Patents by Inventor Yoshio Ishihara

Yoshio Ishihara has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8657922
    Abstract: A method which separates a component which is easily adsorbed by an adsorbent and a component which is not easily adsorbed by the adsorbent, from a feed gas which includes at least two kinds of components, with adsorption columns, wherein the adsorbent is filled in the adsorption columns and has strong adsorbability with respect to at least one kind of component included in the feed gas, and also has weak adsorbability with respect to at least one kind of other components included in the feed gas, and a temperature of the adsorbents which is filled in the column is maintained to be higher than the highest temperature of an ambient temperature around the adsorption columns which is variable throughout the year.
    Type: Grant
    Filed: March 17, 2010
    Date of Patent: February 25, 2014
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Masaya Yamawaki, Yoshio Ishihara, Tadanobu Arimura
  • Publication number: 20120024152
    Abstract: A method which separates a component which is easily adsorbed by an adsorbent and a component which is not easily adsorbed by the adsorbent, from a feed gas which includes at least two kinds of components, with adsorption columns, wherein the adsorbent is filled in the adsorption columns and has strong adsorbability with respect to at least one kind of component included in the feed gas, and also has weak adsorbability with respect to at least one kind of other components included in the feed gas, and a temperature of the adsorbents which is filled in the column is maintained to be higher than the highest temperature of an ambient temperature around the adsorption columns which is variable throughout the year.
    Type: Application
    Filed: March 17, 2010
    Publication date: February 2, 2012
    Inventors: Masaya Yamawaki, Yoshio Ishihara, Tadanobu Arimura
  • Patent number: 7976806
    Abstract: A granular material having a high strength and a large BET specific surface area composed of porous particles comprising calcium oxide and calcium hydroxide wherein the calcium oxide is contained in an amount of 30 to 80 weight % based on a total amount of the calcium oxide and calcium hydroxide and the porous particles have a BET specific surface area of 40 m2/g or more, or composed of porous particles comprising calcium oxide, magnesium oxide, calcium hydroxide, and magnesium hydroxide wherein a ratio of an amount of magnesium to a total of an amount of calcium and an amount of magnesium is in the range of 0.05 to 0.80, a total hydroxide content in the whole particles is in the range of 1 to 20 weight % and the porous particles have a BET specific surface area of 50 m2/g or more.
    Type: Grant
    Filed: March 30, 2006
    Date of Patent: July 12, 2011
    Assignees: Ube Material Industries, Ltd., Taiyo Nippon Sanso Corporation
    Inventors: Osamu Misumi, Shinichi Yamamoto, Takayuki Watanabe, Takashi Kishimoto, Takashi Watanabe, Fumio Okada, Yoshio Ishihara, Katsumasa Suzuki, Kaoru Sakoda
  • Publication number: 20090246089
    Abstract: An exhaust gas-processing apparatus of the present invention includes a gas supplier 2 which supplies a gas such as C3F8 to gas-using equipment 1, a detoxification device 4 which detoxifies an exhaust gas accepted from the gas-using equipment 1, a detoxifying agent-packing and -ejecting device 5, and a controller 6. The data of the types, flow rates, and supply periods of gases, which are supplied from the gas supplier 2 to the gas-using equipment 1, are sent to the controller 6. The control section 6 predicts a point in time of the break of the detoxification column 41 of the detoxification device 4 based on the data, and issues the direction of exchange so as to direct the detoxifying agent-packing and -ejecting device 5 to eject and pack detoxifying agents at a point in time of the break.
    Type: Application
    Filed: November 17, 2006
    Publication date: October 1, 2009
    Applicant: TAIYO NIPPON SANSO CORPORATION
    Inventors: Kaoru Sakoda, Yoshio Ishihara
  • Publication number: 20090246524
    Abstract: Granular calcium oxide and calcium hydroxide which are highly reactive with a halide gas and its decomposition products and favorably employable for filling a gas-fixing unit (32) of an apparatus (3) for fixing a halide gas are, respectively, a granule of porous spherical calcium oxide particles, which has a BET specific surface area of 50 m2/g or more and a total pore volume of pores having a diameter of 2-100 nm in the range of 0.40-0.70 mL/g and a granule of porous spherical calcium hydroxide particles which has a BET specific surface area of 20 m2/g or more and a total pore volume of pores having a diameter of 2-100 nm in the range of 0.25-0.40 mL/g.
    Type: Application
    Filed: June 4, 2007
    Publication date: October 1, 2009
    Applicants: NATIONAL UNIVERSITY CORPORATION TOHOKU UNIVERSITY, TAIYO NIPPON SANSO CORPORATION, UBE MATERIAL INDUSTRIES, LTD.
    Inventors: Tadahiro Ohmi, Yoshio Ishihara, Katsumasa Suzuki, Kaoru Sakoda, Osamu Misumi, Takayuki Watanabe
  • Patent number: 7594955
    Abstract: A process for recovering rare gases using a gas-recovering container and, more particularly, a process of recovering a rare gas in a rare gas-containing exhaust gas discharged from an equipment using said rare gas, and introducing the recovered rare gas-containing exhaust gas into rare gas separation and purifying equipment and therein separating and purifying the rare gas.
    Type: Grant
    Filed: April 26, 2005
    Date of Patent: September 29, 2009
    Assignee: Taiyo Nippon Sanso Corporation
    Inventor: Yoshio Ishihara
  • Publication number: 20090215616
    Abstract: A granular material having a high strength and a large BET specific surface area composed of porous particles comprising calcium oxide and calcium hydroxide wherein the calcium oxide is contained in an amount of 30 to 80 weight % based on a total amount of the calcium oxide and calcium hydroxide and the porous particles have a BET specific surface area of 40 m2/g or more, or composed of porous particles comprising calcium oxide, magnesium oxide, calcium hydroxide, and magnesium hydroxide wherein a ratio of an amount of magnesium to a total of an amount of calcium and an amount of magnesium is in the range of 0.05 to 0.80, a total hydroxide content in the whole particles is in the range of 1 to 20 weight % and the porous particles have a BET specific surface area of 50 m2/g or more.
    Type: Application
    Filed: March 30, 2006
    Publication date: August 27, 2009
    Applicants: Ube Material Industries, Ltd., Taiyo Nippon Sanso Corporation
    Inventors: Osamu Misumi, Shinichi Yamamoto, Takayuki Watanabe, Takashi Kishimoto, Takashi Watanabe, Fumio Okada, Yoshio Ishihara, Katsumasa Suzuki, Kaoru Sakoda
  • Publication number: 20090032749
    Abstract: A regulating valve includes a cylinder, a piston provided inside the cylinder and displaced in a predetermined direction when a pressure of a hydrogen gas existing on a downstream side of a fuel supply path is smaller than a predetermined pressure, and a valve body which is provided inside the cylinder and which abuts on the piston and is pushed and displaced by the piston to open the fuel supply path at a time when the piston is displaced in the predetermined direction, wherein an abutment portion between the piston and the valve body is provided with a rubber member as an impact absorbing member.
    Type: Application
    Filed: March 5, 2007
    Publication date: February 5, 2009
    Inventor: Yoshio Ishihara
  • Patent number: 7258725
    Abstract: Gas supplying method and system in which effective component gas in exhaust gas can be separated and purified efficiently to be resupplied regardless of variation in the flow rate or composition of the exhaust gas and consumed gas can be replenished efficiently. In a method for collecting exhaust gas discharged from a gas using facility, separating/purifying effective component gas contained in the exhaust gas and supplying the effective component gas thus obtained to the gas using facility, the exhaust gas discharged from the gas using facility is added with a replenishing gas of the same components as the effective component gas before the effective component gas is separated and purified.
    Type: Grant
    Filed: December 4, 2002
    Date of Patent: August 21, 2007
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Tadahiro Ohmi, Yoshio Ishihara, Akihiro Nakamura
  • Patent number: 7258909
    Abstract: The leather-like sheet for balls of the present invention comprises a fiber-entangled fabric and a porous surface layer disposed on the surface of the fiber-entangled fabric. The porous surface layer has a pattern formed by a plurality of outwardly projecting pebbles and valleys between the pebbles. A plurality of microholes having an average diameter of 5 to 100 ?m are formed on surfaces of the pebbles, but the microhole is substantially not formed on surfaces of the valleys. The leather-like sheet exhibits a sufficient surface abrasion resistance and an excellent non-slip properties because of its high sweat-absorbing ability under wet conditions.
    Type: Grant
    Filed: March 4, 2004
    Date of Patent: August 21, 2007
    Assignee: Kuraray Co., Ltd.
    Inventors: Kazundo Akamata, Yoshio Ishihara
  • Publication number: 20070160512
    Abstract: In the exhaust gas treatment method of the present invention, exhaust gas in an excited state in semiconductor device production equipment is introduced into a plasma treatment unit of a treatment unit under reduced pressure, introduced into a reactor of a reaction removal unit while maintained in an excited state by plasma generated in the plasma treatment unit, and is reacted with a reaction remover composed of particulate calcium oxide filled into the reactor to remove harmful gas components in the exhaust gas. Exhaust gas may also be reacted with the reaction remover after having degraded the harmful gas components by oxidative degradation in the presence of plasma by supplying oxygen to the plasma treatment unit.
    Type: Application
    Filed: January 25, 2005
    Publication date: July 12, 2007
    Applicants: TAIYO NIPPON SANSO CORPORATION
    Inventors: Tadahiro Ohmi, Hideharu Hasegawa, Yoshio Ishihara, Katsumasa Suzuki
  • Publication number: 20070154372
    Abstract: The exhaust gas treatment agent of the present invention is an exhaust gas treatment agent provided with a particulate and porous structure, and composed of calcium hydroxide occupying at least a portion of the surface thereof, and calcium oxide occupying the remainder. The specific surface area if preferably 1 m2/g or more, and the void fraction is preferably 10 to 50% by volume. This calcium oxide is obtained by baking particulate calcium carbonate, and exhaust gas discharged from a semiconductor production device is removed of harmful gas components by allowing the exhaust gas to contact and react with this exhaust gas treatment agent while in the gaseous state.
    Type: Application
    Filed: January 25, 2005
    Publication date: July 5, 2007
    Inventors: Hideharu Hasegawa, Yoshio Ishihara, Katsumasa Suzuki
  • Patent number: 7033843
    Abstract: A semiconductor manufacturing method whereby reactive gas processing such as selective epitaxial growth can be carried out with high precision by correctly adjusting conditions during processing is performed by a semiconductor manufacturing apparatus which can restrict increases in the moisture content, prevent heavy metal pollution and the like, and investigate the correlation between moisture content in the process chamber and outside regions. The moisture content in a reaction chamber and in a gas discharge system of the reaction chamber are measured when a substrate is provided, and the conditions for reactive gas processing are adjusted based on the moisture content.
    Type: Grant
    Filed: October 30, 2003
    Date of Patent: April 25, 2006
    Assignee: Taiyo Nippon Sanso Corporation
    Inventors: Hiroyuki Hasegawa, Tomonori Yamaoka, Yoshio Ishihara, Hiroshi Masusaki
  • Publication number: 20050235828
    Abstract: A process comprises the steps of recovering exhaust gas containing krypton or xenon which are used as an atmospheric gas for semiconductor product preparation apparatuses; introducing the exhaust gas to separating and purifying equipment and thereby separating and purifying krypton or xenon from the exhaust gas, wherein the former step of recovering a rare gas-containing exhaust gas discharged from an equipment using a rare gas comprises removing one or more interfering gases which lower(s) the adsorption ability of activated carbon capable of adsorbing rare gases; and thereafter pressure filling the rare gas-containing exhaust gas obtained after said one or more interfering gases removal treatment into a gas-recovering container, which comprises a air-tight container having a joint section capable of connecting a gas duct through an on-off valve and containing therein the activated carbon capable of adsorbing rare gases; and thereby recovering the rare gas containing exhaust gas; and the latter step of intro
    Type: Application
    Filed: April 26, 2005
    Publication date: October 27, 2005
    Applicant: TAIYO NIPPON SANSO CORPORATION
    Inventor: Yoshio Ishihara
  • Publication number: 20050109419
    Abstract: Gas supplying method and system in which effective component gas in exhaust gas can be separated and purified efficiently to be resupplied regardless of variation in the flow rate or composition of the exhaust gas and consumed gas can be replenished efficiently. In a method for collecting exhaust gas discharged from a gas using facility, separating/purifying effective component gas contained in the exhaust gas and supplying the effective component gas thus obtained to the gas using facility, the exhaust gas discharged from the gas using facility is added with a replenishing gas of the same components as the effective component gas before the effective component gas is separated and purified.
    Type: Application
    Filed: December 4, 2002
    Publication date: May 26, 2005
    Inventors: Tadahiro Ohmi, Yoshio Ishihara, Akihiro Nakamura
  • Patent number: 6887721
    Abstract: The present invention discloses a CVD apparatus which, together with being able to efficiently perform purging treatment after maintenance, uses for the purge gas a mixed gas of a gas having high thermal conductivity and an inert gas during heated flow purging treatment after maintenance to perform startup of the CVD apparatus while reducing the amount of time required for purging treatment. Purging treatment before semiconductor film formation is performed by repeating the pumping of a vacuum and the introduction of inert gas a plurality of times.
    Type: Grant
    Filed: December 19, 2001
    Date of Patent: May 3, 2005
    Assignees: Mitsubishi Materials Silicon Corporation, Taiyo Nippon Sanso Corporation
    Inventors: Hiroyuki Hasegawa, Tomonori Yamaoka, Yoshio Ishihara, Hiroshi Masusaki, Takayuki Satou, Katsumasa Suzuki, Hiroki Tokunaga
  • Patent number: 6869579
    Abstract: A process for treating and recovering CVD exhaust gas is provided, which can reduce periodical maintenance by converting the raw gas employed and the intermediate products contained in the CVD system into highly volatile halides, separating and recovering them as materials with good reusability. An unreacted raw gas and intermediate products contained in CVD exhaust gas are partially decomposed by being subject to decomposition treatment or conversion reaction treatment, and then halogenosilane gas and hydrogen chloride are separated and recovered. Alternatively, a raw gas and intermediate products are decomposed into hydrogen chloride and recovered.
    Type: Grant
    Filed: July 9, 2001
    Date of Patent: March 22, 2005
    Assignee: Nippon Sanso Corporation
    Inventors: Tadahiro Ohmi, Yoshio Ishihara
  • Publication number: 20050058794
    Abstract: A sheet material having polymer layer over the surface of base fabric, the polymer layer comprises a primary outwardly projecting pebbles and a secondary pebbles & valleys over the primary outwardly projecting pebbles, wherein an average height difference (A) of the primary pebbles is 50 to 1000 ?m, a projected area of the upper surface of the primary pebbles is 1 to 300 mm2, an average height difference (B) of the secondary pebbles & valleys is 5 to 200 ?m, an average distance between the pebbles each other of the secondary pebbles & valleys is 100 to 500 ?m, and A?B. A gas filling type ball, a basketball and a glove using the sheet material. Materials for sporting balls such as basketball, American football, Rugby ball, handball, etc., or as the material for gloves having enough mechanical strength, excellent handling property and sufficient surface abrasion resistance are provided.
    Type: Application
    Filed: September 10, 2004
    Publication date: March 17, 2005
    Applicant: Kuraray Co., Ltd.
    Inventors: Michinori Fujisawa, Yoshio Ishihara
  • Publication number: 20040185245
    Abstract: The leather-like sheet for balls of the present invention comprises a fiber-entangled fabric and a porous surface layer disposed on the surface of the fiber-entangled fabric. The porous surface layer has a pattern formed by a plurality of outwardly projecting pebbles and valleys between the pebbles. A plurality of microholes having an average diameter of 5 to 100 &mgr;m are formed on surfaces of the pebbles, but the microhole is substantially not formed on surfaces of the valleys. The leather-like sheet exhibits a sufficient surface abrasion resistance and an excellent non-slip properties because of its high sweat-absorbing ability under wet conditions.
    Type: Application
    Filed: March 4, 2004
    Publication date: September 23, 2004
    Applicant: KURARAY CO., LTD.
    Inventors: Kazundo Akamata, Yoshio Ishihara
  • Patent number: 6794204
    Abstract: A semiconductor manufacturing method whereby reactive gas processing such as selective epitaxial growth can be carried out with high precision by correctly adjusting conditions during processing is performed by a semiconductor manufacturing apparatus which can restrict increases in the moisture content, prevent heavy metal pollution and the like, and investigate the correlation between moisture content in the process chamber and outside regions. The moisture content in a reaction chamber and in a gas discharge system of the reaction chamber are measured when a substrate is provided, and the conditions for reactive gas processing are adjusted based on the moisture content.
    Type: Grant
    Filed: September 26, 2002
    Date of Patent: September 21, 2004
    Assignees: Mitsubishi Materials Silicon Corporation, Nippon Sanso Corporation
    Inventors: Hiroyuki Hasegawa, Tomonori Yamaoka, Yoshio Ishihara, Hiroshi Masusaki