymerizing the resulting alkyl group-substituted aromatic diaminodithiol compound with the dicarboxylic acid derivative to form an aromatic polythiazole prepolymer; and (c) heating the aromatic polythiazole prepolymer to cause a thiazole ring closure reaction, thereby producing the aromatic polythiazole. By this method, the amino groups of the aromatic diaminodithiol compound salt are selectively reacted with the dicarboxylic acid derivative.
    Type: Grant
    Filed: February 20, 1991
    Date of Patent: June 8, 1993
    Assignee: Honda Giken Kogyo Kabushiki Kaisha
    Inventors: Tatsuya Hattori, Hiroshi Akita, Yoshio Imai, Masaaki Kakimoto
  • Patent number: 4960903
    Abstract: An aromatic compound having sulfonyl groups, as an intermediate or raw material of polyimides having a good and well-balanced heat resistance and moldability is effectively produced by reacting a compound represented by the general formula,R--Ar--Rwherein Ar is ##STR1## Y is a bond, oxygen atom, sulfur atom, SO.sub.2, CH.sub.2 or ##STR2## and R is a hydrogen atom or --SO.sub.2 X and X is a halogen atom or alkali metal, with a compound represented by the following general formula, ##STR3## wherein X.sup.1 and X.sup.2 are simultaneously methyl groups or form ##STR4## and Z is a hydrogen atom, alkyl group having 1 to 6 carbon atoms or aryl group having 6 to 8 carbon atoms and R.sup.1 is a hydrogen atom, --SO.sub.2 X, halogen atom or nitro group, X is a halogen atom or alkali metal and R and R.sup.1 are not same simultaneously, either of which contains --SO.sub.2 X group as a necessary group.
    Type: Grant
    Filed: December 8, 1986
    Date of Patent: October 2, 1990
    Assignee: Toa Nenryo Kogyo Kabushiki Kaisha
    Inventors: Yoshio Taguchi, Chichiro Imai, Yoshio Imai
  • Patent number: 4954685
    Abstract: A heating furnace for semiconductor wafers having a heater arranged around a core tube, layers of a heat insulating material made of a porous heat insulating material or ceramic fibers arranged around the heater, and layers of a heat reflecting material arranged in the layers of the heat insulating material.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: September 4, 1990
    Assignee: Tokyo Electron Limited
    Inventors: Hiromi Kumagai, Kaoru Sato, Yoshio Imai
  • Patent number: 4948864
    Abstract: A process for manufacturing an aromatic polyester resin represented by the general formula: ##STR1## wherein Ar.sup.1 and Ar.sup.2 represent a bivalent aromatic radical and n is an integer of 10 to 100, comprising reacting an aromatic diol represented by the general formula:HO-Ar.sup.1 -OHwherein Ar.sup.1 is a bivalent aromatic radical with a bivalent dibromide represented by the general formula:Br-Ar.sup.2 -Brwhere Ar.sup.2 is a bivalent radical and with carbon monoxide in the presence of a palladium catalyst and an organic base in an organic solvent.
    Type: Grant
    Filed: August 28, 1989
    Date of Patent: August 14, 1990
    Assignee: Tosoh Corporation
    Inventors: Yoshio Imai, Masa-Aki Kakimoto, Masaru Yoneyama
  • Patent number: 4946989
    Abstract: A compound of ##STR1## (wherein n is an integer from 2 to 15; R' is ##STR2## m is total number of carbon atoms in R' and is an integer from 5 to 12, and * mark shows asymmetric carbon atom) which is useful for an electric indicative element of liquid crystal is provided.
    Type: Grant
    Filed: July 25, 1988
    Date of Patent: August 7, 1990
    Assignee: Showa Shell Sekiyu Kabushiki Kaisha
    Inventors: Ichiro Kawamura, Yoshio Imai
  • Patent number: 4939214
    Abstract: A film comprised of at least one monomolecular layer composed essentially of a polyimide having repeating units of the formula: ##STR1## wherein R.sup.1 is a tetravalent organic group and R.sup.2 is a bivalent organic group.
    Type: Grant
    Filed: November 17, 1986
    Date of Patent: July 3, 1990
    Assignees: Mitsubishi Kasei Corporation, Yoshio Imai, Taro Hino
    Inventors: Yoshio Imai, Taro Hino, Mitsumasa Iwamoto, Masa-aki Kakimoto, Masa-aki Suzuki, Toru Konishi
  • Patent number: 4937313
    Abstract: A polyamide resin having double bonds in its main chain and containing repeating units represented by the formula (I):[--Ar.sup.1 --CR.sup.1 .dbd.CR.sup.2 --CO--NR.sup.3 --R.sup.4 --NR.sup.3 --CO--CR.sup.2 .dbd.CR.sup.1 --] (I)wherein Ar.sup.1 is a bivalent aromatic radical, R.sup.1, R.sup.2 and R.sup.3 each independently represent a hydrogen atom, a univalent aromatic or an aliphatic radical, and R.sup.4 is a bivalent aromatic or aliphatic radical, said polyamide resin having a reduced viscosity (.eta.sp/c) of 0.1-5.0 dl/g at a concentration of 0.5 g/dl in N,N-dimethylacetamide at 30.degree. C. is prepared by reacting a bis-alkenoic amide of formula (II):CHR.sup.1 .dbd.CR.sup.2 --CO--NR.sup.3 --R.sup.4 --NR.sup.3 --CO--CR.sup.2 .dbd.CHR.sup.1 (II)wherein R.sup.1, R.sup.2, R.sup.3 and R.sup.4 are as defined above with an aromatic dihalide represented by formula (III):X--Ar.sup.1 --X (III)wherein Ar.sup.
    Type: Grant
    Filed: June 21, 1989
    Date of Patent: June 26, 1990
    Assignee: Tosoh Corporation
    Inventors: Yoshio Imai, Masa-aki Kakimoto, Masaru Yoneyama, Masanori Tanaka
  • Patent number: 4921728
    Abstract: A liquid crystal element comprising opposed substrates, a liquid crystal nipped between said opposed substrates, and an aligning film formed on the surface of at least one of said substrates to effect substantially horizontal alignment of the liquid crystal molecules relative to said surface, which liquid crystal element is characterized by the fact that the molecules forming said aligning film are substantially aligned in themselves.
    Type: Grant
    Filed: August 28, 1989
    Date of Patent: May 1, 1990
    Assignee: Ricoh Company, Ltd.
    Inventors: Yasuyuki Takiguchi, Akihiko Kanemoto, Kiyohiro Uehara, Yoshio Imai, Taro Hino, Mitsumasa Iwamoto, Masaaki Kakimoto, Masaaki Suzuki
  • Patent number: 4822529
    Abstract: Antistatic agents for synthetic fibers comprising a specific type of quaternary ammonium alkyl phosphate as principal constituent and 1 weight percent or less of by-product alkali metal halides have improved antistatic characteristics both in high and low humidity conditions and reduce the amount of deposits that fall off, yellowing by a heat treatment and generation of rust. Methods of producing such antistatic agents are also disclosed.
    Type: Grant
    Filed: September 10, 1987
    Date of Patent: April 18, 1989
    Assignee: Takemoto Yushi Kabushiki Kaisha
    Inventors: Masatsugu Saiki, Yoshio Imai, Makoto Takagi
  • Patent number: 4820793
    Abstract: An aromatic polyamide of sufficiently high molecular weight is prepared by reacting a diphenyldiamino compound having a hydroxyl or siloxyl group in each phenyl group and a Si-containing substituent in each amino group, e.g. 2,2-bis(3-trimethylsilylamino-4-trimethylsiloxyphenyl) propane, with an aromatic dicarboxylic acid dihalide in an organic solvent. The polyamide can be converted into a polybenzoxazole by a dehydrating and cyclizing reaction at 100.degree.-500.degree. C.
    Type: Grant
    Filed: May 28, 1987
    Date of Patent: April 11, 1989
    Assignee: Central Glass Company, Limited
    Inventors: Yoshio Imai, Masaaki Kakimoto, Yoshiyuki Oishi, Yutaka Maruyama
  • Patent number: 4806618
    Abstract: Novel aromatic polyethers excellent in heat resistance and soluble in various organic solvents are obtained by introducing 9,9-biphenylfluorene group, optionally together with another divalent aromatic group, into the structural units of a polyether derived from either diphenyl ketone or diphenyl sulfone.
    Type: Grant
    Filed: November 2, 1987
    Date of Patent: February 21, 1989
    Assignee: Central Glass Company, Limited
    Inventors: Yoshio Imai, Masaaki Kakimoto, Yutaka Maruyama, Toshio Koishi
  • Patent number: 4740263
    Abstract: A process for preparing a diamond thin film by an electron assisted chemical vapor deposition (EACVD) is disclosed, in which diamond crystal nuclei are caused to form and grow to a thin film on a heated plate substrate under electron bombardments in an atmosphere of a mixed gas of hydrogen and a hydrocarbon in a reduced pressure. A Boron doped p-type diamond semiconductor is prepared by an addition of a trace amount of diborane in the mixed gas of the hydrogen and the hydrocarbon in said EACVD.
    Type: Grant
    Filed: April 17, 1985
    Date of Patent: April 26, 1988
    Assignee: Yoshio Imai
    Inventors: Yoshio Imai, Atsuhito Sawabe
  • Patent number: 4727177
    Abstract: Antistatic agents for synthetic fibers comprising a specific type of quaternary ammonium alkyl phosphate as principal constituent and 1 weight percent or less of by-product alkali metal halides have improved antistatic characteristics both in high and low humidity conditions and reduce the amount of deposits that fall off, yellowing by a heat treatment and generation of rust. Methods of producing such antistatic agents are also disclosed.
    Type: Grant
    Filed: March 6, 1986
    Date of Patent: February 23, 1988
    Assignee: Takemoto Yushi Kabushiki Kaisha
    Inventors: Masatsugu Saiki, Yoshio Imai, Makoto Takagi
  • Patent number: 4637764
    Abstract: A bolt adapted for use in automated manufacturing line such as automotive vehicle assembly line, can be tightened from one side with a mechanical wrench (16). The bolt has a threaded portion (16) engageable with a nut (18), a pin-tail (18) gripped by the mechanical wrench, and a guide section between the threaded portion and the pin-tail. The guide section has a length (l) determined in relation to the thickness (L) of the nut. The length of the guide section is selected so that approximately the entire length of the pin-tail can protrude from the nut when the nut is preliminarily attached to the bolt with about one turn of rotation.
    Type: Grant
    Filed: November 23, 1983
    Date of Patent: January 20, 1987
    Assignees: Nissan Motor Company, Limited, Sannohashi Seisakusho Company, Limited
    Inventor: Yoshio Imai
  • Patent number: 4632767
    Abstract: Antistatic agents for synthetic fibers comprising 5-50 weight percent of a specific type of quaternary ammonium alkyl phosphate containing 1 weight percent or less of by-product alkali metal halides and 50-95 weight percent of alkali metal salt of saturated alkyl phosphate have improved antistatic characteristics both in high and low humidity conditions, reduce the amount of deposits that fall off, yellowing by a heat treatment and generation of rust, and allow good coiling forms to be obtained.
    Type: Grant
    Filed: November 26, 1985
    Date of Patent: December 30, 1986
    Assignee: Takemoto Yushi Kabushiki Kaisha
    Inventors: Masatsugu Saiki, Yoshio Imai, Makoto Takagi
  • Patent number: 4393434
    Abstract: A capacitance humidity sensor according to the disclosure a non-conductive base plate, electrodes oppositely arranged on the base plate, a metal compound membrane formed by ion-plating independently on the electrodes, the metal compound membrane being roughened on its surface by plasma etching and being active to the humidity, and a moisture permeable metal skin formed on the metal compound membrane. The metal compound is preferably an oxide or nitride of aluminum or magnesium.
    Type: Grant
    Filed: November 20, 1981
    Date of Patent: July 12, 1983
    Assignee: Yoshio Imai
    Inventors: Yoshio Imai, Yoichi Nabeta, Tadao Inuzuka